公开(公告)号：US4545684A

公开(公告)日：1985-10-08

申请号：US435958

申请日：1982-10-22

申请人： Yoichi Kuroki ,  Yukihiro Yoshinari ,  Ryozo Hiraga

发明人： Yoichi Kuroki ,  Yukihiro Yoshinari ,  Ryozo Hiraga

IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F9/7069 ,  G03F9/7076

摘要： Alignment is effected between a mask having a plurality of first alignment marks, a wafer having a plurality of second alignment marks, alignment marks for another step juxtaposed with respect to the second alignment marks and a reference mark indicating the boundary between the second alignment marks and the alignment marks for another step. Alignment is effected by detecting device for detecting the first and second alignment marks and the reference mark and putting out a signal stream, and an electrical circuit for effecting the introduction of signals from the signal stream in accordance with a predetermined timing, extracting from the signal stream a signal regarding the reference mark and effecting the introduction of signals from the again detected signal stream at a timing changed in accordance with the signal regarding the reference mark.

摘要翻译： 在具有多个第一对准标记的掩模，具有多个第二对准标记的晶片，相对于第二对准标记并置的另一个步骤的对准标记和指示第二对准标记和第二对准标记之间的边界的参考标记之间进行对准 对准标记为另一步。 通过用于检测第一和第二对准标记和参考标记并输出信号流的检测装置实现对准，以及用于根据预定定时从信号流引入信号的电路，从信号提取 流出关于参考标记的信号，并且在根据关于参考标记的信号改变的定时处理来自再次检测到的信号流的信号的引入。

公开(公告)号：US4553845A

公开(公告)日：1985-11-19

申请号：US435960

申请日：1982-10-22

申请人： Yoichi Kuroki ,  Yukihiro Yoshinari ,  Ryozo Hiraga

发明人： Yoichi Kuroki ,  Yukihiro Yoshinari ,  Ryozo Hiraga

IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G01B11/00

CPC分类号： G03F9/7088

摘要： An alignment apparatus for aligning a mask having a first mark comprising first mark elements and a wafer having a second mark comprising second mark elements different in width from the first mark elements, comprises a moving mechanism for moving the wafer, a sensor for detecting the first and second marks and putting out a detection signal stream, a signal processing circuit for receiving the detection signal stream, discriminating between the first mark elements and the second mark elements in accordance with their respective pulse widths and creating a discrimination signal and creating a spacing signal regarding a plurality of spacings between the first mark elements and the second mark elements, and a drive circuit for driving the moving mechanism in response to the discrimination signal and the spacing signal. When the first and second mark elements overlap each other or come close to each other and the signals of the two elements cannot be separated, the wafer is moved by a predetermined amount, whereafter detection of the marks is again effected.

摘要翻译： 用于对准具有包括第一标记元件的第一标记的掩模和具有包括具有与第一标记元件不同宽度的第二标记元件的第二标记的晶片的对准装置包括用于移动晶片的移动机构，用于检测第一标记元件的传感器 第二标记和放出检测信号流，用于接收检测信号流的信号处理电路，根据它们各自的脉冲宽度区分第一标记元件和第二标记元件，并产生鉴别信号并产生间隔信号 关于第一标记元件和第二标记元件之间的多个间隔，以及用于响应于判别信号和间隔信号而驱动移动机构的驱动电路。 当第一和第二标记元件彼此重叠或彼此靠近并且两个元件的信号不能分离时，晶片移动预定量，此后再次检测到标记。

公开(公告)号：US4504148A

公开(公告)日：1985-03-12

申请号：US435959

申请日：1982-10-22

申请人： Yoichi Kuroki ,  Yukihiro Yoshinari ,  Ryozo Hiraga

发明人： Yoichi Kuroki ,  Yukihiro Yoshinari ,  Ryozo Hiraga

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7076

摘要： Disclosed is a system to be used with a wafer provided with at least one first alignment mark and a mask provided with a plurality of second alignment marks and which is provided with a detecting device for sensing the first and second alignment marks and putting out detection signals, a signal producing circuit producing a comparison signal, and a signal comparing and producing circuit for comparing the pulse width of the comparison signal with the pulse width of the detection signals and producing a plurality of substitute signals when the pulse width of the detection signal is greater than the pulse width of the comparison signal and wherein when the first and second alignment marks have come close to each other or partly overlapped each other, the respective alignment marks are discriminated.

