公开(公告)号：US4789294A

公开(公告)日：1988-12-06

申请号：US900711

申请日：1986-08-27

申请人： Mitsuya Sato ,  Shunzo Imai ,  Ryozo Hiraga

发明人： Mitsuya Sato ,  Shunzo Imai ,  Ryozo Hiraga

IPC分类号： H01L21/677 ,  B65H5/08

CPC分类号： H01L21/67778 ,  Y10S414/137 ,  Y10S414/138

摘要： A wafer processing apparatus, comprising a wafer processing station for processing a wafer, a key input portion for inputting wafer processing instructions into the wafer processing station, and wherein at least one of a portion for accommodating a wafer carrier for carrying the wafer, a mechanism for taking the wafer out of the wafer carrier and putting it back into the wafer carrier, wafer alignment station for aligning the wafer and a wafer observing station for allowing an operator to observe the wafer, is disposed at a front side of the apparatus to which the operator faces when actuating the key input portion.

摘要翻译： 一种晶片处理装置，包括用于处理晶片的晶片处理站，用于将晶片处理指令输入晶片处理站的键输入部分，并且其中用于容纳用于承载晶片的晶片载体的部分中的至少一个， 为了将晶片从晶片载体中取出并将其放回到晶片载体中，用于对准晶片的晶片对准站和用于允许操作者观察晶片的晶片观察站被布置在装置的前侧 当操作键输入部分时，操作者面对。

公开(公告)号：US4440493A

公开(公告)日：1984-04-03

申请号：US471062

申请日：1983-03-02

申请人： Ryozo Hiraga

发明人： Ryozo Hiraga

IPC分类号： G03F7/20 ,  G03B27/04

CPC分类号： G03F7/70466

摘要： In an apparatus for printing a mask pattern on a wafer for manufacturing a semiconductor circuit element, the exposure of the mask pattern is effected by being divided into a plurality of times. Each time the divided exposure is effected, the relative positional relation of the mask pattern and the wafer is made to differ by a minute amount. Thereby, a mask pattern thinner than the line width of the mask pattern is formed on the wafer.

摘要翻译： 在用于在用于制造半导体电路元件的晶片上印刷掩模图案的装置中，掩模图案的曝光通过被分割成多次来实现。 每次进行分割曝光时，使掩模图案和晶片的相对位置关系相差微小。 由此，在晶片上形成比掩模图案的线宽更薄的掩模图案。

公开(公告)号：US4202627A

公开(公告)日：1980-05-13

申请号：US900856

申请日：1978-04-28

申请人： Akiyoshi Suzki ,  Ichiro Kano ,  Hideki Yoshinari ,  Masao Tozuka ,  Ryozo Hiraga ,  Yuzo Kato ,  Yasuo Ogino

发明人： Akiyoshi Suzki ,  Ichiro Kano ,  Hideki Yoshinari ,  Masao Tozuka ,  Ryozo Hiraga ,  Yuzo Kato ,  Yasuo Ogino

IPC分类号： G01B11/00 ,  G01B11/02 ,  G02B27/00 ,  G02B27/46 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/70 ,  G01B11/02

摘要： An improved photoelectric detecting apparatus is disclosed in which a subject surface containing a pattern which diffracts light in a predetermined direction is scanned with spotlight and the diffracted light coming from the pattern is detected by means of photoelectric element so as to read out information of the pattern. The apparatus comprises a first photoelectric element for detecting the light diffracted in the predetermined direction, a second photoelectric element adapted for detecting light diffracted in directions other than the predetermined direction and an operational circuit for operating the signal derived from the first photoelectric element and that derived from the second one. Thus, when there is any diffractive matter such as flaw, dust and the like on the subject surface, diffracted light from the diffractive matter is detected by both the first and second photoelectric elements whereas diffracted light from the pattern is detected only by the first photoelectric element. By operating the outputs of the two photoelectric elements only the necessary information of the pattern can be read out.

