- 专利标题: RADIATION-SENSITIVE COMPOSITION
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申请号: US15562389申请日: 2016-03-02
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公开(公告)号: US20180284607A1公开(公告)日: 2018-10-04
- 发明人: Masatoshi ECHIGO , Takumi TOIDA , Takashi SATO
- 申请人: Mitsubishi Gas Chemical Company, Inc.
- 优先权: JP2015-073272 20150331
- 国际申请: PCT/JP2016/056337 WO 20160302
- 主分类号: G03F7/022
- IPC分类号: G03F7/022 ; C08G8/04
摘要:
The present invention provides a radiation-sensitive composition containing (A) a resist base material, (B) an optically active diazonaphthoquinone compound, and (C) a solvent, wherein the content of a solid component in the composition is within the range of 1 to 80% by mass, the content of the solvent is within the range of 20 to 99% by mass, and the resist base material (A) is a compound represented by a specific formula.
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