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公开(公告)号：US20170015776A1
公开(公告)日：2017-01-19
申请号：US15124873
申请日：2015-03-11
Applicant: MITSUI CHEMICALS, INC.
Inventor： Hidetaka TSUKADA , Kenichi GOTO , Toshihiko NAKAGAWA , Satoshi YAMASAKI , Masaru KAWAGUCHI
CPC classification number: C08G18/3874 , B29D11/00009 , B29D11/00442 , B29D11/00644 , B29K2075/00 , B29K2105/20 , B29K2995/0034 , C07D331/02 , C08G18/022 , C08G18/3876 , C08G18/73 , C08G18/753 , C08G18/758 , C08G18/792 , C08J5/00 , C08J2375/04 , G02B1/04 , G02B1/041 , G02C7/12 , G02C2202/16 , C08L75/04 , C08L81/00
Abstract: A polymerizable composition for an optical material of the present invention includes polyisocyanate (a) including aliphatic polyisocyanate (a1) and a modified aliphatic polyisocyanate (a2), an episulfide (b), and a polythiol (c).
Abstract translation: 本发明的光学材料用聚合性组合物包括脂肪族多异氰酸酯（a1）和改性脂肪族多异氰酸酯（a2），环硫化物（b）和多硫醇（c）的多异氰酸酯（a）。
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公开(公告)号：US20220219361A1
公开(公告)日：2022-07-14
申请号：US17610466
申请日：2020-05-15
Applicant: MITSUI CHEMICALS, INC.
Inventor： Masaru KAWAGUCHI , Shinsuke ITO , Kouji SUESUGI
Abstract: An injection molding apparatus includes a substantially circular first substrate, a substantially circular second substrate disposed to face a surface of the first substrate, a fixing member which fixes a peripheral end portion of the first substrate and a peripheral end portion of the second substrate, and an injection portion which is provided in the fixing member and from which a composition is injected into a gap between the first substrate and the second substrate, in which a space connecting with the injection portion and the gap is provided in at least a part of a periphery of the gap, and a width of the space in a thickness direction is larger than a width of the gap in the thickness direction.
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3.发明申请PROCESS FOR PRODUCING EPISULFIDE COMPOUND FOR OPTICAL MATERIAL, EPISULFIDE-CONTAINING COMPOSITION, AND POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL INCLUDING THE SAME COMPOSITION 审中-公开用于制备用于光学材料的EPISFF化合物，含EPIAFF的组合物的方法和用于包含其组合物的光学材料的聚合物组合物公开(公告)号：US20170015777A1
公开(公告)日：2017-01-19
申请号：US15124906
申请日：2015-03-11
Applicant: MITSUI CHEMICALS, INC.
Inventor： Hidetaka TSUKADA , Masaru KAWAGUCHI
CPC classification number: C08G18/3874 , B29D11/00009 , B29D11/00442 , B29D11/00644 , B29K2075/00 , B29K2105/20 , B29K2995/0034 , C07D331/02 , C08G18/022 , C08G18/3876 , C08G18/73 , C08G18/753 , C08G18/758 , C08G18/792 , C08J5/00 , C08J2375/04 , G02B1/04 , G02B1/041 , G02C7/12 , G02C2202/16 , C08L75/04 , C08L81/00
Abstract: A process for producing an episulfide compound for an optical material of the present invention includes a step of chlorinating glycerin to obtain dichloropropanol; a step of epoxidizing the dichloropropanol to obtain epichlorohydrin; a step of reacting the epichlorohydrin with a sulfating agent to obtain a bis(chlorohydrin) (di)sulfide compound thought a thiol compound; a step of epoxidizing the bis(chlorohydrin) (di)sulfide compound under basic conditions to obtain an epoxy compound; and a step of reacting the epoxy compound with a sulfating agent to obtain an episulfide compound represented by following General Formula (1): wherein, in the formula, n represents 0 or 1.
Abstract translation: 本发明的光学材料用聚合性组合物包括脂肪族多异氰酸酯（a1）和改性脂肪族多异氰酸酯（a2），环硫化物（b）和多硫醇（c）的多异氰酸酯（a）。
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4.发明公开公开(公告)号：US20230365738A1
公开(公告)日：2023-11-16
申请号：US18245554
申请日：2021-12-23
Applicant: MITSUI CHEMICALS, INC.
Inventor： Shotaro NAKANO , Masaru KAWAGUCHI
CPC classification number: C08G18/3876 , C08G18/7642 , C08L75/04 , G02B1/041
Abstract: A polythiol composition including a polythiol compound (A) and a compound represented by formula (1), wherein, in formula (1), m and n each independently represent 0 or 1, and m+n=1.
