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公开(公告)号：US12194411B2
公开(公告)日：2025-01-14
申请号：US17193381
申请日：2021-03-05
Inventor： Akiko Suzuki , Yoshihiko Nakano , Reiko Yoshimura , Asato Kondo , Kenji Sano , Toshihiro Imada , Shinji Murai , Mitsuru Udatsu
Abstract: The embodiments provide an acidic gas absorbent having low diffusibility, an acidic gas removal method employing the acidic gas absorbent, and also an acidic gas removal apparatus employing the absorbent. The acidic gas absorbent according to the embodiment comprises: a particular tertiary amine compound, such as, an alkyl dialkanol amine or a hydroxyalkyl piperazine; a halogen-free ionic surfactant; and an aqueous solvent. The embodiments provide not only the acidic gas absorbent but also an acidic gas removal method and apparatus employing the acidic gas absorbent.
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公开(公告)号：US20190086327A1
公开(公告)日：2019-03-21
申请号：US15916687
申请日：2018-03-09
Applicant: KABUSHIKI KAISHA TOSHIBA
Inventor： Masaki Atsuta , Ko Yamada , Hiroko Nakamura , Mitsuhiro Oki , Hirohisa Miyamoto , Yasushi Shinjo , Reiko Yoshimura
IPC: G01N21/3504 , G01N33/00 , G01N33/543 , G01N21/63
Abstract: A molecular detection apparatus, comprising: a chamber; a light source provided in the chamber and configured to emit light; a detector including at least one sensor and configured to generate a first detection data and a second detection data, the sensor being provided in the chamber and being configured to capture molecules of target molecules, the first detection data corresponding to the number of captured molecules per predetermined time under a first emission condition of the light, and the second detection data corresponding to the number of captured molecules per predetermined time under a second emission condition of the light; and a discriminator to discriminate the target molecules using the first and second detection data.
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公开(公告)号：US10761051B2
公开(公告)日：2020-09-01
申请号：US15912678
申请日：2018-03-06
Applicant: KABUSHIKI KAISHA TOSHIBA
Inventor： Ko Yamada , Hirohisa Miyamoto , Reiko Yoshimura , Hiroko Nakamura , Mitsuhiro Oki , Yasushi Shinjo , Masaki Atsuta
IPC: G01N27/414 , G01N33/00 , G01N27/68
Abstract: A molecular detection apparatus according to an arrangement includes: a collection unit collecting a detection target gas containing a molecule to be detected; a detector including a detection cell that has an organic probe provided in a sensor unit, the organic probe capturing the collected molecule, and a discriminator discriminating the molecule by a detection signal generated by the molecule being captured by the organic probe of the detection cell. The detection cell has the organic probe including a dicyanovinyl structure or a coumarin structure.
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公开(公告)号：US09588418B2
公开(公告)日：2017-03-07
申请号：US14571385
申请日：2014-12-16
Applicant: KABUSHIKI KAISHA TOSHIBA
Inventor： Naomi Shida , Kenji Todori , Shigehiko Mori , Reiko Yoshimura , Hiroyuki Kashiwagi , Ikuo Yoneda , Tsukasa Tada
CPC classification number: G03F1/76 , G03F1/38 , G03F1/80 , G03F7/16 , G03F7/20 , G03F7/201 , G03F7/40 , G03F7/7035 , H01L21/3065 , H01L21/3086
Abstract: A near-field exposure mask according to an embodiment includes: a substrate; a concave-convex structure having convexities and concavities and formed on one surface of the substrate; a near-field light generating film arranged at least on a tip portion of each of the convexities, the near-field light generating film being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials; and a resin filled in each of the concavities.
Abstract translation: 根据实施例的近场曝光掩模包括：基板; 具有凹凸的凹凸结构，形成在基板的一个面上; 至少布置在每个凸起的尖端部分上的近场光产生膜，所述近场光产生膜是包含选自Au，Al，Ag，Cu，Cr中的至少一种元素的层 ，Sb，W，Ni，In，Ge，Sn，Pb，Zn，Pd和C，或由这些材料中的一些形成的层形成的膜堆叠; 和填充在每个凹部中的树脂。
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5.发明授权Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method 有权近场曝光掩模，抗蚀剂图案形成方法，器件制造方法，近场曝光方法，图案形成方法，近场光刻部件和近场纳米压印法公开(公告)号：US09550322B2
公开(公告)日：2017-01-24
申请号：US14683794
申请日：2015-04-10
Applicant: KABUSHIKI KAISHA TOSHIBA
Inventor： Naomi Shida , Kenji Todori , Shigehiko Mori , Ko Yamada , Masakazu Yamagiwa , Reiko Yoshimura , Yasuyuki Hotta , Tsukasa Tada , Hiroyuki Kashiwagi , Ikuo Yoneda
IPC: G03F7/24 , G03F7/20 , G03F1/50 , B29C59/16 , B82Y30/00 , B82Y40/00 , B82Y10/00 , B29D11/00 , G03F7/00 , B29L11/00
CPC classification number: B29C59/16 , B29D11/0074 , B29L2011/00 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F1/50 , G03F7/0002 , G03F7/70325
Abstract: A near-field exposure mask according to an embodiment includes: a silicon substrate; and a near-field light generating unit that is formed on the silicon substrate, the near-field light generating unit being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials.
