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公开(公告)号：US07371709B2
公开(公告)日：2008-05-13
申请号：US11237139
申请日：2005-09-28
Applicant: Kumars Sakizadeh , Thomas J. Ludemann , Gary E. LaBelle
Inventor： Kumars Sakizadeh , Thomas J. Ludemann , Gary E. LaBelle
IPC: B41M5/40
CPC classification number: G03C1/49872 , G03C1/4989 , G03C1/85 , G03C2001/7628
Abstract: Thermally developable materials that comprise a support have an antistatic backside layer that includes a quaternary ammonium salt. The same or different backside layer can also include another antistatic agent such as conductive metal particles or conductive polymers. These thermally developable materials include both thermographic and photothermographic materials that can be suitably imaged to provide images useful for medical diagnoses.
Abstract translation: 包含载体的可热显影材料具有包含季铵盐的抗静电背面层。 相同或不同的背面层还可以包括另一种抗静电剂，例如导电金属颗粒或导电聚合物。 这些可热显影的材料包括热成像和光热成像材料，可以适当地成像以提供用于医学诊断的图像。
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公开(公告)号：US06689546B1
公开(公告)日：2004-02-10
申请号：US10304225
申请日：2002-11-26
Applicant: Gary E. LaBelle , Kumars Sakizadeh , Thomas J. Ludemann , Aparna V. Bhave , Oanh V. Pham
Inventor： Gary E. LaBelle , Kumars Sakizadeh , Thomas J. Ludemann , Aparna V. Bhave , Oanh V. Pham
IPC: G03C1498
CPC classification number: G03C1/49872 , G03C1/0051 , G03C1/49818 , G03C1/825 , G03C1/85 , G03C1/853 , G03C5/02 , G03C7/3041 , G03C2001/03541 , G03C2001/7628 , G03C2200/47
Abstract: Thermally developable materials that comprise a support have at least two backside layers. One of these layers can be a protective layer comprising a film-forming polymer. The materials also includes a non-imaging backside conductive layer comprising non-acicular metal antimonate particles in a mixture of two or more polymers that includes a first polymer serving to promote adhesion of the backside conductive layer directly to the support or other layers, and a second polymer that is different than and forms a single phase mixture with the first polymer.
Abstract translation: 包含支撑体的可热显影材料具有至少两个背面层。 这些层之一可以是包含成膜聚合物的保护层。 所述材料还包括非成像背面导电层，其包含两种或更多种聚合物的混合物中的非针状金属锑酸盐颗粒，所述聚合物包括用于促进背侧导电层直接粘附到载体或其它层上的第一聚合物，以及 第二聚合物，其与第一聚合物不同并形成单相混合物。
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3.发明授权公开(公告)号：US07514206B2
公开(公告)日：2009-04-07
申请号：US11403782
申请日：2006-04-13
Applicant: Thomas J. Ludemann , Gary E. LaBelle , Thomas J. Kub , Kumars Sakizadeh , Sharon M. Simpson
Inventor： Thomas J. Ludemann , Gary E. LaBelle , Thomas J. Kub , Kumars Sakizadeh , Sharon M. Simpson
CPC classification number: G03C1/49872 , G03C1/4989 , G03C1/85 , G03C1/853
Abstract: Thermally developable materials including photothermographic and thermographic materials have a buried conductive backside layer comprising one or more binder polymers in which are dispersed each of at least two types of conductive materials: (1) nanoparticles of one or more conductive metal compounds, and (2) one or more organic solvent soluble inorganic alkali metal salt antistatic compounds. These buried conductive backside coatings provide conductivity that is affected minimally by humidity.
Abstract translation: 包括光热照相和热成像材料的可热显影材料具有包含一种或多种粘合剂聚合物的掩埋导电背面层，其中分散有至少两种导电材料：（1）一种或多种导电金属化合物的纳米颗粒，和（2） 一种或多种有机溶剂可溶性无机碱金属盐抗静电化合物。 这些掩埋的导电背面涂层提供了受湿度影响最小的电导率。
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4.发明授权公开(公告)号：US07258968B1
公开(公告)日：2007-08-21
申请号：US11403438
申请日：2006-04-13
Applicant: Gary E. LaBelle , Thomas J. Ludermann , Kumars Sakizadeh , Thomas J. Kub
Inventor： Gary E. LaBelle , Thomas J. Ludermann , Kumars Sakizadeh , Thomas J. Kub
CPC classification number: G03C1/49872 , G03C1/4989 , G03C1/85 , G03C1/853
Abstract: Thermally developable materials including photothermographic and thermographic materials having a buried conductive backside layer comprising one or more binder polymers, and an antistatic compound that is an organic solvent soluble alkali metal salt of any of a perfluorinated aliphatic carboxylic acid having 2 or 3 carbon atoms, a perfluorinated aliphatic sulfonate, or a tetrafluoroborate, provide antistatic coatings that exhibit little dependence on humidity.
