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14 条记录 (耗时 0.013 秒)

    PLASMA REACTORS HAVING RECUPERATORS
    1.
    发明申请
    PLASMA REACTORS HAVING RECUPERATORS 审中-公开

    公开(公告)号：US20200312638A1

    公开(公告)日：2020-10-01

    申请号：US16805670

    申请日：2020-02-28

    申请人： ReCarbon, Inc.

    发明人： George Stephen Leonard, III ,  Stefan Andrew McClelland ,  Jae Mo Koo

    IPC分类号： H01J37/32

    摘要： A plasma generating system includes a waveguide for transmitting a microwave energy therethrough and an inner wall disposed within the waveguide to define a plasma cavity, where a plasma is generated within the plasma cavity using the microwave energy. The plasma generating system further includes: an adaptor having a gas outlet through which an exhaust gas processed by the plasma exits the plasma cavity; and a recuperator directly attached to the adaptor and having a gas passageway that is in fluid communication with the gas outlet in the adaptor. The recuperator recovers heat energy from the exhaust gas and heats an input gas using the heat energy.

    DURABLE AUTO-IGNITION DEVICE FOR PLASMA REACTOR
    2.
    发明申请
    DURABLE AUTO-IGNITION DEVICE FOR PLASMA REACTOR 审中-公开

    公开(公告)号：US20200306716A1

    公开(公告)日：2020-10-01

    申请号：US16805661

    申请日：2020-02-28

    申请人： ReCarbon, Inc.

    发明人： George Stephen Leonard, III ,  Stefan Andrew McClelland ,  Curtis Peter Tom

    IPC分类号： B01J19/12 ,  H05H1/46

    摘要： The present invention provides a plasma generating system that includes: a plasma cavity for generating a plasma therewithin by use of microwave energy; an adaptor electrically grounded and having a gas outlet through which an exhaust gas processed by the plasma exits the plasma cavity; and an ignition device mounted on the adaptor. The ignition device includes: a first electrode electrically grounded; and a second electrode electrically floating and configured to convert a portion of the microwave energy into an electrostatic discharge to thereby develop a voltage difference between the first and second electrodes, where the voltage difference generates a spark discharge between the first electrode and the second electrode to create the plasma.

    PLASMA CHAMBER WITH ANCILLARY REACTION CHAMBER
    6.
    发明申请
    PLASMA CHAMBER WITH ANCILLARY REACTION CHAMBER 有权

    公开(公告)号：US20220293400A1

    公开(公告)日：2022-09-15

    申请号：US17654577

    申请日：2022-03-11

    申请人： RECARBON, INC.

    发明人： George Stephen Leonard, III ,  Stefan Andrew McClelland ,  John Joseph Rehagen ,  Jae Mo Koo

    IPC分类号： H01J37/32

    摘要： A plasma reaction system may include a plasma chamber and an ancillary reaction chamber. The plasma chamber may include a plasma chamber inlet for introducing reactant gases into the plasma chamber, plasma chamber walls that form an interior space in which chemical reactions between the reactant gases may occur, a plasma generated within the plasma chamber, a waveguide for directing energy towards the plasma generated within the plasma chamber, and a plasma chamber outlet for carrying first outlet gases from the plasma chamber. The ancillary reaction chamber may include an ancillary reaction chamber inlet configured to obtain the first outlet gases from the plasma chamber, ancillary reaction chamber walls that form an interior space of the ancillary reaction chamber in which second chemical reactions between the outlet gases may occur, and an ancillary reaction chamber outlet for carrying second outlet gases from the ancillary reaction chamber.

    Plasma reactor for processing gas
    7.
    发明授权
    Plasma reactor for processing gas 有权

    公开(公告)号：US10832893B2

    公开(公告)日：2020-11-10

    申请号：US16752689

    申请日：2020-01-26

    申请人： ReCarbon, Inc.

