公开(公告)号：US06431814B1

公开(公告)日：2002-08-13

申请号：US09578101

申请日：2000-05-22

Applicant: Eric Christensen ,  Russel Shirley ,  Michael R. Conboy ,  Elfido Coss, Jr.

Inventor： Eric Christensen ,  Russel Shirley ,  Michael R. Conboy ,  Elfido Coss, Jr.

IPC: B65B2102

CPC classification number: H01L21/67294 ,  G01R31/01 ,  H01L21/67271

Abstract: A system for verifying the integrity of components moving within a material handling system ensures that only components of acceptable integrity and condition are allowed to move onto the processing locations of a semiconductor plant. In an example embodiment, components that are warped or cracked are initially detected and scanned by a beam break system and/or an optical system. An integrity verification assessment is made immediately on the component to determine whether the scanned component meets with a predefined baseline parameter or characteristic. The components that do not pass integrity verification are then removed from the material handling system while the components that pass move on to the first processing location.

Abstract translation: 用于验证在材料处理系统内移动的部件的完整性的系统确保仅允许可接受的完整性和条件的部件移动到半导体工厂的处理位置。 在一个示例实施例中，翘曲或破裂的部件最初由束断系统和/或光学系统检测和扫描。 在组件上立即进行完整性验证评估，以确定扫描的组件是否满足预定义的基准参数或特性。 然后，不通过完整性验证的组件从材料处理系统中移除，而传递的组件移动到第一个处理位置。

公开(公告)号：US06403905B1

公开(公告)日：2002-06-11

申请号：US09496874

申请日：2000-02-02

Applicant: Michael R. Conboy ,  Elfido Coss, Jr. ,  Russel Shirley

Inventor： Michael R. Conboy ,  Elfido Coss, Jr. ,  Russel Shirley

IPC: B07C500

CPC classification number: H01L21/67271 ,  G03F7/70741 ,  Y10S209/933

Abstract: A system and method for stocking and sorting reticles used in a semiconductor fabrication facility, the facility having a material handling system that presents a reticle to a photolithography process area. In an example embodiment of the reticle management system, a reticle storage system and a reticle sorting apparatus are coupled to a host system that is adapted to track and control the movement of reticles in the material handling system. The host system is capable of interfacing with a management input module that integrates management directives into the reticle flow plan in the manufacturing process. The result is a reticle management system that is flexible enough to manage a finite number of reticles and pods in minimizing the delivery time of a reticle to the desired location while responding to changing conditions external to the manufacturing process.

Abstract translation: 一种用于在半导体制造设备中使用的放线和分类掩模版的系统和方法，该设备具有将光罩呈现于光刻工艺区域的材料处理系统。 在掩模版管理系统的示例性实施例中，掩模版存储系统和掩模版分类装置耦合到适于跟踪和控制材料处理系统中的标线的运动的主机系统。 主机系统能够与管理输入模块进行接口，管理输入模块将管理指令集成到制造过程中的标线流程图中。 结果是一种掩模版管理系统，其足够灵活以管理有限数量的光罩和荚，以最小化掩模版到所需位置的传送时间，同时响应制造过程外部的变化条件。

公开(公告)号：US06392403B1

公开(公告)日：2002-05-21

申请号：US09496531

申请日：2000-02-02

Applicant: Michael R. Conboy ,  Elfido Coss, Jr. ,  Russel Shirley ,  Eric Christensen

Inventor： Michael R. Conboy ,  Elfido Coss, Jr. ,  Russel Shirley ,  Eric Christensen

IPC: G01R3128

CPC classification number: H01L21/67294 ,  G01R31/01 ,  H01L21/67271

Abstract: An apparatus and a system for stocking and sorting wafers in a wafer processing system reduce cycle time in manufacturing and reduce excessive handling of delicate wafers. In an example embodiment, the apparatus includes in an enclosure having therein a scanner adapted to identify codes located on the wafer carriers that indicate the position of a wafer within the carrier. A sorting mechanism for sorting wafers and carriers within the enclosure is also included as well as a computer arrangement that communicates with the management system of the wafer processing system. One of the advantages of the present invention is the reduction in cycle time that is achieved by sorting wafers immediately on demand while at a stocking location.