Abstract translation: 包含光热照相和热成像材料的热显影材料，其具有包含一种或多种粘合剂聚合物的掩埋导电背面层，以及抗静电化合物，其是具有2或3个碳原子的全氟化脂肪族羧酸的有机溶剂可溶性碱金属盐， 全氟化脂族磺酸盐或四氟硼酸盐提供对湿度几乎没有依赖性的抗静电涂层。
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5.发明授权公开(公告)号：US06762013B2
公开(公告)日：2004-07-13
申请号：US10265058
申请日：2002-10-04
Applicant: Kumars Sakizadeh , Gary E. LaBelle , Aparna V. Bhave
Inventor： Kumars Sakizadeh , Gary E. LaBelle , Aparna V. Bhave
IPC: G03C516
CPC classification number: G03C1/49872 , G03C1/85 , Y10S430/166
Abstract: Nonpolymeric fluorochemicals defined as by the following Structure I are useful in thermally developable materials. The fluorochemicals are defined as follows: Rf—R—N(R1)(R2)(R3)+X− (I) wherein Rf is a straight or branched chain perfluoroalkyl group having 4 to 18 carbon atoms, R is a divalent linking group comprising at least 4 carbon atoms and a sulfide group in the chain, R1, R2, R3 are independently hydrogen or alkyl groups or any two of R1, R2, and R3 taken together can represent the carbon and nitrogen atoms necessary to provide a 5- to 7-membered heterocyclic ring with the cationic nitrogen atom, and X− is a monovalent anion.
Abstract translation: 由以下结构I定义的非聚合性含氟化合物可用于可热显影的材料。 含氟化合物定义如下：其中Rf是具有4至18个碳原子的直链或支链全氟烷基，R是包含至少4个碳原子的二价连接基团和链中的硫化物基团，R 1，R 2，R 3是 独立地是氢或烷基或者R 1，R 2和R 3中的任何两个可以代表为阳离子氮原子提供5-7元杂环所必需的碳原子和氮原子，并且X 1是一价 阴离子
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Patent Agency Ranking
6.发明授权1-sulfonyl-1H-benzotriazole compounds as print stabilizers in photothermographic elements 失效1-磺酰基-1H-苯并三唑化合物作为光热敏成像元件中的印刷稳定剂公开(公告)号：US06171767B2
公开(公告)日：2001-01-09
申请号：US09301652
申请日：1999-04-28
Applicant: Steven H. Kong , Kumars Sakizadeh , Gary E. Labelle , EmmaLee J. Spahl , Paul G. Skoug
Inventor： Steven H. Kong , Kumars Sakizadeh , Gary E. Labelle , EmmaLee J. Spahl , Paul G. Skoug
IPC: G03C1498
CPC classification number: G03C1/49845 , G03C1/34 , G03C2200/33
Abstract: 1-Sulfonyl-1H-benzotriazole compounds have been found to be useful as antifoggants and print stabilizers in photothermographic elements. The photothermographic elements may be used in medical imaging films or as a photomask in a process where there is a subsequent exposure of an ultraviolet or short wavelength visible radiation-sensitive imageable medium.
Abstract translation: 已经发现1-磺酰基-1H-苯并三唑化合物可用作光热敏成像元件中的防灰雾剂和印刷稳定剂。 光热敏成像元件可以在随后暴露紫外线或短波长可见光辐射敏感可成像介质的过程中用于医学成像膜或光掩模。
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公开(公告)号：US06991894B2
公开(公告)日：2006-01-31
申请号：US10699768
申请日：2003-11-03
Applicant: Kumars Sakizadeh , Karissa L. Eckert , Gary E. LaBelle , David R. Whitcomb
Inventor： Kumars Sakizadeh , Karissa L. Eckert , Gary E. LaBelle , David R. Whitcomb
CPC classification number: G03C1/49872 , G03C1/04 , G03C1/46 , G03C1/498 , G03C1/49818 , G03C1/49845 , G03C1/49863 , G03C1/49881 , G03C5/164 , G03C2001/7635 , Y10S430/162
Abstract: Thermographic and photothermographic materials comprise a barrier layer to provide physical protection and to prevent migration of diffusible imaging components and by-products resulting from high temperature imaging and/or development. The barrier layer comprises a scavenger that is a metal hydroxide or ester. This barrier layer is capable of retarding diffusion of mobile chemicals such as organic carboxylic acids, developers, and toners.
