公开(公告)号：US10978480B2

公开(公告)日：2021-04-13

申请号：US16856663

申请日：2020-04-23

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kyunghwan Lee ,  Yongseok Kim ,  Byoung-Taek Kim ,  Tae Hun Kim ,  Dongkyun Seo ,  Junhee Lim

IPC: H01L27/11582 ,  H01L27/11565 ,  H01L29/51 ,  H01L29/423 ,  H01L27/1157 ,  H01L27/11556 ,  H01L27/11524

Abstract: A three-dimensional semiconductor memory device includes an electrode structure including gate electrodes and insulating layers, which are alternately stacked on a substrate, a semiconductor pattern extending in a first direction substantially perpendicular to a top surface of the substrate and penetrating the electrode structure, a tunnel insulating layer disposed between the semiconductor pattern and the electrode structure, a blocking insulating layer disposed between the tunnel insulating layer and the electrode structure, and a charge storing layer disposed between the blocking insulating layer and the tunnel insulating layer. The charge storing layer includes a plurality of first charge trap layers having a first energy band gap, and a second charge trap layer having a second energy band gap larger than the first energy band gap. The first charge trap layers are embedded in the second charge trap layer between the gate electrodes and the semiconductor pattern.

公开(公告)号：US10651195B2

公开(公告)日：2020-05-12

申请号：US16168219

申请日：2018-10-23

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kyunghwan Lee ,  Yongseok Kim ,  Byoung-Taek Kim ,  Tae Hun Kim ,  Dongkyun Seo ,  Junhee Lim

IPC: H01L27/11582 ,  H01L27/11565 ,  H01L27/1157 ,  H01L29/423 ,  H01L29/51 ,  H01L27/11556 ,  H01L27/11524

Abstract: A three-dimensional semiconductor memory device includes an electrode structure including gate electrodes and insulating layers, which are alternately stacked on a substrate, a semiconductor pattern extending in a first direction substantially perpendicular to a top surface of the substrate and penetrating the electrode structure, a tunnel insulating layer disposed between the semiconductor pattern and the electrode structure, a blocking insulating layer disposed between the tunnel insulating layer and the electrode structure, and a charge storing layer disposed between the blocking insulating layer and the tunnel insulating layer. The charge storing layer includes a plurality of first charge trap layers having a first energy band gap, and a second charge trap layer having a second energy band gap larger than the first energy band gap. The first charge trap layers are embedded in the second charge trap layer between the gate electrodes and the semiconductor pattern.