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    Batch-type heat treatment apparatus and control method for the batch-type heat treatment apparatus
    2.
    发明授权
    Batch-type heat treatment apparatus and control method for the batch-type heat treatment apparatus 有权
    批式热处理装置和批式热处理装置的控制方法

    公开(公告)号：US06803548B2

    公开(公告)日：2004-10-12

    申请号：US09950876

    申请日：2001-09-13

    申请人： Wenling Wang ,  Koichi Sakamoto ,  Fujio Suzuki ,  Moyuru Yasuhara ,  Sunil Shah ,  Pradeep Pandey ,  Mark Erickson

    发明人： Wenling Wang ,  Koichi Sakamoto ,  Fujio Suzuki ,  Moyuru Yasuhara ,  Sunil Shah ,  Pradeep Pandey ,  Mark Erickson

    IPC分类号： H05B102

    CPC分类号： H01L21/67109 ,  C23C16/46 ,  C23C16/52 ,  C30B31/18 ,  F27D19/00 ,  F27D21/0014 ,  G05D23/1932 ,  H01L21/67248

    摘要： A heat treatment apparatus for making a heat treatment while estimating temperatures of objects-to-be-processed that can estimate correct temperatures of the objects-to-be-processed. A reaction tube includes heaters and temperature sensors, and receives a wafer boat. A controller estimates temperatures of wafers and temperatures of the temperature sensors in zones in the reaction tube corresponding to the heaters by using the temperature sensors and electric powers of the heaters. Based on relationships between estimated temperatures of the temperature sensors and really metered temperatures, functions expressing the relationships between the estimated temperatures and the really metered temperatures are given for the respective zones. The functions are substituted by the estimated wafer temperatures to correct the estimated wafer temperatures. Electric powers to be fed to the respective heaters are respectively controlled so that the corrected wafer temperatures are converged to target temperature trajectories.

    摘要翻译： 一种用于进行热处理的热处理装置，同时估计能够估计被处理物体的正确温度的待处理物体的温度。 反应管包括加热器和温度传感器，并接收晶片舟。 控制器通过使用温度传感器和加热器的电力来估计对应于加热器的反应管中的晶片温度和温度传感器的温度。 基于温度传感器的估计温度和真正计量温度之间的关系，给出了各个区域表达估计温度和真实计量温度之间的关系的函数。 功能由估计的晶片温度代替，以校正估计的晶片温度。 分别控制供给到各个加热器的电力，使得校正的晶片温度收敛到目标温度轨迹。

    Batch type heat treatment system, method for controlling same, and heat treatment method
    3.
    发明授权
    Batch type heat treatment system, method for controlling same, and heat treatment method 有权
    批式热处理系统，其控制方法和热处理方法

    公开(公告)号：US06730885B2

    公开(公告)日：2004-05-04

    申请号：US09897908

    申请日：2001-07-05

    申请人： Fujio Suzuki ,  Wenling Wang ,  Koichi Sakamoto ,  Moyuru Yasuhara ,  Sunil Shah ,  Pradeep Pandey

    发明人： Fujio Suzuki ,  Wenling Wang ,  Koichi Sakamoto ,  Moyuru Yasuhara ,  Sunil Shah ,  Pradeep Pandey

    IPC分类号： H05B302

    CPC分类号： H01L21/67248 ,  H01L21/67109

    摘要： There is provided a batch type heat treatment system, control method and heat treatment method capable of appropriately coping with a multi-product small-lot production. A reaction tube 2 comprises a plurality of heaters 31 through 35 and a plurality of temperature sensors, and houses therein a wafer boat 23. A control part 100 stores therein many mathematical models for estimating (calculating) the temperature of wafers W in the reaction tube 2, in accordance with the number and arranged position of the wafers W mounted on the wafer boat 23, and many target temperature trajectories. If the wafer boat 23 is loaded in the reaction tube 2, a mathematical model and a target temperature trajectory corresponding to the number and arranged position of the mounted wafers W are read. If a deposition process is started, the output of a temperature sensor S and the model are used for estimating the temperature of the wafers W in the reaction tube 2, and the powers to be supplied to the heaters 31 through 35 are separately controlled so that the estimated temperature approaches the target temperature trajectory.