摘要翻译： 公开了一种改进的光电检测装置，其中包含以预定方向衍射光的图案的被摄体表面用聚光灯扫描，并且通过光电元件检测来自图案的衍射光，以便读出图案的信息 。 该装置包括用于检测沿预定方向衍射的光的第一光电元件，适用于检测沿除了预定方向以外的方向衍射的光的第二光电元件和用于操作从第一光电元件导出的信号的操作电路， 从第二个。 因此，当在物体表面上存在诸如缺陷，灰尘等的衍射物质时，来自衍射物质的衍射光由第一和第二光电元件都被检测，而来自图案的衍射光仅由第一光电 元件。 通过操作两个光电元件的输出，只能读出图案的必要信息。

公开(公告)号：US4315201A

公开(公告)日：1982-02-09

申请号：US884534

申请日：1978-03-08

申请人： Akiyoshi Suzuki ,  Ryozo Hiraga ,  Ichiro Kano ,  Hideki Yoshinari ,  Masao Totsuka ,  Yuzo Kato ,  Yasuo Ogino

发明人： Akiyoshi Suzuki ,  Ryozo Hiraga ,  Ichiro Kano ,  Hideki Yoshinari ,  Masao Totsuka ,  Yuzo Kato ,  Yasuo Ogino

IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  H01L21/67 ,  H01L21/68 ,  G05B1/06

CPC分类号： G03F9/70

摘要： An alignment apparatus for mask and wafer each having alignment marks provided in a narrow strip like area between circuit patterns is disclosed, which mask and wafer are used in manufacturing semiconductor circuit elements. In the apparatus, the mask and wafer are scanned to obtain scan signals by means of which the amount of relative deviation between the alignment marks on mask and wafer is detected. By means of the detected signal, an alignment is effected between the mask and wafer in the apparatus. For this type of alignment apparatus, there is a problem that since the alignment marks are provided in the narrow strip like area, no coincidence between the scanning position and the strip area is attainable with pre-alignment accuracy. Improvement in the alignment apparatus according to the invention lies in that a reading of alignment marks is initiated after the coincidence is photoelectrically detected.

摘要翻译： 公开了一种用于掩模和晶片的对准装置，每个具有设置在电路图案之间的窄带状区域中的对准标记，该掩模和晶片用于制造半导体电路元件。 在该装置中，对掩模和晶片进行扫描以获得扫描信号，通过该扫描信号检测掩模和晶片上的对准标记之间的相对偏离量。 通过检测到的信号，在设备中的掩模和晶片之间进行对准。 对于这种对准装置，存在这样的问题，即由于将对准标记设置在窄条状区域中，所以在预定位精度下不能使扫描位置和条带区域之间重合。 根据本发明的对准装置的改进在于，在光电检测一致之后开始对准标记的读取。

公开(公告)号：US4301363A

公开(公告)日：1981-11-17

申请号：US70986

申请日：1979-08-30

申请人： Akiyoshi Suzuki ,  Ryozo Hiraga ,  Hideki Yoshinari

发明人： Akiyoshi Suzuki ,  Ryozo Hiraga ,  Hideki Yoshinari

IPC分类号： G02B7/00 ,  B23Q15/24 ,  G03F9/00 ,  H01L21/027 ,  G01N21/86

CPC分类号： G03F9/7069 ,  B23Q15/24

摘要： An alignment device of a type, wherein an alignment pattern provided on a mask for fabrication of a semiconductor circuit element and an alignment pattern provided on a wafer are photoelectrically read in a dark field by a flying spot scanning system or a flying image scanning system to detect a relative positional relationship between the mask and the wafer, and a desired positional relationship is obtained by moving at least one of the mask and wafer on the basis of a detected signal. The novel feature of this alignment device resides in that the size of a line forming the alignment pattern along the scanning line is twice or more as large as the size of the scanning spot.

