-
1.发明授权公开(公告)号：US09733569B2
公开(公告)日：2017-08-15
申请号：US14697068
申请日：2015-04-27
Applicant: SAMSUNG DISPLAY CO. LTD.
Inventor： Yong Son , Min Kang , Bong-Yeon Kim , Hyun-Joo Lee , Jin-Ho Ju
CPC classification number: G03F7/32 , G02B5/1866 , G03F1/38 , G03F7/0007 , G03F7/16 , G03F7/20 , G03F7/2053
Abstract: A mask includes a transparent substrate and a light blocking pattern. The light blocking pattern includes a light blocking part and a diffraction pattern. The light blocking part is disposed on the transparent substrate and is configured to block light. The diffraction pattern includes a plurality of protrusion parts and is configured to diffract the light. The plurality of protrusion parts protrudes from a side of the blocking part and is separated from each other.
-
公开(公告)号：US20170192348A1
公开(公告)日：2017-07-06
申请号：US15464228
申请日：2017-03-20
Applicant: Samsung Display Co., Ltd.
Inventor： DongEon Lee , Min Kang , Bong Yeon Kim , Yong Son , Junhyuk Woo , Hyunjoo Lee , Jinho Ju
CPC classification number: G03F1/30 , G03F1/26 , G03F7/2002 , G03F7/2008 , G03F7/70191 , G03F7/70283 , G03F9/7003 , G03F9/7007
Abstract: A method of forming a pattern includes: preparing a target substrate including a photoresist layer on a base substrate; aligning a phase shift mask to the target substrate, the phase shift mask including a mask substrate comparted into a first region including a first sub region and second sub regions at sides of the first sub region, and second regions at sides of the first region, the phase shift mask including a phase shift layer on the mask substrate corresponding to the first region; fully exposing the photoresist layer at the first sub region and the second regions by utilizing the phase shift mask; and removing the photoresist layer at the first sub region and the second regions to form first and second photoresist patterns corresponding to the second sub regions. Transmittance of the phase shift layer is selected to fully expose the photoresist layer in the first sub region.
-
3.发明授权公开(公告)号：US09417516B2
公开(公告)日：2016-08-16
申请号：US14794079
申请日：2015-07-08
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Bongyeon Kim , Min Kang , Yong Son , Hyunjoo Lee , Myounggeun Cha , Jinho Ju
CPC classification number: H01L21/0268 , G03F1/30 , G03F7/0043 , G03F7/20 , H01L21/02532 , H01L21/02678
Abstract: Provided is a method of manufacturing a display apparatus, the method including forming an amorphous silicon layer on a substrate; changing amorphous silicon in the amorphous silicon layer into crystalline silicon by irradiating the amorphous silicon with a laser beam emitted through a phase shift mask; and forming a display device, the phase shift mask including a base substrate; a barrier layer on the base substrate and including a plurality of transmissive portions which are spaced apart from each other in a first direction; and phase shift portions which alternately fill the plurality of transmissive portions in the first direction.
Abstract translation: 提供一种制造显示装置的方法，所述方法包括在基板上形成非晶硅层; 通过用通过相移掩模发射的激光束照射非晶硅，将非晶硅层中的非晶硅变成晶体硅; 以及形成显示装置，所述相移掩模包括基底基板; 在所述基底基板上的阻挡层，并且包括在第一方向上彼此间隔开的多个透射部; 以及在第一方向交替地填充多个透射部的相移部。
-
4.发明授权公开(公告)号：US09885950B2
公开(公告)日：2018-02-06
申请号：US14691530
申请日：2015-04-20
Applicant: Samsung Display Co., Ltd.
Inventor： Yong Son , Min Kang , Bong Yeon Kim , Hyun Joo Lee , Jin Ho Ju
Abstract: A phase shift mask enables much smaller scale of electronic circuit pattern. A phase shift mask comprises a transparent substrate, a phase shift pattern arranged on the transparent substrate to change a phase of light that penetrates the transparent substrate, and a metal coating layer arranged on at least a part of a surface of the phase shift pattern.
-
公开(公告)号：US09632438B2
公开(公告)日：2017-04-25
申请号：US14604459
申请日：2015-01-23
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： DongEon Lee , Min Kang , Bong Yeon Kim , Yong Son , Junhyuk Woo , Hyunjoo Lee , Jinho Ju
CPC classification number: G03F1/30 , G03F1/26 , G03F7/2002 , G03F7/2008 , G03F7/70191 , G03F7/70283 , G03F9/7003 , G03F9/7007
Abstract: A method of forming a pattern includes: preparing a target substrate including a photoresist layer on a base substrate; aligning a phase shift mask to the target substrate, the phase shift mask including a mask substrate comparted into a first region including a first sub region and second sub regions at sides of the first sub region, and second regions at sides of the first region, the phase shift mask including a phase shift layer on the mask substrate corresponding to the first region; fully exposing the photoresist layer at the first sub region and the second regions by utilizing the phase shift mask; and removing the photoresist layer at the first sub region and the second regions to form first and second photoresist patterns corresponding to the second sub regions. Transmittance of the phase shift layer is selected to fully expose the photoresist layer in the first sub region.
-
Patent Agency Ranking
公开(公告)号：US09436091B2
公开(公告)日：2016-09-06
申请号：US14444255
申请日：2014-07-28
Applicant: Samsung Display Co., Ltd.
