Apparatus for manufacturing ultra-fine particles using corona discharge and method thereof
    1.
    发明授权
    Apparatus for manufacturing ultra-fine particles using corona discharge and method thereof 失效
    用于使用电晕放电制造超细颗粒的装置及其方法

    公开(公告)号:US07972567B2

    公开(公告)日:2011-07-05

    申请号:US10598354

    申请日:2005-02-25

    Applicant: Kang-Ho Ahn

    Inventor: Kang-Ho Ahn

    CPC classification number: B03C3/383 B01D19/0052 B03C3/12 B03C3/49 B03C2201/08

    Abstract: The present invention discloses an apparatus and method for manufacturing ultra-fine particles using corona discharge capable of manufacturing the ultra-fine particles nanometers in size from a reaction gas using the corona discharge. In the apparatus for manufacturing ultra-fine particles of the present invention, a reaction gas feeder supplies a nozzle with reaction gas, and the reaction gas is injected. When a power supply applies a high voltage to the nozzle, the corona discharge occurs at the nozzle. Thus, the injected reaction gas is dissolved, and a large number of ultra-fine particles are produced. Then, a collection plate collects the ultra-fine particles. In addition, a duct encloses the nozzle, so that a passage is formed between the nozzle and duct. Sheath gas supplied to the passage of the duct forms a gas curtain between the nozzle and the collection plate, so that the gas curtain leads the flow of the ultra-fine particles. If other reaction gas is supplied to the passage of the duct and heat energy is supplied thereto, the other reaction gas reacts thermochemically, so that a large number of other ultra-fine particles are produced. The ultra-fine particles produced by the corona discharge are coated with the other ultra-fine particles. If the corona discharge is generated while the ultra-fine particles and the other reaction gas are injected by another nozzle positioned downstream of the nozzle, the ultrafine particles are coated with the other ultra-fine particles produced from the other reaction gas.

    Abstract translation: 本发明公开了一种使用电晕放电制造超细颗粒的装置和方法,其能够使用电晕放电从使用反应气体制造尺寸的超细颗粒纳米。 在本发明的超细粒子的制造装置中,反应气体供给器向喷嘴供给反应气体,注入反应气体。 当电源对喷嘴施加高电压时,在喷嘴处发生电晕放电。 因此,注入的反应气体溶解,产生大量的超细粒子。 然后,收集板收集超细颗粒。 此外,管道封闭喷嘴,使得在喷嘴和管道之间形成通道。 供应到管道通道的护套气体在喷嘴和收集板之间形成气幕,使得气幕导致超细颗粒的流动。 如果向管道的通道供应其它反应气体并且向其供应热能,则其它反应气体热化学反应,从而产生大量其它超细颗粒。 由电晕放电产生的超细颗粒被其它超细颗粒涂覆。 如果通过位于喷嘴下游的另一个喷嘴喷射超细颗粒和其它反应气体,则产生电晕放电,则超细颗粒被其它反应气体产生的其它超细颗粒涂覆。

    SOFT X-RAY PHOTOIONIZATION CHARGER
    2.
    发明申请
    SOFT X-RAY PHOTOIONIZATION CHARGER 审中-公开
    软X射线光电充电器

    公开(公告)号:US20100135868A1

    公开(公告)日:2010-06-03

    申请号:US12598893

    申请日:2008-05-08

    CPC classification number: H05F3/06 G01N15/0266

    Abstract: A soft X-ray photoionization charger includes a housing having a chamber and an aperture formed on one side surface of the housing and joined to the chamber. The chamber forms a flow path of an aerosol containing particles. A photoionizer is fixed to the aperture of the housing. The photoionizer includes a head for irradiating soft X-rays into the chamber to neutralize the particles. A transparent window is mounted between the chamber and the head. The transparent window is made of a material permitting passage of the soft X-rays. The photoionization charger further includes a soft support ring arranged around the transparent window and tightly fitted to the aperture.

    Abstract translation: 软X射线光电离充电器包括壳体,其具有形成在壳体的一个侧表面上并连接到腔室的腔室和孔。 室形成含有气溶胶的颗粒的流动路径。 光电离器固定在壳体的孔径上。 光离子化器包括用于将软X射线照射到室中以中和颗粒的头部。 透明窗口安装在腔室和头部之间。 透明窗口由允许软X射线通过的材料制成。 光电离充电器还包括围绕透明窗布置并紧密地配合到孔的软支撑环。

    Apparatus for controlling flow rate of gases used in semiconductor device by differential pressure
    3.
    发明授权
    Apparatus for controlling flow rate of gases used in semiconductor device by differential pressure 有权
    用于通过差压来控制半导体器件中使用的气体的流量的装置

    公开(公告)号:US07334602B2

    公开(公告)日:2008-02-26

    申请号:US10562158

    申请日:2004-06-24

    Applicant: Kang-Ho Ahn

    Inventor: Kang-Ho Ahn

    Abstract: Provided is apparatus for controlling flow rate of gases used in semiconductor device by differential pressure by generating differential pressure in a fluid path. A differential pressure generation element generates pressure difference in the fluid path of gases used in semiconductor device fabrication, a pressure, sensor which is installed at a bypass of the fluid path detects the pressure difference, and a central processing unit (CPU) measures and controls a flow rate of the gases, thereby the present invention is capable of controlling the flow rate precisely and rapidly, and enhancing the degree of purity of the gases by the filtering function of the differential pressure generation element itself.

