RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM, AND METHOD FOR FORMING RESIST PATTERN

    公开(公告)号:US20180081270A1

    公开(公告)日:2018-03-22

    申请号:US15563366

    申请日:2016-03-17

    IPC分类号: G03F7/038 G03F7/022

    摘要: A radiation-sensitive composition comprising a resist base material (A), an optically active diazonaphthoquinone compound (B), and a solvent (C), wherein the content of the solvent (C) in the composition is 20 to 99% by mass, the content of components except for the solvent (C) is 1 to 80% by mass, and the resist base material (A) is a compound represented by the following formula (1): wherein R1 is a 2n-valent group of 1 to 30 carbon atoms; R2 to R5 are each independently an alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 10 carbon atoms, an alkenyl group of 2 to 10 carbon atoms, an alkoxy group of 1 to 30 carbon atoms, a halogen atom, a thiol group, or a hydroxyl group, wherein at least one of R4 and/or at least one of R5 is one or more kinds selected from a hydroxyl group and a thiol group; m2 and m3 are each independently an integer of 0 to 8; m4 and m5 are each independently an integer of 0 to 9, wherein m4 and m5 are not 0 at the same time; n is an integer of 1 to 4; and p2 to p5 are each independently an integer of 0 to 2.

    RADIATION-SENSITIVE COMPOSITION
    4.
    发明申请

    公开(公告)号:US20180284607A1

    公开(公告)日:2018-10-04

    申请号:US15562389

    申请日:2016-03-02

    IPC分类号: G03F7/022 C08G8/04

    摘要: The present invention provides a radiation-sensitive composition containing (A) a resist base material, (B) an optically active diazonaphthoquinone compound, and (C) a solvent, wherein the content of a solid component in the composition is within the range of 1 to 80% by mass, the content of the solvent is within the range of 20 to 99% by mass, and the resist base material (A) is a compound represented by a specific formula.

    POLYMER COMPOUND, RADIATION SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
    8.
    发明申请
    POLYMER COMPOUND, RADIATION SENSITIVE COMPOSITION AND PATTERN FORMING METHOD 审中-公开
    聚合物化合物,辐射敏感组合物和图案形成方法

    公开(公告)号:US20170059989A1

    公开(公告)日:2017-03-02

    申请号:US15151087

    申请日:2016-05-10

    摘要: A polymer compound including a unit structure represented by the following general formula (1): wherein m1 equals 1 to 8, n1 equals 0 to 7, m1+n1 equals 4 to 8, m2 equals 1 to 8, n2 equals 0 to 7, m2+n2 equals 4 to 8, m1 equals m2, y represents 0 to 2, R1 represents a hydroxy group, a substituted or unsubstituted straight, branched or cyclic alkyl group, a substituted or unsubstituted aryl group, or a halogen atom, R3 represents a hydrogen atom, a substituted or unsubstituted straight, branched or cyclic alkyl group, or a substituted or unsubstituted aryl group, each R2 independently represents any structure represented by general formula (2) in the specification, at least one R2 has an acid-dissociable site, and R5 represents a hydroxy group or —O—R2—O—*.

    摘要翻译: 其中m1等于1至8,n1等于0至7,m1 + n1等于4至8,m2等于1至8,n2等于0至7,m2 + n2等于4至8,m1等于m2,y表示0至2 R 1表示羟基,取代或未取代的直链,支链或环状烷基,取代或未取代的芳基或卤素原子,R 3表示氢原子,取代或未取代的直链,支链或环状烷基,或 取代或未取代的芳基,每个R 2独立地表示说明书中由通式(2)表示的任何结构,至少一个R 2具有酸解离位点,并且R 5表示羟基或-O-R 2 -O- 。

    POLYMER COMPOUND, RADIATION SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
    9.
    发明申请
    POLYMER COMPOUND, RADIATION SENSITIVE COMPOSITION AND PATTERN FORMING METHOD 审中-公开
    聚合物化合物,辐射敏感组合物和图案形成方法

    公开(公告)号:US20170058079A1

    公开(公告)日:2017-03-02

    申请号:US15151131

    申请日:2016-05-10

    CPC分类号: C08G63/668 G03F7/0392

    摘要: A polymer compound including a unit structure represented by the general formula (1): wherein m1 and m2 each equal 1 to 8, n1 and n2 each equal 0 to 7, m1+n1 and m2+n2 each equal 4 to 8, y represents 0 to 2, R1 represents a hydroxy group; a substituted or unsubstituted straight, branched or cyclic alkyl group; a substituted or unsubstituted aryl group, or a halogen atom, R3 represents a hydrogen atom, a substituted or unsubstituted straight, branched or cyclic alkyl group, or a substituted or unsubstituted aryl group, R2 represents any structure represented by general formula (2) in the specification, at least one R2 has an acid-dissociable site, R5 represents a hydroxy group, —O—R2—O—* or —O—R2—O—R55, and R6 represents a hydroxy group or —O—R2—O—*.

    摘要翻译: 其中m1和m2各自等于1至8,n1和n2各自等于0至7,m1 + n1和m2 + n2均等于4至8,y表示0至2,R1表示羟基; 取代或未取代的直链,支链或环状烷基; 取代或未取代的芳基或卤素原子,R3表示氢原子,取代或未取代的直链,支链或环状烷基或取代或未取代的芳基,R2表示通式(2)表示的任何结构, 该说明书中,至少一个R2具有酸解离位点,R5表示羟基,-O-R2-O- *或-O-R2-O-R55,R6表示羟基或-O-R2- O- *。