Abstract translation: 用于在晶片处理系统中放置和分选晶片的装置和系统减少制造中的周期时间并减少精细晶片的过度处理。 在一个示例性实施例中，该装置包括在其中具有扫描器的外壳中，扫描器适于识别位于晶片载体上的代码，其指示晶片在载体内的位置。 还包括用于在外壳内分选晶片和载体的分拣机构以及与晶片处理系统的管理系统通信的计算机装置。 本发明的优点之一是通过在放养位置时立即分选晶片来实现循环时间的减少。

公开(公告)号：US06699004B1

公开(公告)日：2004-03-02

申请号：US09520591

申请日：2000-03-08

Applicant: Michael R. Conboy ,  Russel Shirley ,  Elfido Coss, Jr.

Inventor： Michael R. Conboy ,  Russel Shirley ,  Elfido Coss, Jr.

IPC: B25J300

CPC classification number: H01L21/67294 ,  H01L21/67271 ,  Y10S414/136

Abstract: Tracking the movement of individual wafers in a semiconductor processing system is improved by using an apparatus to axially rotate a wafer and using both the rotation angle and the wafer's location in the processing system as tracking coordinates. In an example embodiment, the apparatus imparts angles of rotation on the wafers in different stages of wafer processing. The rotation angles of each wafer are collected as data along with the wafer's location in the process. The combined wafer location and angle of rotation data are used to map the path the wafer has traveled from the onset of processing. An important advantage to this apparatus is the increased control and improved yields that the apparatus brings to wafer processing.

Abstract translation: 通过使用装置来轴向旋转晶片并使用处理系统中的旋转角度和晶片的位置作为跟踪坐标来跟踪半导体处理系统中的各个晶片的移动。 在示例性实施例中，该装置在晶片处理的不同阶段赋予晶片上的旋转角度。 每个晶片的旋转角度与晶片在该过程中的位置一起作为数据被收集。 组合的晶片位置和旋转角数据用于映射晶片从处理开始行进的路径。 该设备的一个重要优点是增加了设备对晶片处理带来的控制和提高的产量。

公开(公告)号：US06662070B1

公开(公告)日：2003-12-09

申请号：US09520483

申请日：2000-03-08

Applicant: Michael R. Conboy ,  Sam H. Allen, Jr. ,  Russel Shirley ,  Elfido Coss, Jr.

Inventor： Michael R. Conboy ,  Sam H. Allen, Jr. ,  Russel Shirley ,  Elfido Coss, Jr.

IPC: G06F1900

CPC classification number: H01L21/67276 ,  H01L21/67259

Abstract: The detection of a processing deviation in a cluster tool of a wafer processing system is achieved by assigning individual wafers a set of positional coordinates each time the wafer moves within the cluster tool. In an example embodiment, a wafer is placed into a first chamber of the cluster tool and it is rotated to a certain angle of rotation. Each time the wafer moves within the cluster tool the wafer is given a different angle of rotation; both the rotation angle and the wafer location are then recorded as a set of positional coordinates. The wafer exits the cluster tool and is examined for structural or surface defects that indicate that there was a variation in the processing parameters. A wafer movement map is developed from the positional coordinates and the map is then used as an analysis tool to identify the processing location that caused defect to occur. An important advantage is the increased control and traceability that the tracking method brings to single wafer handling and processing.