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公开(公告)号：US20230340183A1
公开(公告)日：2023-10-26
申请号：US17778658
申请日：2021-06-14
Applicant: MITSUI CHEMICALS, INC.
Inventor： Masaru KAWAGUCHI
CPC classification number: C08G18/7642 , C08G18/3876
Abstract: [Solving Means]
A xylylene diisocyanate composition contains a xylylene diisocyanate and a compound having retention time of 14.0 minutes to 14.6 minutes when the xylylene diisocyanate composition is measured by gas chromatography mass spectrometry under the specific measurement conditions, and a content ratio of the compound is adjusted to be 2000 ppm or less.-
Patent Agency Ranking
公开(公告)号：US20220289945A1
公开(公告)日：2022-09-15
申请号：US17428313
申请日：2020-02-07
Applicant: MITSUI CHEMICALS, INC.
Inventor： Masaru KAWAGUCHI , Shinsuke ITO
IPC: C08K5/3475 , C08G18/76 , C08G18/38 , C08K5/45 , G02B1/04
Abstract: A polymerizable composition for an optical material of the present disclosure includes (A) an isocyanate compound, (B) at least one active hydrogen compound selected from the group consisting of a polythiol compound having two or more mercapto groups, a hydroxythiol compound having one or more mercapto groups and one or more hydroxyl groups, a polyol compound having two or more hydroxyl groups, and an amine compound, and (C) an ultraviolet absorber represented by General Formula (1).
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公开(公告)号：US20200148856A1
公开(公告)日：2020-05-14
申请号：US16628194
申请日：2018-07-02
Applicant: MITSUI CHEMICALS, INC.
Inventor： Yuuki KASORI , Masaru KAWAGUCHI , Nobuo KAWATO
IPC: C08K5/524 , C08K5/1545 , C08K5/357 , G02B1/04
Abstract: A polymerizable composition for an optical material according to the present invention includes (A) phosphite triester represented by Formula (1), (D) a photochromic compound, (E) a polyisocyanate compound, and (F) a difunctional or higher functional active hydrogen compound.
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公开(公告)号：US20180334528A1
公开(公告)日：2018-11-22
申请号：US16050186
申请日：2018-07-31
Applicant: MITSUI CHEMICALS, INC.
Inventor： Masaru KAWAGUCHI , Takeshi NISHIMURA
IPC: C08G18/38 , G02B1/04 , C07C321/14 , C08G18/76
CPC classification number: C08G18/3876 , C07C321/14 , C08G18/7642 , G02B1/041 , C08L81/00 , C08L75/04
Abstract: A polythiol composition includes a polythiol compound (a) that includes at least one kind selected from the compounds represented by the following formulae (6) to (8) as main component, and a compound (b) wherein, in a high performance liquid chromatography measurement of the polythiol composition under defined conditions, the peak area of the compound (b) which appears at the retention time from 6.5 minutes to 8.0 minutes is equal to or less than 3.0, with respect to the peak area of 100 of the polythiol compound (a) which appears at the retention time from 22.0 minutes to 28.0 minutes. A process for producing a polythiol composition, a method of manufacturing a molded product, a molded product, an optical element and a lens are also provided.
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9.发明公开公开(公告)号：US20240084105A1
公开(公告)日：2024-03-14
申请号：US18519567
申请日：2023-11-27
Applicant: MITSUI CHEMICALS, INC.
Inventor： Shotaro NAKANO , Masaru KAWAGUCHI
CPC classification number: C08K5/37 , C08G18/10 , C08G18/3876 , C08K5/45 , G02B1/041
Abstract: Provided is a polythiol composition including a polythiol compound (A) and a compound represented by the following Formula (1), wherein, in high performance liquid chromatography measurement, a peak area of the compound represented by Formula (1) is 9.0 or less with respect to a total peak area 100 of all compounds contained in the polythiol composition. In Formula (1), X represents a carbon atom or a sulfur atom.
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公开(公告)号：US20220363650A1
公开(公告)日：2022-11-17
申请号：US17760991
申请日：2020-09-18
Applicant: MITSUI CHEMICALS, INC. , YAMAMOTO CHEMICALS, INC.
Inventor： Masaru KAWAGUCHI , Shinsuke ITO , Yoshiyuki TOTANI , Yusuke MATSUI , Yojirou KUMAGAE , Daisuke KAKIO , Bunji SAWANO , Hiroshi NARUSE , Ryoji YAMAGUCHI
IPC: C07D249/20 , C08K5/3475
Abstract: Provided is a benzotriazole compound represented by Formula (1). In Formula (1), R1 to R4 represent substituents. In Formula (1), n1 represents an integer from 0 to 4, and n2 represents an integer from 0 to 3.
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