摘要翻译： 一种类型的对准装置，其中设置在用于制造半导体电路元件的掩模上的对准图案和设置在晶片上的对准图案通过飞点扫描系统或飞行图像扫描系统在暗场中被光电读取， 检测掩模和晶片之间的相对位置关系，并且通过基于检测到的信号移动掩模和晶片中的至少一个来获得期望的位置关系。 该对准装置的新颖特征在于沿着扫描线形成对准图案的线的尺寸是扫描点的尺寸的两倍或更多倍。

公开(公告)号：US4545684A

公开(公告)日：1985-10-08

申请号：US435958

申请日：1982-10-22

申请人： Yoichi Kuroki ,  Yukihiro Yoshinari ,  Ryozo Hiraga

发明人： Yoichi Kuroki ,  Yukihiro Yoshinari ,  Ryozo Hiraga

IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F9/7069 ,  G03F9/7076

摘要： Alignment is effected between a mask having a plurality of first alignment marks, a wafer having a plurality of second alignment marks, alignment marks for another step juxtaposed with respect to the second alignment marks and a reference mark indicating the boundary between the second alignment marks and the alignment marks for another step. Alignment is effected by detecting device for detecting the first and second alignment marks and the reference mark and putting out a signal stream, and an electrical circuit for effecting the introduction of signals from the signal stream in accordance with a predetermined timing, extracting from the signal stream a signal regarding the reference mark and effecting the introduction of signals from the again detected signal stream at a timing changed in accordance with the signal regarding the reference mark.

摘要翻译： 在具有多个第一对准标记的掩模，具有多个第二对准标记的晶片，相对于第二对准标记并置的另一个步骤的对准标记和指示第二对准标记和第二对准标记之间的边界的参考标记之间进行对准 对准标记为另一步。 通过用于检测第一和第二对准标记和参考标记并输出信号流的检测装置实现对准，以及用于根据预定定时从信号流引入信号的电路，从信号提取 流出关于参考标记的信号，并且在根据关于参考标记的信号改变的定时处理来自再次检测到的信号流的信号的引入。

公开(公告)号：US4262208A

公开(公告)日：1981-04-14

申请号：US49980

申请日：1979-06-19

申请人： Akiyoshi Suzki ,  Ichiro Kano ,  Hideki Yoshinari ,  Masao Tozuka ,  Ryozo Hiraga ,  Yuzo Kato ,  Yasuo Ogino

发明人： Akiyoshi Suzki ,  Ichiro Kano ,  Hideki Yoshinari ,  Masao Tozuka ,  Ryozo Hiraga ,  Yuzo Kato ,  Yasuo Ogino

IPC分类号： G01B11/00 ,  G02B21/08 ,  G02B21/10 ,  G02B27/00 ,  G03F9/00 ,  H01L21/00 ,  H01L21/027 ,  H01L21/30 ,  G02B21/06

CPC分类号： G03F9/7069 ,  G02B21/082 ,  G02B21/10

摘要： This invention relates to a photo-electrical detecting apparatus for forming a dark-field image of an object on a one-dimensional image sensor and reading said image photo-electrically. The apparatus includes a telecentric objective lens, and a light source image is formed on the clear aperture plane of said lens, said image being in focus in a direction on said plane and out of focus in a perpendicular direction. A line- or band-shaped area of the object is illuminated by the light from said light source image. Thus a dark-field image of the object is formed on said one-dimensional image sensor by providing, on a plane equivalent to said aperture plane, a filter which intercepts the normal reflected light from said object and transmits the scattered light therefrom.

摘要翻译： 本发明涉及一种用于在一维图像传感器上形成物体的暗视场图像和光电读取的光电检测装置。 该装置包括远心物镜，并且在所述透镜的透明孔径平面上形成光源图像，所述图像在所述平面上的方向上聚焦，并且在垂直方向上聚焦。 物体的线条或带状区域被来自所述光源图像的光照射。 因此，在所述一维图像传感器上，通过在与所述孔径平面相当的平面上设置一个截取来自所述物体的法线反射光并从其透射散射光的滤光器，形成所述物体的暗视场图像。

公开(公告)号：US4530604A

公开(公告)日：1985-07-23

申请号：US521016

申请日：1983-08-08

申请人： Kazuhisa Okutsu ,  Katsumi Momose ,  Ryozo Hiraga

发明人： Kazuhisa Okutsu ,  Katsumi Momose ,  Ryozo Hiraga

IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7076

摘要： This specification discloses a method of aligning a mask and a wafer for manufacturing semiconductor circuit elements into a predetermined positional relationship. The method comprises two steps. In a first step, the mask and wafer are aligned by the use of relatively large alignment marks provided on the mask and wafer. In a second step, the mask and wafer are aligned by using relatively small key patterns provided on the mask and wafer and having substantially no positional deviation with respect to actual element (circuit) patterns.