Abstract translation: 晶片处理系统的集群工具中的处理偏差的检测是通过每次晶片在集群工具内移动时分配一组位置坐标来实现的。 在示例性实施例中，将晶片放置在群集工具的第一室中，并将其旋转到一定的旋转角度。 每次晶片在集群工具内移动时，晶片都有不同的旋转角度; 然后将旋转角度和晶片位置两者记录为一组位置坐标。 晶片离开集群工具，并检查表明处理参数有变化的结构或表面缺陷。 从位置坐标开发晶片移动图，然后将该图用作分析工具，以识别导致缺陷发生的处理位置。 一个重要的优点是跟踪方法对单晶片处理和处理带来的增加的控制和可追溯性。

公开(公告)号：US06457587B1

公开(公告)日：2002-10-01

申请号：US09545768

申请日：2000-04-10

Applicant: Michael R. Conboy ,  Elfido Coss, Jr. ,  Russel Shirley

Inventor： Michael R. Conboy ,  Elfido Coss, Jr. ,  Russel Shirley

IPC: B07C500

CPC classification number: H01L21/67271 ,  G03F7/70741 ,  Y10S209/933

Abstract: Reticles are selected for use in a wafer processing system based on the wafer-processing recipe and on the level of degradation exhibited by the reticle after multiple exposures to light and constant physical handling. In an example embodiment of an integrated reticle sorter and stocker, a scanner identifies the reticle and gathers dimensional data on each reticle. A sorter sorts reticles within reticle pods according to the processing recipe and stores the pods within a storage location in the stocker. A computer arrangement then records information from the scanner and the sorter and assesses whether any of the reticles has degraded beyond an acceptable level of usage.

Abstract translation: 选择基于晶片处理配方的晶片处理系统中使用的网格以及多次曝光到光和恒定物理处理之后由掩模版显示的劣化程度。 在集成的标线分类器和储片器的示例性实施例中，扫描器识别标线并且收集每个掩模版上的尺寸数据。 分拣机根据处理配方将掩模版分类在标线盒内，并将荚存储在储存器的存储位置内。 然后，计算机装置从扫描仪和分拣机记录信息，并评估是否任何一个掩模版已经超过可接受的使用水平。

公开(公告)号：US07200779B1

公开(公告)日：2007-04-03

申请号：US10133097

申请日：2002-04-26

Applicant: Elfido Coss, Jr. ,  Susan Hickey ,  Michael R. Conboy

Inventor： Elfido Coss, Jr. ,  Susan Hickey ,  Michael R. Conboy

IPC: G06F11/00

CPC classification number: G06F11/0769 ,  G06F11/0709 ,  G06F11/076 ,  G06F11/0781

Abstract: A method and apparatus is provided for fault notification based on a severity level. The method comprises detecting a fault associated with a processing tool that is adapted to process one or more workpieces, determining a fault severity level of the detected fault and selecting at least one user to notify of the fault based on the severity level of the fault.

Abstract translation: 基于严重性级别提供了用于故障通知的方法和装置。 该方法包括检测与处理一个或多个工件的处理工具相关联的故障，确定检测到的故障的故障严重性级别，并且基于故障的严重性级别选择至少一个用户通知故障。

公开(公告)号：US07051250B1

公开(公告)日：2006-05-23

申请号：US10164091

申请日：2002-06-06

Applicant: Sam H. Allen, Jr. ,  Michael R. Conboy ,  Michael L. Miller ,  Elfido Coss, Jr.

Inventor： Sam H. Allen, Jr. ,  Michael R. Conboy ,  Michael L. Miller ,  Elfido Coss, Jr.

IPC: G06F11/00

CPC classification number: G05B19/4184 ,  G05B2219/31355 ,  G05B2219/31365 ,  G05B2219/32243 ,  G05B2219/32254 ,  Y02P90/14 ,  Y02P90/20

Abstract: A method and apparatus is provided for routing workpieces based upon detecting a fault. The method comprises routing a workpiece to a first processing tool identified by a dispatch system, detecting a fault condition associated with the first processing tool and notifying the dispatch system of the detected fault condition. The method further comprises routing a second workpiece to a second processing tool in response to the dispatch system being notified of the fault condition.

