公开(公告)号：US20220013388A1

公开(公告)日：2022-01-13

申请号：US17299291

申请日：2018-12-03

Applicant: Lam Research Corporation

Inventor： John E. Daugherty ,  Changyou Jing ,  Sushil Anand

IPC: H01L21/67 ,  H01L21/687

Abstract: Various embodiments include apparatuses to provides an in-situ, non-intrusive verification of substrate pin-lifters while a substrate is in a substrate-processing location on a process tool. The disclosed subject matter can also verify any unexpected substrate movement prior to or while the substrate is being removed from the process tool. In an exemplary embodiment, a pin-lifter test substrate includes a number of motion sensors and at least one force sensor. The motion sensors including at least one type of sensor selected from sensor types including inclinometers and accelerometers. A memory device on the pin-lifter test substrate records data received from the motion sensors. Instead of or in addition to the memory device, a wireless communications device transmits data received from the motion sensors to a remote receiver. Other apparatuses and systems are disclosed.

公开(公告)号：US11901944B2

公开(公告)日：2024-02-13

申请号：US17617517

申请日：2020-06-08

Applicant: LAM RESEARCH CORPORATION

Inventor： Changyou Jing ,  Fred Egley

IPC: H04B10/25 ,  H01J37/32 ,  H04B10/564 ,  H04B10/80

CPC classification number: H04B10/2589 ,  H01J37/32935 ,  H04B10/564 ,  H04B10/807

Abstract: A substrate support assembly comprises a first optical receiver, a power converter, a first circuit, and a first optical transmitter, all embedded in the substrate support assembly. The first optical receiver is configured to receive a first optical signal and a first optical data through a fiber optic cable. The power converter is configured to generate DC power based on the first optical signal and the first optical data received by the first optical receiver. The first circuit is configured to receive the DC power from the power converter and to receive a second data from a sensor disposed in the substrate support assembly in response to the first optical data. The first optical transmitter is configured to transmit the second data as a second optical data through the fiber optic cable.

公开(公告)号：US20250054788A1

公开(公告)日：2025-02-13

申请号：US18929547

申请日：2024-10-28

Applicant: Lam Research Corporation

Inventor： Changyou Jing

IPC: H01L21/67 ,  H03K3/017 ,  H03K5/156 ,  H05B1/02

Abstract: Systems and methods for identifying a single failure in a heater array and compensating for the failure are described. The methods include identifying two X buses and two Y buses of the heater array having a location of the failure. A confirmation of the single failure within the heater array is performed after identifying the two X and two Y buses. Once the single failure is confirmed, the location of the failure is identified. The methods include compensating for the single failure by adjusting a duty cycle of a heater at the location of the failure, adjusting additional duty cycles of heaters along the same X bus as the failed heater and the same Y bus as the failed heater, and maintaining remaining duty cycles of power provided to remaining heaters of the heater array.

公开(公告)号：US12165891B2

公开(公告)日：2024-12-10

申请号：US17285900

申请日：2019-10-25

Applicant: Lam Research Corporation

Inventor： Changyou Jing

IPC: H01L21/67 ,  H03K3/017 ,  H03K5/156 ,  H05B1/02

Abstract: Systems and methods for identifying a single failure in a heater array and compensating for the failure are described. The methods include identifying two X buses and two Y buses of the heater array having a location of the failure. A confirmation of the single failure within the heater array is performed after identifying the two X and two Y buses. Once the single failure is confirmed, the location of the failure is identified. The methods include compensating for the single failure by adjusting a duty cycle of a heater at the location of the failure, adjusting additional duty cycles of heaters along the same X bus as the failed heater and the same Y bus as the failed heater, and maintaining remaining duty cycles of power provided to remaining heaters of the heater array.

公开(公告)号：US11087962B2

公开(公告)日：2021-08-10

申请号：US16041345

申请日：2018-07-20

Applicant: Lam Research Corporation

Inventor： Changyou Jing

IPC: H01J37/32 ,  H01L21/67 ,  G05B19/418 ,  C23C16/50

Abstract: Systems and methods for real-time control of temperature within a plasma chamber are described. One of the methods includes sensing a voltage in real time of a rail that is coupled to a voltage source. The voltage source supplies a voltage to multiple heater elements of the plasma chamber. The voltage that is sensed is used to adjust one or more duty cycles of corresponding one or more of the heater elements. The adjusted one or more duty cycles facilitate achieving and maintaining a temperature value within the plasma chamber over time.