    摘要翻译： 提供能够适当应对多产品小批量生产的批式热处理系统，控制方法和热处理方法。反应管2包括多个加热器31至35和多个温度传感器，以及 在其中容纳晶片舟23.控制部分100存储许多用于根据安装在晶片舟23上的晶片W的数量和布置位置来估计（计算）反应管2中的晶片W的温度的数学模型 ，以及许多目标温度轨迹。 如果晶片舟23装载在反应管2中，则读取与安装的晶片W的数量和排列位置对应的数学模型和目标温度轨迹。 如果开始沉积工艺，则使用温度传感器S和模型的输出来估计反应管2中的晶片W的温度，并且分别控制供给到加热器31至35的功率，使得 估计的温度接近目标温度轨迹。

    Methods and systems for application cluster virtual nodes
    4.
    发明授权
    Methods and systems for application cluster virtual nodes 有权
    应用集群虚拟节点的方法和系统

    公开(公告)号：US09075809B1

    公开(公告)日：2015-07-07

    申请号：US11864956

    申请日：2007-09-29

    申请人： Sunil Shah ,  Ynn-Pying A. Tsaur ,  Sudhir Subbarao

    发明人： Sunil Shah ,  Ynn-Pying A. Tsaur ,  Sudhir Subbarao

    IPC分类号： G06F17/30

    CPC分类号： G06F17/30067 ,  G06F11/1448 ,  G06F17/30008 ,  G06F17/30126 ,  G06F2201/80

    摘要： A method for creating an application cluster virtual node. The method may comprise identifying a plurality of nodes associated with an application cluster. The method may also comprise creating a virtual node that is associated with each node in the plurality of nodes. The method may comprise providing a data protection server with access to at least one node in the plurality of nodes. The access may be provided through the virtual node. A computer-readable medium is also disclosed.

    摘要翻译： 一种创建应用程序集群虚拟节点的方法。 该方法可以包括识别与应用集群相关联的多个节点。 该方法还可以包括创建与多个节点中的每个节点相关联的虚拟节点。 该方法可以包括向数据保护服务器提供对多个节点中的至少一个节点的访问。 可以通过虚拟节点提供访问。 还公开了一种计算机可读介质。

    Methods of using a silicon nanoparticle fluid to control in situ a set of dopant diffusion profiles
    5.
    发明授权
    Methods of using a silicon nanoparticle fluid to control in situ a set of dopant diffusion profiles 有权
    使用硅纳米颗粒流体原位控制一组掺杂剂扩散分布的方法

    公开(公告)号：US08163587B2

    公开(公告)日：2012-04-24

    申请号：US12506811

    申请日：2009-07-21

    申请人： Giuseppe Scardera ,  Dmitry Poplavskyy ,  Michael Burrows ,  Sunil Shah

    发明人： Giuseppe Scardera ,  Dmitry Poplavskyy ,  Michael Burrows ,  Sunil Shah

    IPC分类号： H01L21/22

    CPC分类号： H01L21/2255 ,  H01L31/068 ,  Y02E10/547

    摘要： A method of forming a multi-doped junction on a substrate is disclosed. The method includes providing the substrate doped with boron atoms, the substrate comprising a front substrate surface, and depositing an ink on the front substrate surface in an ink pattern, the ink comprising a set of nanoparticles and a set of solvents. The method further includes heating the substrate in a baking ambient to a first temperature of between about 200° C. and about 800° C. and for a first time period of between about 3 minutes and about 20 minutes in order to create a densified film ink pattern. The method also includes exposing the substrate to a dopant source in a diffusion furnace with a deposition ambient, the deposition ambient comprising POCl3, a carrier N2 gas, a main N2 gas, and a reactive O2 gas, wherein a ratio of the carrier N2 gas to the reactive O2 gas is between about 1:1 to about 1.5:1, at a second temperature of between about 700° C. and about 1000° C., and for a second time period of about 5 minutes to about 35 minutes. The method also includes heating the substrate in a drive-in ambient to a third temperature of between about 800° C. and about 1100° C.

