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    Illumination device for optimizing polarization in an illumination pupil
    2.
    发明授权
    Illumination device for optimizing polarization in an illumination pupil 有权

    公开(公告)号：US10690317B2

    公开(公告)日：2020-06-23

    申请号：US15666162

    申请日：2017-08-01

    Applicant: Nikon Corporation

    Inventor： Daniel Gene Smith ,  Michael Sogard

    IPC: F21V7/00 ,  G03F7/20

    Abstract: A new and useful illumination device, e.g. for a lithographic optical imaging system, is provided, and comprises a mirror array located between a radiation source and an illumination pupil. Each mirror element of the mirror array is individually steerable (controllable), and the polarization state of light from each mirror element of the mirror array can be selectively controlled, so that the illumination pupil can be filled with a distribution of light that is selectively controlled.

    ILLUMINATION SYSTEM WITH CURVED 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL
    3.
    发明申请
    ILLUMINATION SYSTEM WITH CURVED 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL 审中-公开

    公开(公告)号：US20200073251A1

    公开(公告)日：2020-03-05

    申请号：US16679052

    申请日：2019-11-08

    Applicant: Nikon Corporation

    Inventor： Daniel Gene Smith ,  David M. Williamson ,  Donis G. Flagello ,  Michael B. Binnard

    IPC: G03F7/20 ,  G02B17/06

    Abstract: A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of two optical reflectors disposed sequentially to transfer EUV radiation incident onto the first optical component to the pattern-source the substantially one-dimensional pattern of which is disposed in a curved surface. In one case, such combination includes only two optical reflectors (each may contain multiple constituent components). The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a 1D EUV exposure tool that additionally includes—includes a projection optical sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

    EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM THAT UTILIZES PATTERN STITCHING
    4.
    发明申请
    EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM THAT UTILIZES PATTERN STITCHING 审中-公开

    公开(公告)号：US20190235393A1

    公开(公告)日：2019-08-01

    申请号：US16379010

    申请日：2019-04-09

    Applicant: NIKON CORPORATION

    Inventor： Michael B. Binnard ,  Daniel Gene Smith ,  David M. Williamson

    IPC: G03F7/20

    Abstract: An extreme ultraviolet lithography system (10) that creates a pattern (230) having a plurality of densely packed parallel lines (232) on a workpiece (22) includes a patterning element (16); an EUV illumination system (12) that directs an extreme ultraviolet beam (13A) at the patterning element (16); a projection optical assembly (18) that directs the extreme ultraviolet beam diffracted off of the patterning element (16) at the workpiece (22); and a pattern blind assembly (26) positioned in a beam path (55) of the extreme ultraviolet beam (13A). The pattern blind assembly (26) shapes the extreme ultraviolet beam (13A) so that an exposure field (28) on the workpiece (22) has a polygonal shape.

    Eighth wave corner cube retarder for laser radar
    5.
    发明授权
    Eighth wave corner cube retarder for laser radar 有权

    公开(公告)号：US10197668B2

    公开(公告)日：2019-02-05

    申请号：US14914616

    申请日：2014-08-29

    Applicant: Nikon Corporation

    Inventor： Daniel Gene Smith

    IPC: G01C3/08 ,  G01S7/481 ,  G01S17/42 ,  G01S17/66 ,  G01S7/499 ,  G02B5/04 ,  G01S17/08 ,  G02B5/122 ,  G02B5/30

    Abstract: Laser radar systems include focusing optical systems having a retroreflector such as a corner cube that is translatable with respect to an objective lens. The retroreflector provides a selected retardance to an interrogation optical beam that is directed to a target as well as to a returned portion of the interrogation optical beam that is directed to a detection system. Typically, an input linearly polarized interrogation beam is returned by the retroreflector as a circularly polarized beam that is directed to the target. Returned beam portions from the target are coupled by the retroreflector to a detection system in a linear polarization that is orthogonal to that of the input linearly polarized optical beam. The retroreflector produces state of polarization changes based on retardance associated with total internal reflection from coated or uncoated optical surfaces. Retroreflector surfaces that are not to introduce retardance are coated with suitable zero or low retardance coatings.