    发明人： Stefan Andrew McClelland ,  George Stephen Leonard, III ,  Jae Mo Koo

    IPC分类号： H01J37/32

    摘要： The present invention provides a plasma generating system that includes: a waveguide for transmitting a microwave energy therethrough; an inner wall disposed within the waveguide to define a plasma cavity, wherein a plasma is generated within the plasma cavity using the microwave energy; a first gas inlet mounted on a first side of the waveguide and configured to introduce a first gas into the plasma cavity and generate a first vortex flow within the plasma cavity using the first gas, the first gas inlet having a through hole through which a gas processed by the plasma exits the plasma cavity; and a plasma stabilizer having a shape of a circular hollow cylinder and installed on a second side of the waveguide, an axial direction of the plasma stabilizer being in parallel to a rotational axis of the first vortex flow.

    OPTICAL SYSTEM FOR MONITORING PLASMA REACTIONS AND REACTORS
    8.
    发明申请
    OPTICAL SYSTEM FOR MONITORING PLASMA REACTIONS AND REACTORS 审中-公开

    公开(公告)号：US20200312639A1

    公开(公告)日：2020-10-01

    申请号：US16820669

    申请日：2020-03-16

    申请人： ReCarbon, Inc.

    发明人： Curtis Peter Tom ,  Fei Xie ,  Wei Li ,  Stefan Andrew McClelland

    IPC分类号： H01J37/32 ,  G01J1/42 ,  G01J1/04

    摘要： The present invention provides a plasma generating system that includes: a waveguide; a plasma cavity coupled to the waveguide and configured to generate a plasma therewithin by use of microwave energy; a hollow cylinder protruding from a wall of the waveguide and having a bottom cap that has an aperture; a detection unit for receiving the light emitted by the plasma through the aperture and configured to measure intensities of the light in an ultraviolet (UV) range and an infrared (IR) range; and a controller for controlling the detection unit.

    REACTOR FOR PROCESSING GAS
    9.
    发明公开
    REACTOR FOR PROCESSING GAS 审中-公开

    公开(公告)号：US20230241574A1

    公开(公告)日：2023-08-03

    申请号：US17649795

    申请日：2022-02-02

    申请人： RECARBON, INC.

    发明人： George Stephen Leonard, III ,  John Joseph Rehagen ,  Stefan Andrew McClelland

    IPC分类号： B01J19/24 ,  B01J19/00

    CPC分类号： B01J19/2405 ,  B01J19/006 ,  B01J19/245 ,  B01J19/248 ,  B01J2219/00763 ,  B01J2219/1943

    摘要： A gas reactor may include a reactor chamber having a first end, a second end, and a lateral surface that extends between the first end and the second end. The gas reactor may include a torch inlet positioned at the first end of the reactor chamber, and the torch inlet may be configured for input flow of a fuel in a first flow direction. The gas reactor may include a reactant inlet positioned at the second end of the reactor chamber and configured to cause a reactant to flow into the reactor chamber in a second flow direction. The fuel or the reactant may move through the reactor chamber in a vortex flow pattern. The gas reactor may include an outlet port positioned at the second end of the reactor chamber in which the outlet port is configured for output flow of a product from the reactor chamber.

    Plasma reactors having recuperators
    10.
    发明授权
    Plasma reactors having recuperators 有权

    公开(公告)号：US10854429B2

    公开(公告)日：2020-12-01

    申请号：US16805670

    申请日：2020-02-28

    申请人： ReCarbon, Inc.

    发明人： George Stephen Leonard, III ,  Stefan Andrew McClelland ,  Jae Mo Koo

    IPC分类号： H01J37/32 ,  C23C16/511 ,  H05H1/46 ,  G01J1/04 ,  G01J1/42 ,  B01J19/12

    摘要： A plasma generating system includes a waveguide for transmitting a microwave energy therethrough and an inner wall disposed within the waveguide to define a plasma cavity, where a plasma is generated within the plasma cavity using the microwave energy. The plasma generating system further includes: an adaptor having a gas outlet through which an exhaust gas processed by the plasma exits the plasma cavity; and a recuperator directly attached to the adaptor and having a gas passageway that is in fluid communication with the gas outlet in the adaptor. The recuperator recovers heat energy from the exhaust gas and heats an input gas using the heat energy.