摘要翻译： 公开了一种与设置有至少一个第一对准标记的晶片和设置有多个第二对准标记的掩模一起使用的系统，并且设置有用于感测第一和第二对准标记并输出检测信号的检测装置 产生比较信号的信号产生电路，以及用于将比较信号的脉冲宽度与检测信号的脉冲宽度进行比较的信号比较和产生电路，并且当检测信号的脉冲宽度为 大于比较信号的脉冲宽度，并且其中当第一和第二对准标记彼此靠近或部分彼此重叠时，鉴别各个对准标记。

公开(公告)号：US4694186A

公开(公告)日：1987-09-15

申请号：US772713

申请日：1985-09-05

申请人： Ruri Onoda ,  Yoichi Kuroki ,  Gen Nakamura

发明人： Ruri Onoda ,  Yoichi Kuroki ,  Gen Nakamura

IPC分类号： G03F9/00 ,  H01J40/14 ,  G01C3/08

CPC分类号： G03F9/70

摘要： A system for photoelectrically detecting a light reflected from an object, such as a semiconductor wafer, irradiated by a light beam supplied from a light source, wherein the amount of irradiation is controlled so as to obtain an optimum photoelectrically-converted signal. According to another aspect of the invention, the amount of irradiation is controlled automatically on the basis of a reflectance of the object which has been detected preparatively. According to another preferred form of the invention, the amount of irradiation is controlled in a time-sharing fashion so as to obtain optimum photoelectrically-converted signals from different portions of the object.

摘要翻译： 一种用于光电检测从由光源提供的光束照射的诸如半导体晶片的物体反射的光的系统，其中控制照射量以获得最佳的光电转换信号。 根据本发明的另一方面，根据已经被预先检测到的物体的反射率自动地控制照射量。 根据本发明的另一优选形式，以分时方式控制照射量，以便从物体的不同部分获得最佳的光电转换信号。

公开(公告)号：US4830500A

公开(公告)日：1989-05-16

申请号：US850710

申请日：1986-04-11

申请人： Yoichi Kuroki ,  Ruri Onoda

发明人： Yoichi Kuroki ,  Ruri Onoda

IPC分类号： G03F9/00

CPC分类号： G03F9/70

摘要： An alignment device usable in the processes for manufacture of semiconductor integrated circuits, for bringing a mask and a semiconductor wafer into a predetermined positional relation by use of alignment marks, prior to effecting transfer of an integrated circuit pattern of the mask onto a photosensitive layer of the wafer. The alignment device is provided with a function of searching a mark signal included in a detection signal for the wafer, on the basis of the dimension of the alignment mark. By this, the alignment mark signal can be accurately detected irrespective of the fact that a noise component might be included in the detection signal for the wafer due to effects of the existence of the photosensitive layer or the like. In another aspect, the alignment device is operable in an operation mode including the mark signal searching step and in another operation mode not including the signal searching step. The selection of the operation mode is determined in accordance with the magnitude of the noise component included in the detection signal for the wafer, whereby an unpreferable decrease in the throughput is prevented. In a further aspect, signals from alignment marks of the mask and the wafer are processed in a parallel fashion whereby substantial reduction in the signal processing time is assured.

