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公开(公告)号：US20230227611A1
公开(公告)日：2023-07-20
申请号：US18098996
申请日：2023-01-19
发明人： Donggeun JUNG , Namwuk BAEK , Jihwan CHA , Taesoon JANG , Shinwon KANG , Yoonsu PARK , Hyuna LIM
CPC分类号： C08G77/12 , C08G77/06 , C08J5/18 , C12N5/0662 , C12N5/0693 , B05D1/62 , B05D3/145 , B05D3/0254 , C08J2383/05 , C12N2533/30
摘要： The present application relates to a plasma polymer thin film and a method for preparing the same, the plasma polymer thin film prepared using a first precursor material represented by the following Chemical Formula 1:
(In Chemical Formula 1,
R1 to R9 are each independently H or a C1-C5 substituted or unsubstituted alkyl group, and when R1 to R9 are substituted, the substituent is an amino group, a hydroxyl group, a cyano group, a halogen group, a nitro group, or a methoxy group).-
2.发明申请公开(公告)号：US20200071565A1
公开(公告)日：2020-03-05
申请号：US16549150
申请日：2019-08-23
发明人： Donggeun JUNG , Wonjin BAN , Sungyool KWON , Yoonsoo PARK , Hyuna LIM , Younghyun KIM
IPC分类号： C09D183/10 , C08G77/06 , C08G77/42 , C09D183/04 , C09D5/00 , H01L23/532 , H01L23/522 , H01L21/02
摘要： A plasma polymerized thin film having low dielectric constant prepared by depositing a first precursor material represented by the following Chemical Formula 1: wherein in the above Chemical Formula 1, R1 to R14 are each independently H or a substituted or non-substituted C1-C5 alkyl group, and when the R1 to R14 are substituted, their substituents comprise an amino group, a hydroxyl group, a cyano group, a halogen group, a nitro group, or a methoxy group.
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公开(公告)号：US20180371419A1
公开(公告)日：2018-12-27
申请号：US16012038
申请日：2018-06-19
发明人： Donggeun JUNG , Sungyool KWON , Wonjin BAN , Hyuna LIM , Yoonsoo PARK
IPC分类号： C12N5/0775 , C23C16/50 , B05D1/00
摘要： The present disclosure relates to a method of fabricating a substrate for culturing stem cells, including forming a plasma polymer layer from a precursor material on a substrate using plasma, and the precursor material contains a heteroaromatic compound or a linear compound.
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