公开(公告)号：US12142464B2

公开(公告)日：2024-11-12

申请号：US17628282

申请日：2020-07-21

Applicant: LAM RESEARCH CORPORATION

Inventor： Changyou Jing ,  Benny Wu ,  Oleksandr Mikhnenko ,  Slobodan Mitrovic

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/48 ,  H01L21/67 ,  H01L21/683

Abstract: Systems and methods of the disclosure perform in situ sensing and real time compensation of various non-uniformities in substrate processing systems. A plasma non-uniformity is sensed by determining a temperature distribution across a matrix of a plurality of micro-heaters disposed in the substrate support. Alternatively, the plasma non-uniformity is sensed by determining heat flux through the substrate support using the matrix heaters and one or more heaters used to heat one or more zones of the substrate support. The plasma non-uniformity is compensated by adjusting one or more parameters such as power supplied to the matrix heaters, RF power supplied to generate plasma, chemistry and/or flow rate of gas or gases used to generate plasma, settings of thermal control units or chillers, and so on. Additionally, non-uniformities inherent in the substrate support are sensed using the zone and matrix heaters and are compensated by adjusting the one or more parameters.

公开(公告)号：US20220172925A1

公开(公告)日：2022-06-02

申请号：US17437401

申请日：2020-03-10

Applicant: Lam Research Corporation

Inventor： Changyou Jing ,  Oleksandr Mikhnenko ,  Christopher Kimball

IPC: H01J37/32

Abstract: A controller including a voltage sensor coupled to a heater trace integrated in an electrostatic chuck, the voltage sensor configured to sense a voltage difference across the heater trace, wherein the heater trace is associated with a heater zone. The controller including a current sensor coupled to the heater trace and configured to sense a current in the heater trace. The controller including a resistance identifier configured to identify a resistance of the heater trace based on the voltage difference and the current that is sensed. The controller including a temperature correlator configured to approximate a temperature of the heater zone based on the resistance and a correlation function of the heater trace. The correlation function uses a temperature coefficient of resistance of the heater trace.

公开(公告)号：US20210358727A1

公开(公告)日：2021-11-18

申请号：US17385850

申请日：2021-07-26

Applicant: Lam Research Corporation

Inventor： Changyou Jing

IPC: H01J37/32 ,  H01L21/67 ,  G05B19/418

Abstract: Systems and methods for real-time control of temperature within a plasma chamber are described. One of the methods includes sensing a voltage in real time of a rail that is coupled to a voltage source. The voltage source supplies a voltage to multiple heater elements of the plasma chamber. The voltage that is sensed is used to adjust one or more duty cycles of corresponding one or more of the heater elements. The adjusted one or more duty cycles facilitate achieving and maintaining a temperature value within the plasma chamber over time.

公开(公告)号：US20200027706A1

公开(公告)日：2020-01-23

申请号：US16041345

申请日：2018-07-20

Applicant: Lam Research Corporation

Inventor： Changyou Jing

IPC: H01J37/32 ,  H01L21/67 ,  G05B19/418

Abstract: Systems and methods for real-time control of temperature within a plasma chamber are described. One of the methods includes sensing a voltage in real time of a rail that is coupled to a voltage source. The voltage source supplies a voltage to multiple heater elements of the plasma chamber. The voltage that is sensed is used to adjust one or more duty cycles of corresponding one or more of the heater elements. The adjusted one or more duty cycles facilitate achieving and maintaining a temperature value within the plasma chamber over time.

公开(公告)号：US20240047183A1

公开(公告)日：2024-02-08

申请号：US18488950

申请日：2023-10-17

Applicant: Lam Research Corporation

Inventor： Changyou Jing

IPC: H01J37/32 ,  H01L21/67 ,  G05B19/418

CPC classification number: H01J37/32724 ,  H01L21/67069 ,  H01L21/67103 ,  H01L21/67248 ,  G05B19/418 ,  H01J37/3299 ,  G05B2219/45031 ,  H01J2237/332 ,  H01J2237/3343 ,  H01J37/32183 ,  C23C16/50

Abstract: Systems and methods for real-time control of temperature within a plasma chamber are described. One of the methods includes sensing a voltage in real time of a rail that is coupled to a voltage source. The voltage source supplies a voltage to multiple heater elements of the plasma chamber. The voltage that is sensed is used to adjust one or more duty cycles of corresponding one or more of the heater elements. The adjusted one or more duty cycles facilitate achieving and maintaining a temperature value within the plasma chamber over time.