Surface relief waveguides with high refractive index resist

    公开(公告)号:US12222537B2

    公开(公告)日:2025-02-11

    申请号:US18729437

    申请日:2023-01-20

    Abstract: The disclosure describes an improved drop-on-demand, controlled volume technique for dispensing resist onto a substrate, which is then imprinted to create a patterned optical device suitable for use in optical applications such as augmented reality and/or mixed reality systems. The technique enables the dispensation of drops of resist at precise locations on the substrate, with precisely controlled drop volume corresponding to an imprint template having different zones associated with different total resist volumes. Controlled drop size and placement also provides for substantially less variation in residual layer thickness across the surface of the substrate after imprinting, compared to previously available techniques. The technique employs resist having a refractive index closer to that of the substrate index, reducing optical artifacts in the device. To ensure reliable dispensing of the higher index and higher viscosity resist in smaller drop sizes, the dispensing system can continuously circulate the resist.

    AREA SPECIFIC COLOR ABSORPTION IN NANOIMPRINT LITHOGRAPHY

    公开(公告)号:US20250044573A1

    公开(公告)日:2025-02-06

    申请号:US18717946

    申请日:2022-12-16

    Abstract: An eyepiece includes an optical waveguide, a transmissive input coupler at a first end of the optical waveguide, an output coupler at a second end of the optical waveguide, and a polymeric color absorbing region along a portion of the optical waveguide between the transmissive input coupler and the output coupler. The transmissive input coupler is configured to couple incident visible light to the optical waveguide, and the color-absorbing region is configured to absorb a component of the visible light as the visible light propagates through the optical waveguide.

    METHOD OF FABRICATING DIFFRACTION GRATINGS

    公开(公告)号:US20220365262A1

    公开(公告)日:2022-11-17

    申请号:US17868485

    申请日:2022-07-19

    Abstract: A method of fabricating a blazed diffraction grating comprises providing a master template substrate and imprinting periodically repeating lines on the master template substrate in a plurality of master template regions. The periodically repeating lines in different ones of the master template regions extend in different directions. The method additionally comprises using at least one of the master template regions as a master template to imprint at least one blazed diffraction grating pattern on a grating substrate.

    SINGULATION OF OPTICAL WAVEGUIDE MATERIALS

    公开(公告)号:US20210191041A1

    公开(公告)日:2021-06-24

    申请号:US17126574

    申请日:2020-12-18

    Abstract: Methods for singulating an optical waveguide material at a contour include directing a first laser beam onto a first side of the optical waveguide material to generate a first group of perforations in the optical waveguide material. A second laser beam is directed onto a second side of the optical waveguide material to generate a second group of perforations in the optical waveguide material. The second side is opposite the first side. The first group of perforations and the second group of perforations define a perforation zone at the contour. A third laser beam is directed at the perforation zone to singulate the optical waveguide material at the perforation zone.

    SUPERIMPOSED DIFFRACTION GRATINGS FOR EYEPIECES

    公开(公告)号:US20210191025A1

    公开(公告)日:2021-06-24

    申请号:US17194878

    申请日:2021-03-08

    Abstract: Embodiments of the present disclosure are directed to techniques for manufacturing an eyepiece (or eyepiece layer) by applying multiple, different diffraction gratings to a single side of an eyepiece substrate instead of applying different gratings to different sides (e.g., opposite surfaces) of the substrate. Embodiments are also directed to the eyepiece (or eyepiece layer) that is arranged to have multiple, different diffraction gratings on a single side of the eyepiece substrate. In some embodiments, two or more grating patterns are superimposed to create a combination pattern in a template (e.g., a master), which is then used to apply the combination pattern to a single side of the eyepiece substrate. In some embodiments, multiple layers of patterned material (e.g., with differing refraction indices) are applied to a single side of the substrate. In some examples, the combined grating patterns are orthogonal pupil expander and exit pupil expander grating patterns.

    SUPERIMPOSED DIFFRACTION GRATINGS FOR EYEPIECES

    公开(公告)号:US20200158942A1

    公开(公告)日:2020-05-21

    申请号:US16685505

    申请日:2019-11-15

    Abstract: Embodiments of the present disclosure are directed to techniques for manufacturing an eyepiece (or eyepiece layer) by applying multiple, different diffraction gratings to a single side of an eyepiece substrate instead of applying different gratings to different sides (e.g., opposite surfaces) of the substrate. Embodiments are also directed to the eyepiece (or eyepiece layer) that is arranged to have multiple, different diffraction gratings on a single side of the eyepiece substrate. In some embodiments, two or more grating patterns are superimposed to create a combination pattern in a template (e.g., a master), which is then used to apply the combination pattern to a single side of the eyepiece substrate. In some embodiments, multiple layers of patterned material (e.g., with differing refraction indices) are applied to a single side of the substrate. In some examples, the combined grating patterns are orthogonal pupil expander and exit pupil expander grating patterns.

    Patterning of high refractive index glasses by plasma etching

    公开(公告)号:US10442727B2

    公开(公告)日:2019-10-15

    申请号:US15862078

    申请日:2018-01-04

    Abstract: Plasma etching processes for forming patterns in high refractive index glass substrates, such as for use as waveguides, are provided herein. The substrates may be formed of glass having a refractive index of greater than or equal to about 1.65 and having less than about 50 wt % SiO2. The plasma etching processes may include both chemical and physical etching components. In some embodiments, the plasma etching processes can include forming a patterned mask layer on at least a portion of the high refractive index glass substrate and exposing the mask layer and high refractive index glass substrate to a plasma to remove high refractive index glass from the exposed portions of the substrate. Any remaining mask layer is subsequently removed from the high refractive index glass substrate. The removal of the glass forms a desired patterned structure, such as a diffractive grating, in the high refractive index glass substrate.

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