Inventor： Yong Son , Min Kang , Bong-Yeon Kim , Dong-Eon Lee , Hyun-joo Lee
IPC: G03F7/20
CPC classification number: G03F7/2016 , G03F7/70375
Abstract: A method for forming a fine pattern includes forming an etching target material layer on a substrate, forming a first photoresist layer on the etching target material layer, forming a metal pattern on the first photoresist layer, the metal pattern having a plurality of lines and thin film lines alternately arranged, the lines having predetermined linewidth and thickness and are spaced apart from each other by a predetermined distance, exciting surface plasmons in the metal pattern by light irradiation to produce a surface plasmon resonance that exposes a fine first pattern shape in the first photoresist layer, forming a first photoresist pattern by removing the metal pattern and developing the first photoresist layer, and etching the etching target material layer by using the first photoresist pattern as a mask.
Abstract translation: 一种形成精细图案的方法包括在基板上形成蚀刻目标材料层，在蚀刻靶材料层上形成第一光致抗蚀剂层，在第一光致抗蚀剂层上形成金属图案，金属图案具有多条线和薄的 薄膜线交替布置，线具有预定的线宽和厚度并且彼此隔开预定距离，通过光照射激发金属图案中的表面等离子体激元，以产生表面等离子体共振，其在第一 光致抗蚀剂层，通过去除金属图案和显影第一光致抗蚀剂层形成第一光致抗蚀剂图案，并且通过使用第一光致抗蚀剂图案作为掩模来蚀刻蚀刻目标材料层。
-
公开(公告)号：US09977324B2
公开(公告)日：2018-05-22
申请号：US15464228
申请日：2017-03-20
Applicant: Samsung Display Co., Ltd.
Inventor： DongEon Lee , Min Kang , Bong Yeon Kim , Yong Son , Junhyuk Woo , Hyunjoo Lee , Jinho Ju
CPC classification number: G03F1/30 , G03F1/26 , G03F7/2002 , G03F7/2008 , G03F7/70191 , G03F7/70283 , G03F9/7003 , G03F9/7007
Abstract: A method of forming a pattern includes: preparing a target substrate including a photoresist layer on a base substrate; aligning a phase shift mask to the target substrate, the phase shift mask including a mask substrate comparted into a first region including a first sub region and second sub regions at sides of the first sub region, and second regions at sides of the first region, the phase shift mask including a phase shift layer on the mask substrate corresponding to the first region; fully exposing the photoresist layer at the first sub region and the second regions by utilizing the phase shift mask; and removing the photoresist layer at the first sub region and the second regions to form first and second photoresist patterns corresponding to the second sub regions. Transmittance of the phase shift layer is selected to fully expose the photoresist layer in the first sub region.
-
公开(公告)号：US09417377B2
公开(公告)日：2016-08-16
申请号：US14473935
申请日：2014-08-29
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Sung Jin Choi , Dong Ho Kim , Bong Jun Park , Yong Son , Yi Seul Song , Jin Ho Oh , Jee Hoon Han
IPC: F21V8/00
CPC classification number: G02B6/0055 , G02B6/0063
Abstract: A display device in a display panel; a backlight unit configured to provide light to the display panel, the display pan& being arranged at a side of a first surface of the backlight unit; and a first light adjustment unit configured to be arranged at a side of a second surface of the backlight unit opposite to the first surface of the backlight unit, the first light adjustment unit including a plurality of reflection portions, reflection portions of the plurality of reflection portions being rotatable so as to be switchable between a light transmission mode and a light reflection mode.
Abstract translation: 显示面板中的显示装置; 背光单元，被配置为向所述显示面板提供光，所述显示盘布置在所述背光单元的第一表面的一侧; 以及第一调光单元，被配置为布置在所述背光单元的与所述背光单元的第一表面相对的第二表面的一侧，所述第一调光单元包括多个反射部，所述多个反射的反射部 可旋转的部分可在光传输模式和光反射模式之间切换。
-
9.发明授权Phase shift mask, patterning method using the same and method of manufacturing display panel using the same 有权相移掩模，使用其的图案化方法以及使用其的显示面板的制造方法公开(公告)号：US09395619B2
公开(公告)日：2016-07-19
申请号：US14307797
申请日：2014-06-18
Applicant: Samsung Display Co., LTD.
Inventor： Yong Son , Min Kang , Bong-Yeon Kim , Dong-Eon Lee , Jun-Hyuk Woo , Hyun-Joo Lee , Sang-Uk Lim , Jin-Ho Ju
CPC classification number: G03F1/26 , G02F2001/136231 , G03F7/20 , G03F7/40 , H01L27/1288
Abstract: A phase shift device includes a phase shift mask which includes a transparent substrate, and a phase shift pattern which is provided on the transparent substrate, and includes a first area having a first thickness, a second area having a second thickness which is less than the first thickness, a first opening having a first opening width and defined at the first area, and a second opening having a second opening width and defined at the second area.
Abstract translation: 相移装置包括：包括透明基板的相移掩模和设置在透明基板上的相移图案，并且包括具有第一厚度的第一区域，第二区域的第二厚度小于 第一厚度，具有第一开口宽度并限定在第一区域的第一开口，以及具有第二开口宽度并限定在第二区域的第二开口。
-
10.发明申请公开(公告)号：US20170371238A1
公开(公告)日：2017-12-28
申请号：US15699955
申请日：2017-09-08
Inventor： Yong Son , Min Kang , Bong-Yeon Kim , Hyun-Joo Lee , Hyang-Shik Kong , Jin-Ho Ju , Kyoung-Sik Kim , Seung-Hwa Baek
Abstract: A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
-
-
-
-
-
-
-
-
-
Search Results
16
records
(took 0.037 seconds)