摘要翻译： 可用于制造半导体集成电路的方法中的对准装置，用于在将掩模的集成电路图案转移到感光层的感光层上之前，通过使用对准标记将掩模和半导体晶片进行预定的位置关系 晶圆。 对准装置具有基于对准标记的尺寸来搜索包括在晶片的检测信号中的标记信号的功能。 由此，可以精确地检测对准标记信号，而不管由于感光层等的存在的影响，可能在晶片的检测信号中包含噪声分量。 在另一方面，对准装置可以在包括标记信号搜索步骤的操作模式和不包括信号搜索步骤的另一操作模式中操作。 根据晶片的检测信号中包含的噪声分量的大小来确定操作模式的选择，从而防止了不利的吞吐量的降低。 在另一方面，以平行的方式处理来自掩模和晶片的对准标记的信号，从而确保信号处理时间的显着减少。

公开(公告)号：US06499007B1

公开(公告)日：2002-12-24

申请号：US09351902

申请日：1999-07-14

申请人： Yoichi Kuroki ,  Bunei Hamasaki ,  Hiroki Suzukawa ,  Kenichi Kawai ,  Takahiro Senda

发明人： Yoichi Kuroki ,  Bunei Hamasaki ,  Hiroki Suzukawa ,  Kenichi Kawai ,  Takahiro Senda

IPC分类号： G06F945

CPC分类号： G03F7/70525

摘要： In editing of a job parameter in a semiconductor exposure apparatus controlled by the job parameter, which is a collection of parameters, a first parameter set independent of the model of the semiconductor exposure apparatus and a second parameter set dependent upon the model are edited and saved independently. This makes it possible to improve operability of parameter editing and management in the semiconductor exposure apparatus, ease of maintenance thereof and the ability to use job parameters among various models of apparatus.

摘要翻译： 在由作为参数的集合的作业参数控制的半导体曝光装置中的作业参数的编辑中，编辑并保存与半导体曝光装置的模型无关的第一参数集和依赖于模型的第二参数集 独立。 这使得可以提高半导体曝光装置中的参数编辑和管理的可操作性，易于维护以及在各种型号的装置中使用作业参数的能力。

公开(公告)号：US5551170A

公开(公告)日：1996-09-03

申请号：US225903

申请日：1994-04-11

申请人： Hideaki Sakatani ,  Hirofumi Nishida ,  Yoji Uetani ,  Yoichi Kuroki ,  Keiko Hata ,  Tatsuo Fujita ,  Tatsuo Kikawa ,  Seichi Ueno ,  Yukio Hayashida

发明人： Hideaki Sakatani ,  Hirofumi Nishida ,  Yoji Uetani ,  Yoichi Kuroki ,  Keiko Hata ,  Tatsuo Fujita ,  Tatsuo Kikawa ,  Seichi Ueno ,  Yukio Hayashida

IPC分类号： B02C17/00 ,  B09B3/00 ,  F26B11/14 ,  F26B25/22 ,  F26B19/00

CPC分类号： B02C17/002 ,  B09B3/00 ,  F26B11/14 ,  F26B25/22

摘要： Refuse 21 in a refuse container 2 is heated by a heater 16, and the steam generated from the refuse 21 is condensed by a condenser 8. The ambient temperature near the refuse container 2 is detected by a first temperature detector 6, and the output of the heater 16 is controlled by the output of the first temperature detector 6 so that the temperature near the refuse container 2 may be a specific temperature, and the temperature of the steam flowing out from the refuse container 2 into the condenser 8 is detected by a second temperature detector 7 at the condenser 8. When the temperature change of the second temperature detector 7 exceeds a specific value, the drying process is terminated, so that the drying end time can be detected accurately without allowing to scorch.

摘要翻译： 垃圾箱2中的垃圾21被加热器16加热，并且由垃圾21产生的蒸汽被冷凝器8冷凝。垃圾容器2附近的环境温度由第一温度检测器6检测， 加热器16由第一温度检测器6的输出控制，使得垃圾容器2附近的温度可以是特定的温度，并且从垃圾容器2流出到冷凝器8的蒸汽的温度由 第二温度检测器7在冷凝器8处。当第二温度检测器7的温度变化超过特定值时，干燥过程终止，从而可以准确地检测干燥结束时间，而不会使焦烧。