    Abstract translation: 提供了一种通过在流体路径中产生差压来通过差压来控制在半导体器件中使用的气体的流量的装置。 差压发生元件在半导体器件制造中使用的气体的流体路径中产生压力差,安装在流体路径的旁路处的压力传感器检测压力差,并且中央处理单元(CPU)测量和控制 气体的流量,因此本发明能够通过差压发生元件本身的过滤功能,精确而快速地控制流量,并且提高气体的纯度。

    Apparatus for Manufacturing Ultra-Fine Particles Using Corona Discharge and Method Thereof
    4.
    发明申请
    Apparatus for Manufacturing Ultra-Fine Particles Using Corona Discharge and Method Thereof 失效
    使用电晕放电制造超细颗粒的装置及其方法

    公开(公告)号:US20070256922A1

    公开(公告)日:2007-11-08

    申请号:US10598354

    申请日:2005-02-25

    Applicant: Kang-Ho Ahn

    Inventor: Kang-Ho Ahn

    CPC classification number: B03C3/383 B01D19/0052 B03C3/12 B03C3/49 B03C2201/08

    Abstract: The present invention discloses an apparatus and method for manufacturing ultra-fine particles using corona discharge capable of manufacturing the ultra-fine particles nanometers in size from a reaction gas using the corona discharge. In the apparatus for manufacturing ultra-fine particles of the present invention, a reaction gas feeder supplies a nozzle with reaction gas, and the reaction gas is injected. When a power supply applies a high voltage to the nozzle, the corona discharge occurs at the nozzle. Thus, the injected reaction gas is dissolved, and a large number of ultra-fine particles are produced. Then, a collection plate collects the ultra-fine particles. In addition, a duct encloses the nozzle, so that a passage is formed between the nozzle and duct. Sheath gas supplied to the passage of the duct forms a gas curtain between the nozzle and the collection plate, so that the gas gas is supplied to the passage of the duct and heat energy is supplied thereto, the other reaction gas reacts thermochemically, so that a large number of other ultra-fine particles are produced. The ultra-fine particles produced by the corona discharge are coated with the other ultra-fine particles. If the corona discharge is generated while the ultra-fine particles and the other reaction gas are injected by another nozzle positioned downstream of the nozzle, the ultrafine particles are coated with the other ultra-fine particles produced from the other reaction gas.

    Abstract translation: 本发明公开了一种使用电晕放电制造超细颗粒的装置和方法,其能够使用电晕放电从使用反应气体制造尺寸的超细颗粒纳米。 在本发明的超细粒子的制造装置中,反应气体供给器向喷嘴供给反应气体,注入反应气体。 当电源对喷嘴施加高电压时,在喷嘴处发生电晕放电。 因此,注入的反应气体溶解,产生大量的超细粒子。 然后,收集板收集超细颗粒。 此外,管道封闭喷嘴,使得在喷嘴和管道之间形成通道。 供应到管道通道的鞘气在喷嘴和收集板之间形成气帘,使得气体被供应到管道的通道并且向其供应热能,其他反应气体以热化学方式反应,使得 产生大量其他超细颗粒。 由电晕放电产生的超细颗粒被其它超细颗粒涂覆。 如果通过位于喷嘴下游的另一个喷嘴喷射超细颗粒和其它反应气体,则产生电晕放电,则超细颗粒被其它反应气体产生的其它超细颗粒涂覆。

    Apparatus for measuring numbers of particles and method thereof
    5.
    发明授权
    Apparatus for measuring numbers of particles and method thereof 失效
    用于测量颗粒数量的装置及其方法

    公开(公告)号:US07471076B2

    公开(公告)日:2008-12-30

    申请号:US10597934

    申请日:2005-02-14

    Applicant: Kang-Ho Ahn

    Inventor: Kang-Ho Ahn

    CPC classification number: G01N15/0266

    Abstract: The present invention discloses apparatus and method for rapidly and easily measuring the numbers and size distribution of low concentration particles which exist in a clean space such as a clean room. The apparatus and method according to the present invention measures the numbers of particles by charging particles to a monopolarity, collecting the particles by applying a voltage to an electrode and attaching the charged particles of a certain size or less thereto, separating the charged particles of the certain size or more according to size by the particle separating ducts. The apparatus for measuring the number of particles according to the present invention makes it possible to obtain a size distribution of particles in the air by a single measurement and to rapidly and easily measure it even though the number of the particles in the air is small.

