公开(公告)号：US20160375714A1

公开(公告)日：2016-12-29

申请号：US15259620

申请日：2016-09-08

申请人： LEONHARD KURZ Stiftung & Co. KG

发明人： Ludwig Brehm ,  Haymo Katschorek ,  Norbert Laus

IPC分类号： B42D25/373 ,  B42D25/328 ,  B42D25/337 ,  B42D25/45 ,  B42D25/351 ,  B42D25/41 ,  B42D25/42 ,  B42D25/445 ,  B42D25/29 ,  B42D25/346

CPC分类号： B42D25/373 ,  B32B38/10 ,  B32B2038/0092 ,  B32B2307/40 ,  B42D25/21 ,  B42D25/29 ,  B42D25/328 ,  B42D25/337 ,  B42D25/346 ,  B42D25/351 ,  B42D25/41 ,  B42D25/42 ,  B42D25/43 ,  B42D25/445 ,  B42D25/45 ,  B42D2033/10 ,  B42D2035/14 ,  B44F1/02 ,  Y10T428/12361 ,  Y10T428/12535 ,  Y10T428/24752 ,  Y10T428/24917

摘要： The invention concerns a process for producing a film element having mutually registered metallic layers (11, 16) and a film element which can be produced by such a process. A first metallic layer (11) provided on a first surface of a flexible single-layer or multi-layer carrier film (10) and a masking layer (13) provided on the second surface of the carrier film (10), opposite to the first surface, are structured in accurate register relationship with each other by means of mutually synchronised structuring procedures. After structuring of the first metallic layer (11) and the masking layer (13) one or more further layers are applied to the first metallic layer (11). Applied to the one or more further layers (15) is a second metallic layer (16) to which a first photoactivatable layer (17) is applied. The first photoactivatable layer (17) is structured by means of trans-exposure through the masking layer (13), the first metallic layer, the one or more further layers and the second metallic layer (16) from the side of the masking layer (13) by means of electromagnetic radiation of a wavelength to which the first photoactivatable layer (17) is sensitive, or the first photoactivatable layer is exposed controlledly through the masking layer from the side of the film body that is opposite to the masking layer.

摘要翻译： 本发明涉及一种用于制造具有相互配准的金属层（11,16）和可通过这种工艺制造的膜元件的膜元件的方法。 设置在柔性单层或多层载体膜（10）的第一表面上的第一金属层（11）和设置在载体膜（10）的第二表面上的掩模层（13） 第一表面通过相互同步的结构化程序彼此以精确的寄存器关系构造。 在构造第一金属层（11）和掩模层（13）之后，将一个或多个其它层施加到第一金属层（11）上。 应用于一个或多个另外的层（15）是第二金属层（16），施加有第一可光活化层（17）。 第一可光活化层（17）通过从掩模层（13），第一金属层，一个或多个另外的层和第二金属层（16）从掩模层的侧面 13）通过第一可光活化层（17）敏感的波长的电磁辐射，或者第一可光活化层从膜体的与掩模层相对的侧面通过掩模层受到控制地曝光。

公开(公告)号：US20150334824A1

公开(公告)日：2015-11-19

申请号：US14367541

申请日：2012-12-21

申请人： LEONHARD KURZ Stiftung & Co. KG ,  PolyIC GmbH & Co. KG ,  OVD Kinegram AG

发明人： Walter Fix ,  Andreas Ullmann ,  Manfred Walter ,  Thomas Herbst ,  Ludwig Brehm ,  Achim Hansen ,  Andreas Schilling ,  Haymo Katschorek ,  Norbert Laus ,  Carolin Born ,  Andreas Lange

IPC分类号： H05K1/02 ,  H05K3/46

CPC分类号： H05K1/0274 ,  G02B1/11 ,  G02B1/116 ,  G02B1/118 ,  G06F3/041 ,  H05B3/84 ,  H05B2203/002 ,  H05B2203/013 ,  H05B2203/017 ,  H05K3/4664 ,  H05K2203/095 ,  H05K2203/107

摘要： The invention provides a large number of possibilities for how, in the case of a multi-layer body with electrically conductive elements which are not visible to the naked eye, the electrically conductive elements can be prevented from excessively reflecting light back. Here, a suitable surface roughness for the electrically conductive elements can be selected, or at least one additional layer (54) can be provided on the electrically conductive elements (51l).

摘要翻译： 本发明提供了大量的可能性，即在具有不能肉眼可见的导电元件的多层体的情况下，可以防止导电元件过度反射光。 这里，可以选择用于导电元件的合适的表面粗糙度，或者可以在导电元件（51l）上提供至少一个附加层（54）。

公开(公告)号：US10179472B2

公开(公告)日：2019-01-15

申请号：US15259620

申请日：2016-09-08

申请人： LEONHARD KURZ Stiftung & Co. KG

发明人： Ludwig Brehm ,  Haymo Katschorek ,  Norbert Laus

IPC分类号： B42D25/373 ,  B42D25/337 ,  B42D25/445 ,  B44F1/02 ,  B42D25/42 ,  B42D25/43 ,  B42D25/29 ,  B42D25/45 ,  B42D25/328 ,  B42D25/346 ,  B42D25/351 ,  B42D25/41 ,  B42D25/21 ,  B32B38/10 ,  B32B38/00

摘要： The invention concerns a process for producing a film element having mutually registered metallic layers (11, 16) and a film element which can be produced by such a process. A first metallic layer (11) provided on a first surface of a flexible single-layer or multi-layer carrier film (10) and a masking layer (13) provided on the second surface of the carrier film (10), opposite to the first surface, are structured in accurate register relationship with each other by means of mutually synchronized structuring procedures. After structuring of the first metallic layer (11) and the masking layer (13) one or more further layers are applied to the first metallic layer (11). Applied to the one or more further layers (15) is a second metallic layer (16) to which a first photoactivatable layer (17) is applied. The first photoactivatable layer (17) is structured by means of trans-exposure through the masking layer (13), the first metallic layer, the one or more further layers and the second metallic layer (16) from the side of the masking layer (13) by means of electromagnetic radiation of a wavelength to which the first photoactivatable layer (17) is sensitive, or the first photoactivatable layer is exposed controlledly through the masking layer from the side of the film body that is opposite to the masking layer.