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    Thermally developable materials with backside antistatic layer
    6.
    发明授权
    Thermally developable materials with backside antistatic layer 有权
    具有背面抗静电层的耐热可开发材料

    公开(公告)号：US07371709B2

    公开(公告)日：2008-05-13

    申请号：US11237139

    申请日：2005-09-28

    Applicant: Kumars Sakizadeh ,  Thomas J. Ludemann ,  Gary E. LaBelle

    Inventor： Kumars Sakizadeh ,  Thomas J. Ludemann ,  Gary E. LaBelle

    IPC: B41M5/40

    CPC classification number: G03C1/49872 ,  G03C1/4989 ,  G03C1/85 ,  G03C2001/7628

    Abstract: Thermally developable materials that comprise a support have an antistatic backside layer that includes a quaternary ammonium salt. The same or different backside layer can also include another antistatic agent such as conductive metal particles or conductive polymers. These thermally developable materials include both thermographic and photothermographic materials that can be suitably imaged to provide images useful for medical diagnoses.

    Abstract translation: 包含载体的可热显影材料具有包含季铵盐的抗静电背面层。 相同或不同的背面层还可以包括另一种抗静电剂，例如导电金属颗粒或导电聚合物。 这些可热显影的材料包括热成像和光热成像材料，可以适当地成像以提供用于医学诊断的图像。

    Thermally developable materials containing fluorochemical conductive layers
    8.
    发明授权
    Thermally developable materials containing fluorochemical conductive layers 失效
    含氟化学导电层的可开发热材料

    公开(公告)号：US06762013B2

    公开(公告)日：2004-07-13

    申请号：US10265058

    申请日：2002-10-04

    Applicant: Kumars Sakizadeh ,  Gary E. LaBelle ,  Aparna V. Bhave

    Inventor： Kumars Sakizadeh ,  Gary E. LaBelle ,  Aparna V. Bhave

    IPC: G03C516

    CPC classification number: G03C1/49872 ,  G03C1/85 ,  Y10S430/166

    Abstract: Nonpolymeric fluorochemicals defined as by the following Structure I are useful in thermally developable materials. The fluorochemicals are defined as follows: Rf—R—N(R1)(R2)(R3)+X−  (I) wherein Rf is a straight or branched chain perfluoroalkyl group having 4 to 18 carbon atoms, R is a divalent linking group comprising at least 4 carbon atoms and a sulfide group in the chain, R1, R2, R3 are independently hydrogen or alkyl groups or any two of R1, R2, and R3 taken together can represent the carbon and nitrogen atoms necessary to provide a 5- to 7-membered heterocyclic ring with the cationic nitrogen atom, and X− is a monovalent anion.

    Abstract translation: 由以下结构I定义的非聚合性含氟化合物可用于可热显影的材料。 含氟化合物定义如下：其中Rf是具有4至18个碳原子的直链或支链全氟烷基，R是包含至少4个碳原子的二价连接基团和链中的硫化物基团，R 1，R 2，R 3是 独立地是氢或烷基或者R 1，R 2和R 3中的任何两个可以代表为阳离子氮原子提供5-7元杂环所必需的碳原子和氮原子，并且X 1是一价 阴离子

    Thermally developable imaging materials with improved image uniformity
    9.
    发明授权
    Thermally developable imaging materials with improved image uniformity 有权
    具有改善图像均匀性的可热成像成像材料

    公开(公告)号：US06689547B2

    公开(公告)日：2004-02-10

    申请号：US10011892

    申请日：2001-12-05

    Applicant: Bryan V. Hunt ,  Steven H. Kong ,  William D. Ramsden ,  Gary E. Labelle

    Inventor： Bryan V. Hunt ,  Steven H. Kong ,  William D. Ramsden ,  Gary E. Labelle

    IPC: G03C1498

    CPC classification number: G03C1/49854 ,  G03C1/127 ,  G03C1/20 ,  G03C1/22 ,  G03C1/49872 ,  G03C1/49881 ,  G03C1/825 ,  G03C5/164 ,  G03C2200/39 ,  G03C2200/43 ,  Y10S430/145 ,  Y10S430/162

    Abstract: A photothermographic material that comprises a support having thereon one or more thermally-developable imaging layers comprising a binder and in reactive association, a photosensitive silver halide, a non-photosensitive source of reducible silver ions, and a reducing composition for the non-photosensitive source reducible silver ions. The thermally-developable layers further comprises one or more radiation absorbing compounds that provide a total absorbance of greater than 0.6 and up to and including 3 in the thermally-developable imaging layer(s). These photothermographic materials exhibit reduced mottle without significant loss in sensitivity.

    Abstract translation: 一种光热照相材料，其包括其上具有一个或多个可热显影的成像层的支撑体，所述成像层包括粘合剂和反应性缔合，感光卤化银，可还原银离子的非光敏源和用于非光敏源的还原组合物 可还原银离子。 热可显影层还包含一种或多种辐射吸收化合物，其在热显影成像层中提供大于0.6且高达和包括3的总吸光度。 这些光热敏成像材料表现出降低的斑点，而没有显着的灵敏度损失。

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