    MEASUREMENT ASSEMBLY WITH FIBER OPTIC ARRAY
    7.
    发明申请
    MEASUREMENT ASSEMBLY WITH FIBER OPTIC ARRAY 审中-公开
    测量组件与光纤阵列

    公开(公告)号：US20140009762A1

    公开(公告)日：2014-01-09

    申请号：US13922867

    申请日：2013-06-20

    Applicant: NIKON CORPORATION

    Inventor： Daniel Gene Smith

    IPC: G01N21/55 ,  G02B6/26

    CPC classification number: G01N21/55 ,  G01B11/14 ,  G01N21/8806 ,  G02B6/262

    Abstract: A measurement assembly (12) that directs a light beam (32) at a surface (16, 56) comprises a light source (20) and a fiber optic array (22). The light source (20) emits the light beam (32) that is directed at the surface (16, 56). Subsequently, the light beam (32) is reflected off of the surface (16, 56) to create a reflected beam (58). The fiber optic array (22) has a first array end (33B) that receives the reflected beam (58). Additionally, the fiber optic array (22) includes a primary fiber (234) and at least one auxiliary fiber (238) that is positioned substantially adjacent to the primary fiber (234) at the first array end (33B). A detector assembly (28) is coupled to the fiber optic array (22) to detect any light from the reflected beam (58) in the primary fiber (234) and the at least one auxiliary fiber (238).

    Abstract translation: 引导光束（32）在表面（16,56）处的测量组件（12）包括光源（20）和光纤阵列（22）。 光源（20）发射指向表面（16,56）的光束（32）。 随后，光束（32）从表面（16,56）反射以产生反射光束（58）。 光纤阵列（22）具有接收反射光束（58）的第一阵列端（33B）。 另外，光纤阵列（22）包括在第一阵列端（33B）处基本上邻近主光纤（234）定位的主光纤（234）和至少一个辅助光纤（238）。 检测器组件（28）耦合到光纤阵列（22）以检测来自主光纤（234）和至少一个辅助光纤（238）中的反射光束（58）的任何光。

    Euv lithography system for dense line patterning
    9.
    发明授权
    Euv lithography system for dense line patterning 有权

    公开(公告)号：US11099483B2

    公开(公告)日：2021-08-24

    申请号：US15599148

    申请日：2017-05-18

    Applicant: Nikon Corporation

    Inventor： Donis G. Flagello ,  David M. Williamson ,  Stephen P. Renwick ,  Daniel Gene Smith ,  Michael B. Binnard

    IPC: G03F7/20

    Abstract: Extreme ultra-violet (EUV) lithography ruling engine specifically configured to print one-dimensional lines on a target workpiece includes source of EUV radiation; a pattern-source defining 1D pattern; an illumination unit (IU) configured to irradiate the pattern-source; and projection optics (PO) configured to optically image, with a reduction factor N>1, the 1D pattern on image surface that is optically-conjugate to the 1D pattern. Irradiation of the pattern-source can be on-axis or off-axis. While 1D pattern has first spatial frequency, its optical image has second spatial frequency that is at least twice the first spatial frequency. The pattern-source can be flat or curved. The IU may include a relay reflector. A PO's reflector may include multiple spatially-distinct reflecting elements aggregately forming such reflector. The engine is configured to not allow formation of optical image of any 2D pattern that has spatial resolution substantially equal to a pitch of the 1D pattern of the pattern-source.

    Illumination system with flat 1D-patterned mask for use in EUV-exposure tool
    10.
    发明授权
    Illumination system with flat 1D-patterned mask for use in EUV-exposure tool 有权

    公开(公告)号：US11054745B2

    公开(公告)日：2021-07-06

    申请号：US16664478

    申请日：2019-10-25

    Applicant: Nikon Corporation

    Inventor： Daniel Gene Smith ,  David M. Williamson

    IPC: G03F7/20 ,  G02B17/06

    Abstract: A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of only three optical components disposed sequentially to transfer EUV radiation incident the first optical component onto the pattern-source. The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a 1D EUV exposure tool that additionally includes a projection optic sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

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