Abstract translation: 提供了一种基于检测故障来路由工件的方法和装置。 该方法包括将工件路由到由调度系统识别的第一处理工具，检测与第一处理工具相关联的故障状况并通知调度系统检测到的故障状况。 该方法还包括响应于调度系统被通知故障状况而将第二工件路由到第二处理工具。

公开(公告)号：US06928333B1

公开(公告)日：2005-08-09

申请号：US09387174

申请日：1999-08-31

Applicant: Michael R. Conboy ,  Patrick J. Ryan ,  Elfido Coss, Jr.

Inventor： Michael R. Conboy ,  Patrick J. Ryan ,  Elfido Coss, Jr.

IPC: G06F19/00 ,  G06Q10/00

CPC classification number: G06Q10/06 ,  Y02P90/86

Abstract: According to an example embodiment, the present invention is directed to a new and efficient method for bringing at least two items together from independent locations via separate paths in a computer controlled manufacturing environment. Using the computer, the probabilities for pickup and delivery of each of the two items are generated and used to determine an efficient manner in which to bring the items together via the separate paths.

Abstract translation: 根据示例性实施例，本发明涉及一种用于在计算机控制的制造环境中通过独立路径将独立位置带入至少两个项目的新的和有效的方法。 使用计算机，产生并且使用两个项目中的每一个的拾取和递送的概率来确定通过分开的路径将项目合在一起的有效方式。

公开(公告)号：US06871112B1

公开(公告)日：2005-03-22

申请号：US09479852

申请日：2000-01-07

Applicant: Elfido Coss, Jr. ,  Michael R. Conboy ,  Bryce A. Hendrix

Inventor： Elfido Coss, Jr. ,  Michael R. Conboy ,  Bryce A. Hendrix

IPC: H01L21/02 ,  H01L21/66 ,  G06F19/00

CPC classification number: H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

Abstract: The invention is, in its various aspects, a method and apparatus for dynamically generating trace data reports in a semiconductor fabrication process employing fault detection control. The method comprises specifying data including at least one of a parameter, a trigger, and a frequency, for a trace data report; automatically generating from a fault detection controller a request including the specified data to a report generator; formulating the trace data report responsive to the request; and returning the formulated trace data report from the report generator based on the request. The apparatus is a semiconductor fabrication processing system, comprising: a fabrication tool capable of providing at least one of specified data and a trace data report; a fault detection controller capable of automatically generating a request for the trace data report, the request including the specified data; a report generator capable of requesting at least one of the specified data and the trace data report from the fabrication tool and capable of, if the specified data is requested from the fabrication tool, providing the trace data report; and an operator interface for receiving data specified for the trace data report, the specified data including at least one of a parameter, a trigger, and a frequency for the trace data report, and to which the trace data report may be returned from at least one of the report generator and the fabrication tool.

Abstract translation: 本发明在其各个方面是一种用于在采用故障检测控制的半导体制造过程中动态产生跟踪数据报告的方法和装置。 该方法包括指定用于跟踪数据报告的包括参数，触发和频率中的至少一个的数据; 从故障检测控制器自动生成包括指定数据的请求到报告生成器; 根据请求制定跟踪数据报告; 并根据请求从报告生成器返回已制定的跟踪数据报告。 该装置是半导体制造处理系统，包括：能够提供指定数据和跟踪数据报告中的至少一个的制造工具; 一个故障检测控制器，能够自动产生跟踪数据报告的请求，该请求包括指定的数据; 报告发生器，其能够从所述制造工具请求所述指定数据和跟踪数据报告中的至少一个，并且如果从所述制造工具请求指定的数据，则能够提供所述跟踪数据报告; 以及用于接收为跟踪数据报告指定的数据的操作者界面，所述指定数据包括用于跟踪数据报告的参数，触发和频率中的至少一个，并且跟踪数据报告至少可以从其返回 报告生成器和制作工具之一。