    Abstract translation: 本发明公开了一种用于快速,容易地测量洁净室等清洁空间中存在的低浓度颗粒的数量和尺寸分布的装置和方法。 根据本发明的装置和方法通过将颗粒充电到单极性来测量颗粒数量,通过向电极施加电压并附着一定尺寸或更小的带电粒子来分离颗粒的数量, 根据颗粒分离管道的尺寸确定尺寸或更大。 根据本发明的用于测量颗粒数量的装置使得可以通过单次测量获得颗粒在空气中的尺寸分布,并且即使空气中的颗粒数量小,也能够快速且容易地测量。

    EXHAUST UNIT, EXHAUSTING METHOD, AND SEMICONDUCTOR MANUFACTURING FACILITY WITH THE EXHAUST UNIT
    6.
    发明申请
    EXHAUST UNIT, EXHAUSTING METHOD, AND SEMICONDUCTOR MANUFACTURING FACILITY WITH THE EXHAUST UNIT 审中-公开
    排气装置,排气装置和排气装置的半导体制造设备

    公开(公告)号:US20080160905A1

    公开(公告)日:2008-07-03

    申请号:US11968039

    申请日:2007-12-31

    CPC classification number: F24F11/72 F24F2110/40

    Abstract: Provided is an exhaust unit capable of preventing large pressure fluctuations within a process chamber due to atmospheric pressure changes. The exhaust unit includes a main exhaust duct and a supplemental exhaust duct that acts as a partial bypass. A flap is located at a downstream opening between the main exhaust duct and supplemental exhaust duct and controls the amount of bypassed gas flowing from the supplemental exhaust duct to the main exhaust duct. First and second plates of the flap are pivotally coupled to the main exhaust duct adjacent the downstream opening, the first plate colliding with gas flowing through the main exhaust duct and the second plate partially blocking bypassed gas flowing back into the main exhaust duct from the supplemental exhaust duct. When gas is exhausted through the main exhaust line and the supplemental exhaust duct, the flap passively controls the amount by which the supplemental exhaust duct is opened through fluctuations in atmospheric pressure.

    Abstract translation: 提供了能够防止由于大气压变化而导致处理室内的大的压力波动的排气单元。 排气单元包括用作部分旁路的主排气管道和补充排气管道。 翼片位于主排气管道和补充排气管道之间的下游开口处,并且控制从辅助排气管道流向主排气管道的旁路气体的量。 翼片的第一和第二板与邻近下游开口的主排气管枢转连接,第一板与流经主排气管的气体相碰撞,第二板部分地阻挡旁路气体从辅助排出管道流回主排气管道 排气管。 当气体通过主排气管线和补充排气管道排出时,挡板被动地控制补充排气管道通过大气压力的波动而打开的量。

    Apparatus for measuring numbers of particles and method thereof
    7.
    发明申请
    Apparatus for measuring numbers of particles and method thereof 失效
    用于测量颗粒数量的装置及其方法

    公开(公告)号:US20070194775A1

    公开(公告)日:2007-08-23

    申请号:US10597934

    申请日:2005-02-14

    Applicant: Kang-Ho Ahn

    Inventor: Kang-Ho Ahn

    CPC classification number: G01N15/0266

    Abstract: The present invention discloses apparatus and method for rapidly and easily measuring the numbers and size distribution of low concentration particles which exist in a clean space such as a clean room. The apparatus and method according to the present invention measures the numbers of particles by charging particles to a monopolarity, collecting the particles by applying a voltage to an electrode and attaching the charged particles of a certain size or less thereto, separating the charged particles of the certain size or more according to size by the particle separating ducts. The apparatus for measuring the number of particles according to the present invention makes it possible to obtain a size distribution of particles in the air by a single measurement and to rapidly and easily measure it even though the number of the particles in the air is small.

