公开(公告)号：US20200071565A1

公开(公告)日：2020-03-05

申请号：US16549150

申请日：2019-08-23

申请人： Research & Business Foundation Sungkyunkwan University

发明人： Donggeun JUNG ,  Wonjin BAN ,  Sungyool KWON ,  Yoonsoo PARK ,  Hyuna LIM ,  Younghyun KIM

IPC分类号： C09D183/10 ,  C08G77/06 ,  C08G77/42 ,  C09D183/04 ,  C09D5/00 ,  H01L23/532 ,  H01L23/522 ,  H01L21/02

摘要： A plasma polymerized thin film having low dielectric constant prepared by depositing a first precursor material represented by the following Chemical Formula 1: wherein in the above Chemical Formula 1, R1 to R14 are each independently H or a substituted or non-substituted C1-C5 alkyl group, and when the R1 to R14 are substituted, their substituents comprise an amino group, a hydroxyl group, a cyano group, a halogen group, a nitro group, or a methoxy group.

公开(公告)号：US20180371419A1

公开(公告)日：2018-12-27

申请号：US16012038

申请日：2018-06-19

申请人： RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY

发明人： Donggeun JUNG ,  Sungyool KWON ,  Wonjin BAN ,  Hyuna LIM ,  Yoonsoo PARK

IPC分类号： C12N5/0775 ,  C23C16/50 ,  B05D1/00

摘要： The present disclosure relates to a method of fabricating a substrate for culturing stem cells, including forming a plasma polymer layer from a precursor material on a substrate using plasma, and the precursor material contains a heteroaromatic compound or a linear compound.