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公开(公告)号:US11993725B2
公开(公告)日:2024-05-28
申请号:US16812447
申请日:2020-03-09
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Tomoyuki Kikuchi , EunJoo Jang , Hyun A Kang , Nayoun Won , Oul Cho
IPC: C09D181/00 , B32B1/08 , B32B7/04 , B32B15/082 , B32B15/092 , B32B15/095 , B32B15/20 , B32B17/00 , B32B27/00 , B32B27/08 , B32B27/18 , B32B27/20 , B32B27/28 , B32B27/30 , B32B27/32 , B32B27/34 , B32B27/36 , B32B27/38 , C09D183/16 , C09K11/02 , C09K11/62 , C08G77/62
CPC classification number: C09D181/00 , B32B1/08 , B32B7/04 , B32B15/082 , B32B15/092 , B32B15/095 , B32B15/20 , B32B17/00 , B32B27/00 , B32B27/08 , B32B27/18 , B32B27/20 , B32B27/281 , B32B27/285 , B32B27/286 , B32B27/288 , B32B27/30 , B32B27/302 , B32B27/304 , B32B27/308 , B32B27/32 , B32B27/325 , B32B27/34 , B32B27/36 , B32B27/365 , B32B27/38 , C09D183/16 , C09K11/02 , C09K11/623 , B32B2250/03 , B32B2255/10 , B32B2255/20 , B32B2255/26 , B32B2255/28 , B32B2264/10 , B32B2270/00 , B32B2307/412 , B32B2307/422 , B32B2307/7242 , B32B2307/7244 , B32B2307/7265 , B32B2307/728 , B32B2307/732 , B32B2457/12 , B32B2457/202 , C08G77/62
Abstract: A barrier film comprising: a substrate; a first layer disposed on the substrate and comprising an oxidation product of polysilazane; and a second layer disposed directly on the first layer and comprising a thiol-ene polymer, wherein the polysilazane comprises a repeating unit represented by Chemical Formula 1,
wherein R1 and R2 are each independently hydrogen, an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, an alkylsilyl group, an alkylamino group, an alkoxy group, or an aromatic hydrocarbon group, and wherein the thiol-ene polymer is a polymerization product of a monomer combination including a first monomer having at least two thiol groups at its terminal end and a second monomer having at least two carbon-carbon unsaturated bond-containing groups at its terminal end.-
公开(公告)号:US10053556B2
公开(公告)日:2018-08-21
申请号:US14920189
申请日:2015-10-22
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Tomoyuki Kikuchi , EunJoo Jang , Hyun A Kang , Nayoun Won , Oul Cho , Haeng Deog Koh
IPC: C09D7/62 , H05B33/12 , C09D179/04 , C08K9/04 , C08G83/00 , C08F2/38 , C08F2/44 , B82Y40/00 , B82Y30/00 , B32B9/04 , B32B27/08 , B32B27/28 , B32B27/34 , B32B27/36 , C08F226/06
CPC classification number: C08K9/04 , B32B9/04 , B32B27/08 , B32B27/281 , B32B27/34 , B32B27/36 , B32B27/365 , B32B2250/40 , B32B2255/10 , B32B2255/24 , B32B2255/26 , B32B2255/28 , B32B2264/10 , B32B2264/102 , B32B2264/104 , B32B2307/412 , B32B2457/00 , B82Y30/00 , B82Y40/00 , C08F2/38 , C08F2/44 , C08F226/06 , C08G83/00 , C08J7/047 , C08J2367/02 , C08J2481/02 , C09D7/62 , C09D179/04 , H05B33/12 , C08L81/02
Abstract: A barrier coating composition including: a monomer combination including a first monomer having at least two thiol groups at its terminal end and a second monomer having at least two carbon-carbon unsaturated bond-containing groups at its terminal end; and a plurality of organo-modified clay particles dispersed in the monomer combination, wherein the organo-modified clay particles include a compound having a hydrocarbyl group linked to a heteroatom, and wherein the compound is a primary, secondary, or tertiary amine, a quaternary organoammonium salt, a primary, secondary, or tertiary phosphine, a quaternary organophosphonium salt, a thiol including an amine group, or a combination thereof.
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