公开(公告)号：US09982165B2

公开(公告)日：2018-05-29

申请号：US15355917

申请日：2016-11-18

Applicant: SAMSUNG DISPLAY CO., LTD. ,  UBmaterials Inc.

Inventor： Byoung-Kwon Choo ,  Jin-Hyung Park ,  Jeong-Kyun Na ,  Joon-Hwa Bae ,  Byoung-Ho Cheong ,  Joo-Woan Cho ,  In-Sun Hwang

IPC: C09K13/04 ,  C09G1/02 ,  C09K3/14 ,  H01L27/12 ,  H01L29/786 ,  H01L21/321 ,  H01L27/32 ,  G02F1/1368

CPC classification number: C09G1/02 ,  B81C2201/0104 ,  C09K3/1409 ,  G02F1/1368 ,  G02F2202/104 ,  H01L21/3212 ,  H01L27/1222 ,  H01L27/1274 ,  H01L27/3262 ,  H01L29/66757 ,  H01L29/78675

Abstract: A polishing slurry for silicon, a method of polishing polysilicon, and a method of manufacturing a thin film transistor substrate, the slurry including a polishing particle; a dispersing agent including an anionic polymer, a hydroxyl acid, or an amino acid; a stabilizing agent including an organic acid, the organic acid including a carboxyl group; a hydrophilic agent including a hydrophilic group and a hydrophobic group, and water, wherein the polishing particle is included in the polishing slurry in an amount of about 0.1% by weight to about 10% by weight, based on a total weight of the slurry, a weight ratio of the polishing particle and the dispersing agent is about 1:0.01 to about 1:0.2, a weight ratio of the polishing particle and the stabilizing agent is about 1:0.001 to about 1:0.1, and a weight ratio of the polishing particle and the hydrophilic agent is about 1:0.01 to about 1:3.

公开(公告)号：US20140146564A1

公开(公告)日：2014-05-29

申请号：US13972660

申请日：2013-08-21

Applicant: Samsung Display Co., Ltd.

Inventor： Hyun-Deok IM ,  Oleg Prudnikov ,  Byoung-Ho Cheong ,  Hyun-Jin Cho ,  Guk-Hyun Kim

IPC: F21V8/00

CPC classification number: G02B6/0088 ,  G02B6/0046 ,  G02B6/0053 ,  G02B6/0055

Abstract: A backlight unit includes a light source part, a light guide plate, a prism sheet, and a reflecting element. The light source part is configured to provide light. The light guide plate includes: a light incident portion disposed adjacent to the light source part, a corresponding portion spaced apart from and facing the light incident portion, a light exiting surface, and a bottom surface spaced apart from and facing the light exiting surface. A thickness of the light incident portion is greater than a thickness of the corresponding portion. The prism sheet is disposed on the light guide plate. The prism sheet includes a plurality of prisms extending toward the light guide plate. The reflecting element is disposed under the light guide plate. The reflecting element is configured to reflect at least some of the light toward the light guide plate.

Abstract translation: 背光单元包括光源部，导光板，棱镜片和反射元件。 光源部分被配置成提供光。 导光板包括：与光源部分相邻设置的光入射部分，与光入射部分间隔开并面对光入射部分的对应部分，光出射表面以及与光出射表面间隔开并面向光出射表面的底表面。 光入射部分的厚度大于相应部分的厚度。 棱镜片设置在导光板上。 棱镜片包括朝向导光板延伸的多个棱镜。 反射元件设置在导光板的下方。 反射元件构造成将至少一些光反射到导光板。

公开(公告)号：US09620361B2

公开(公告)日：2017-04-11

申请号：US14600113

申请日：2015-01-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Byoung-Kwon Choo ,  Sang-Hoon Ahn ,  Byoung-Ho Cheong ,  Joo-Woan Cho ,  Hyun-Jin Cho ,  Soo-Yeon Han

IPC: H01L21/02 ,  H01L27/146

CPC classification number: H01L21/02683 ,  H01L21/02532 ,  H01L21/02686 ,  H01L21/02691 ,  H01L27/14698

Abstract: An apparatus for crystallizing an active layer of a thin film transistor, the apparatus includes a first laser irradiating a first beam toward a substrate, an amorphous layer on the substrate being crystallizable into the active layer of the thin film transistor by the first beam, and a second laser irradiating a second beam toward the substrate to heat the active layer, the second beam having an asymmetric intensity profile in a scanning direction of the first and second beams.