Abstract translation: 热成像和光热成像材料包括阻挡层，以提供物理保护并防止可扩散成像组件和由高温成像和/或显影产生的副产物的迁移。 阻挡层包含作为金属氢氧化物或酯的清除剂。 该阻挡层能够阻止移动化学品如有机羧酸，显影剂和调色剂的扩散。
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8.发明授权Modified antistatic compositions and thermally developable materials containing same 失效改进的抗静电组合物和含有它的热显影材料公开(公告)号：US06699648B2
公开(公告)日：2004-03-02
申请号：US10107551
申请日：2002-03-27
Applicant: Kumars Sakizadeh , Gary E. LaBelle , Michael W. Orem , Aparna V. Bhave
Inventor： Kumars Sakizadeh , Gary E. LaBelle , Michael W. Orem , Aparna V. Bhave
IPC: G03C516
CPC classification number: C09K3/16 , G03C1/385 , G03C1/49827 , G03C1/49863 , G03C1/49872 , G03C1/7954 , G03C1/825 , G03C1/85 , G03C2001/7628 , G03C2001/7635 , Y10S430/166
Abstract: Antistatic compositions include a fluorochemical that is a reaction product of Rf—CH2CH2—SO3H with an amine wherein Rf comprises 4 or more fully fluorinated carbon atoms. These antistatic compositions can be formulated in organic solvent-based conductive coating compositions, with or without hydrophobic binders, that can be used to form conductive layers in thermally developable materials including thermographic and photothermographic materials.
Abstract translation: 抗静电组合物包括氟化物，其是Rf-CH 2 CH 2 -SO 3 H与胺的反应产物，其中Rf包含4个或更多个完全氟化的碳原子。 这些抗静电组合物可以配制在有机溶剂基导电涂料组合物中，具有或不具有疏水性粘合剂，其可用于在包含热成像和光热成像材料的可热显影材料中形成导电层。
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公开(公告)号：US08420214B2
公开(公告)日：2013-04-16
申请号：US12990951
申请日：2009-06-09
Applicant: Maureen A. Kavanagh , Belma Erdogan-Haug , Timothy D. Filiatrault , Shaun D. McCracken , Kumars Sakizadeh
Inventor： Maureen A. Kavanagh , Belma Erdogan-Haug , Timothy D. Filiatrault , Shaun D. McCracken , Kumars Sakizadeh
IPC: C09J133/08 , C09J133/10 , B32B7/12 , C08F20/68
CPC classification number: C08F8/32 , C08K5/3412 , C08L2312/00 , C09J7/22 , C09J7/38 , C09J7/385 , C09J133/064 , C09J2205/102 , C09J2205/31 , C09J2433/00 , Y10T428/2896 , C08F220/12
Abstract: A pre-adhesive composition is described comprising an acid-functional (meth)acrylate copolymer and an aziridine crosslinking agent, which when crosslinked provides a pressure-sensitive adhesive and pressure-sensitive adhesive articles.
Abstract translation: 描述了一种预粘合剂组合物，其包含酸官能（甲基）丙烯酸酯共聚物和氮丙啶交联剂，其在交联时提供压敏粘合剂和压敏粘合剂制品。
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公开(公告)号：US20080145801A1
公开(公告)日：2008-06-19
申请号：US11611913
申请日：2006-12-18
Applicant: Chaofeng Zou , Fong Vang , Doreen C. Lynch , William D. Ramsden , Sharon M. Simpson , Kumars Sakizadeh
Inventor： Chaofeng Zou , Fong Vang , Doreen C. Lynch , William D. Ramsden , Sharon M. Simpson , Kumars Sakizadeh
CPC classification number: G03C1/49827 , G03C1/49818 , G03C1/49845 , G03C1/49881 , G03C2007/3025 , G03C2200/39 , G03C2200/52
Abstract: Use of a combination of a trisphenol reducing agent (developer) and a substituted olefinic co-developer in photothermographic materials reduces their sensitivity to high humidity and improves processing latitude.
Abstract translation: 在光热敏成像材料中使用三酚还原剂（显影剂）和取代的烯烃共显影剂的组合降低了它们对高湿度的敏感性并提高了加工的纬度。
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