    Abstract translation: 本发明公开了一种用于快速,容易地测量洁净室等清洁空间中存在的低浓度颗粒的数量和尺寸分布的装置和方法。 根据本发明的装置和方法通过将颗粒充电到单极性来测量颗粒数量,通过向电极施加电压并附着一定尺寸或更小的带电粒子来分离颗粒的数量, 根据颗粒分离管道的尺寸确定尺寸或更大。 根据本发明的用于测量颗粒数量的装置使得可以通过单次测量获得颗粒在空气中的尺寸分布,并且即使空气中的颗粒数量小,也能够快速且容易地测量。

    Apparatus and Method for Manufacturing Ultra-Fine Particles
    8.
    发明申请
    Apparatus and Method for Manufacturing Ultra-Fine Particles 审中-公开
    超细颗粒制造装置及方法

    公开(公告)号:US20080280068A1

    公开(公告)日:2008-11-13

    申请号:US11908663

    申请日:2006-03-14

    Applicant: Kang-Ho Ahn

    Inventor: Kang-Ho Ahn

    Abstract: An ultra-fine particle manufacturing apparatus and method is capable of producing nanometer-sized ultra-fine particles from reaction gases with high energy light beams, corona discharge and an electric field. High energy light beams are irradiated into a chamber of a housing through the use of a high energy light source. Reaction gases are supplied from a reaction gas supply device to a reaction gas inlet tube. The reaction gases are then introduced through the reaction gas inlet tube into the chamber of the housing to produce a large quantity of ultra-fine particles through the reaction of the reaction gases with the high energy light beams. A voltage is applied to the reaction gas inlet tube by means of a power supply device. The ultra-fine particles flowing within the chamber of the housing are collected by means of a collecting plate.

    Abstract translation: 超细颗粒制造装置和方法能够从具有高能量光束,电晕放电和电场的反应气体制造纳米级超细颗粒。 通过使用高能量光源将高能量光束照射到壳体的腔室中。 反应气体从反应气体供给装置供给到反应气体导入管。 然后将反应气体通过反应气体入口管引入壳体的室中,以通过反应气体与高能量光束的反应产生大量的超细颗粒。 通过电源装置向反应气体入口管施加电压。 在壳体的室内流动的超细颗粒通过收集板收集。

    High flow particles atomizer
    9.
    发明申请
    High flow particles atomizer 审中-公开
    高流量颗粒雾化器

    公开(公告)号:US20060163380A1

    公开(公告)日:2006-07-27

    申请号:US10544915

    申请日:2004-02-10

    Applicant: Kang-Ho Ahn

    Inventor: Kang-Ho Ahn

    CPC classification number: B05B7/0012 B01J2/04

    Abstract: The present invention relates to a high flow particles atomizer for atomizing a liquid and drying atomized particles to produce the atomized particles at high flow rate. The atomizer of the present invention comprises a container for containing liquid to be atomized, a nozzle positioned at the center above a liquid surface of the liquid contained in the container for injecting a large amount of gas, a liquid supply device for supplying the liquid into the gas injected by the nozzle, and an atomized particle discharge tube communicating with the container for allowing atomized particles injected by the nozzle to be discharged to the outside of the container. In addition, the atomizer further comprises a drying device for drying the atomized particles discharged through the atomized particle discharge tube.

    Abstract translation: 本发明涉及一种用于雾化液体并干燥雾化颗粒以高流速产生雾化颗粒的高流量颗粒雾化器。 本发明的雾化器包括用于容纳待雾化的液体的容器,位于容纳在容器中的用于喷射大量气体的液体的液面上方的中心的喷嘴,用于将液体供给的液体供给装置 由喷嘴喷射的气体和与容器连通的雾化粒子排出管,用于使由喷嘴喷射的雾化粒子排出到容器的外部。 此外,雾化器还包括用于干燥通过雾化粒子排出管排出的雾化粒子的干燥装置。

    Apparatus for controlling flow rate of gases used in semiconductor deivce by differential pressure
    10.
    发明申请
    Apparatus for controlling flow rate of gases used in semiconductor deivce by differential pressure 有权
    用于通过差压控制用于半导体制冷的气体流量的装置

    公开(公告)号:US20060151113A1

    公开(公告)日:2006-07-13

    申请号:US10562158

    申请日:2004-06-24

    Applicant: Kang-Ho Ahn

    Inventor: Kang-Ho Ahn

    Abstract: Provided is apparatus for controlling flow rate of gases used in semiconductor device by differential pressure by generating differential pressure in a fluid path. A differential pressure generation element generates pressure difference in the fluid path of gases used in semiconductor device fabrication, a pressure, sensor which is installed at a bypass of the fluid path detects the pressure difference, and a central processing unit (CPU) measures and controls a flow rate of the gases, thereby the present invention is capable of controlling the flow rate precisely and rapidly, and enhancing the degree of purity of the gases by the filtering function of the differential pressure generation element itself.

    Abstract translation: 提供了一种通过在流体路径中产生差压来通过差压来控制在半导体器件中使用的气体的流量的装置。 差压发生元件在半导体器件制造中使用的气体的流体路径中产生压力差,安装在流体路径的旁路处的压力传感器检测压力差,并且中央处理单元(CPU)测量和控制 气体的流量,因此本发明能够通过差压发生元件本身的过滤功能,精确而快速地控制流量,并且提高气体的纯度。

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