摘要翻译： 本说明书公开了将半导体电路元件制造的掩模和晶片对准为规定的位置关系的方法。 该方法包括两个步骤。 在第一步骤中，通过使用设置在掩模和晶片上的相对较大的对准标记对掩模和晶片进行对准。 在第二步骤中，掩模和晶片通过使用设置在掩模和晶片上的相对小的键图案对准，并且基本上没有相对于实际元件（电路）图案的位置偏移。

公开(公告)号：US4487505A

公开(公告)日：1984-12-11

申请号：US419512

申请日：1982-09-17

申请人： Shigeki Nakano ,  Yasuyoshi Yamada ,  Ryozo Hiraga

发明人： Shigeki Nakano ,  Yasuyoshi Yamada ,  Ryozo Hiraga

IPC分类号： G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30 ,  G02B21/06 ,  G01B11/00

CPC分类号： G03F9/70 ,  G03F9/00 ,  H01L21/30

摘要： An apparatus for processing a signal for aligning a mask having at least one standard mark thereon with a wafer having at least one reference mark thereon, includes a first sensor for sensing the standard mark, a second sensor for sensing the reference mark through the mask, a threshold value determining circuit for detecting a peak value from a signal stream put out by the first sensor and determining a first threshold value and for detecting a peak value from a signal stream put out by the second sensor and determining a second threshold value, a signal converting circuit for converting a signal of a higher level than the first threshold value from the signal stream put out by the first sensor into a first digital signal and for converting a signal of a higher level than the second threshold value from the signal stream put out by the second sensor into a second digital signal, and a composing circuit for composing the first digital signal and the second digital signal.

摘要翻译： 一种用于处理用于将具有至少一个标准标记的掩模与其上具有至少一个参考标记的晶片对准的信号的装置，包括用于感测标准标记的第一传感器，用于通过掩模感测参考标记的第二传感器， 阈值确定电路，用于从由第一传感器输出的信号流检测峰值，并确定第一阈值，并从第二传感器输出的信号流中检测峰值，并确定第二阈值; 信号转换电路，用于将来自第一传感器放出的信号流中的高于第一阈值的信号转换为第一数字信号，并从信号流中转换比第二阈值高的信号 由第二传感器输出到第二数字信号中，以及用于组成第一数字信号和第二数字信号的合成电路。

公开(公告)号：US4275306A

公开(公告)日：1981-06-23

申请号：US16165

申请日：1979-02-23

申请人： Yuzo Kato ,  Yasuo Ogino ,  Ryozo Hiraga ,  Hideki Yoshinari ,  Masao Tozuka ,  Ichiro Kano

发明人： Yuzo Kato ,  Yasuo Ogino ,  Ryozo Hiraga ,  Hideki Yoshinari ,  Masao Tozuka ,  Ichiro Kano

IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  H01L21/67 ,  H01L21/68 ,  G01N21/86

CPC分类号： G03F9/70 ,  H01L21/681

摘要： An alignment apparatus in which alignment marks on a mask and a wafer for producing a semiconductor circuit element are photoelectrically read and the positional deviation between the two alignment marks is detected and one of the mask and the wafer is parallel-moved in accordance with the detected amount to align the mask and wafer into a predetermined positional relation. This apparatus has the function of correcting any interval error which may be present between the alignment marks.

摘要翻译： 对其进行光电读取的掩模和用于制造半导体电路元件的晶片的对准标记，并且检测出两个对准标记之间的位置偏差，并根据检测到的掩模和晶片中的一个平行移动 将掩模和晶片对准到预定的位置关系。 该装置具有校正可能存在于对准标记之间的间隔误差的功能。