    摘要翻译： 公开了一种在衬底上形成多掺杂结的方法。 所述方法包括提供掺杂有硼原子的衬底，所述衬底包括前衬底表面，以及以油墨图案在所述前衬底表面上沉积墨，所述油墨包括一组纳米颗粒和一组溶剂。 该方法还包括将烘烤环境中的基材加热至约200℃至约800℃的第一温度和约3分钟至约20分钟的第一时间段，以便产生致密化的膜 墨水图案。 该方法还包括在具有沉积环境的扩散炉中将衬底暴露于掺杂剂源，沉积环境包括POCl 3，载体N2气体，主N 2气体和反应性O 2气体，其中载气N2气体 至反应性O 2气体的摩尔比为约1:1至约1.5:1，第二温度为约700℃至约1000℃，第二时间为约5分钟至约35分钟。 该方法还包括将驱动环境中的衬底加热至约800℃至约1100℃的第三温度。

    Heat exchanger performance monitoring and analysis method and system
    8.
    发明申请
    Heat exchanger performance monitoring and analysis method and system 有权
    换热器性能监测与分析方法与系统

    公开(公告)号：US20050133211A1

    公开(公告)日：2005-06-23

    申请号：US10879459

    申请日：2004-06-29

    申请人： Mark Osborn ,  Vijaysai Prasad ,  Lijie Yu ,  Venkatarao Ryali ,  Sunil Shah ,  Ivy Man Chong ,  Shirley Au ,  Nishith Vora

    发明人： Mark Osborn ,  Vijaysai Prasad ,  Lijie Yu ,  Venkatarao Ryali ,  Sunil Shah ,  Ivy Man Chong ,  Shirley Au ,  Nishith Vora

    IPC分类号： F28F19/00 ,  F28F27/00 ,  F28D15/00

    CPC分类号： F28F27/00 ,  F28F19/00

    摘要： A technique is disclosed for evaluating and monitoring performance of a heat exchanger system. Operating parameters of the system are monitored and fouling factors for heat transfer surfaces of the exchanger are determined. Trending of fouling may be performed over time based upon the fouling factors, and a model of fouling may be selected from known sets of models, or a model may be developed or refined. Fluid treatment, such as water treatment regimes may be taken into account in evaluation of fouling. An automated knowledge based analysis algorithm may diagnose possible caused of fouling based upon sensed and observed parameters and conditions. Corrective actions may be suggested and the system controlled to reduce, avoid or correct for detected fouling.

    摘要翻译： 公开了一种用于评估和监测热交换器系统性能的技术。 监测系统的工作参数，确定交换器传热面的污垢因子。 可以基于污垢因素随时间推移污染的趋势，并且可以从已知的一组模型中选择污垢模型，或者可以开发或改进模型。 在评估污垢时可以考虑流体处理，如水处理方案。 基于自动知识的分析算法可以基于感测和观察到的参数和条件来诊断可能导致的结垢。 可能会建议纠正措施，系统控制以减少，避免或纠正检测到的结垢。

    Method and apparatus for efficiently creating backup files with less redundancy
    9.
    发明授权
    Method and apparatus for efficiently creating backup files with less redundancy 有权
    有效地创建冗余冗余的备份文件的方法和设备

    公开(公告)号：US08201021B1

    公开(公告)日：2012-06-12

    申请号：US11048458

    申请日：2005-01-31

    申请人： Sunil Shah ,  Kirk L. Searls ,  Ynn-Pyng “Anker” Tsaur

    发明人： Sunil Shah ,  Kirk L. Searls ,  Ynn-Pyng “Anker” Tsaur

    IPC分类号： G06F11/00

    CPC分类号： G06F11/1453

    摘要： A method of creating backup files having less redundancy. The method creates a backup file by creating an overhead segment for each file that is to be backed up and creating a data segment containing the data that is to be backed up for each file. After creating the overhead segment and the data segment, the overhead segment is placed into an overhead stream data segment is stored in memory. The overhead segment is also positioned in the overhead stream with a pointer that identifies the data segment within the memory. For backups of subsequent servers or the same server at a later time, the backup software will create a separate overhead stream. However, a plurality of overhead streams may contain pointers to the same data segments such that redundant data segments do not need to be stored in a backup server.

    摘要翻译： 创建冗余冗余的备份文件的方法。 该方法通过为要备份的每个文件创建开销段，并创建一个包含要为每个文件备份的数据的数据段来创建一个备份文件。 在创建开销段和数据段之后，开销段被放置在开销流中，数据段被存储在存储器中。 开销段也位于开销流中，并带有一个用于标识存储器内的数据段的指针。 对于稍后的后续服务器或同一服务器的备份，备份软件将创建一个单独的开销流。 然而，多个开销流可以包含指向相同数据段的指针，使得冗余数据段不需要存储在备份服务器中。