Abstract translation: 根据实施例的近场曝光掩模包括：硅衬底; 以及形成在所述硅基板上的近场光产生单元，所述近场光产生单元是包含选自Au，Al，Ag，Cu，Cr，Sb，W中的至少一种元素的层 ，Ni，In，Ge，Sn，Pb，Zn，Pd和C，或由其中一些材料制成的层形成的膜叠层。
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Patent Agency Ranking
公开(公告)号：US11291948B2
公开(公告)日：2022-04-05
申请号：US16297163
申请日：2019-03-08
Inventor： Akiko Suzuki , Yoshihiko Nakano , Reiko Yoshimura , Toshihiro Imada , Takashi Kuboki , Kenji Sano , Mitsuru Udatsu
Abstract: The embodiments provide an acidic gas absorbent having low diffusibility, an acidic gas removal method, and an acidic gas removal apparatus. The acidic gas absorbent according to the embodiment comprises: an amine compound having a vapor pressure of 0.001 to 10 Pa at 20° C.; a water-soluble polymer compound having a mass-average molecular weight of 900 to 200000 and not containing a functional group having a pKa value greater than 7 except for hydroxy; and water.
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公开(公告)号：US20200086265A1
公开(公告)日：2020-03-19
申请号：US16297141
申请日：2019-03-08
Inventor： Yoshihiko Nakano , Akiko Suzuki , Takashi Kuboki , Toshihiro Imada , Shinji Murai , Reiko Yoshimura , Kenji Sano , Mitsuru Udatsu
Abstract: The embodiments provide an acidic gas absorbent, an acidic gas removal method, and an acidic gas removal apparatus. The absorbent absorbs an acidic gas in a large amount and hardly diffuses in air. The acidic gas absorbent according to the embodiment comprises an amine compound having a sulfonyl group and two or more amino groups.
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公开(公告)号：US10527581B2
公开(公告)日：2020-01-07
申请号：US15699161
申请日：2017-09-08
Applicant: KABUSHIKI KAISHA TOSHIBA
Inventor： Ko Yamada , Reiko Yoshimura , Hirohisa Miyamoto , Norikazu Osada , Mitsuhiro Oki , Hiroko Nakamura
IPC: G01N27/27 , G01N27/414
Abstract: A molecular detection apparatus according to an embodiment includes a detector and a discriminator. The detector includes a plurality of detection cells, where the plurality of detection cells include at least an organic probe containing a cyano group or a nitro group as a neighboring group of a reactive group. The discriminator discriminates a substance to be detected by signal patterns of the plurality of detection cells.
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公开(公告)号：US20190086804A1
公开(公告)日：2019-03-21
申请号：US15923814
申请日：2018-03-16
Applicant: KABUSHIKI KAISHA TOSHIBA
Inventor： Hiroko Nakamura , Koji Asakawa , Naoko Kihara , Reiko Yoshimura , Ko Yamada
IPC: G03F7/039 , G03F7/004 , G03F7/038 , G03F7/16 , G03F7/20 , G03F7/38 , G03F7/32 , H01L21/027 , H01L21/04 , H01L29/16 , H01L29/66
Abstract: A photosensitive composition of an embodiment includes: a resin containing at least one selected from polyacrylic acid, polymethacrylic acid, a cycloolefin-maleic anhydride copolymer, polycycloolefin, and a vinyl ether-maleic anhydride copolymer and having an ester bond which is caused to generate carboxylic acid by an acid or an ether bond which is caused to generate alcohol by an acid; and a photo acid generator which generates an acid by being irradiated with light, of which a wavelength is not less than 300 nm nor more than 500 nm, or KrF excimer laser light, the photo acid generator containing a substance that has a naphthalene ring or a benzene ring and in which at least one carbon atom of the naphthalene ring or the benzene ring is bonded to a bulky group.
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10.发明申请NEAR-FIELD EXPOSURE MASK, RESIST PATTERN FORMING METHOD, DEVICE MANUFACTURING METHOD, NEAR-FIELD EXPOSURE METHOD, PATTERN FORMING METHOD, NEAR-FIELD OPTICAL LITHOGRAPHY MEMBER, AND NEAR-FIELD NANOIMPRINT METHOD 有权近场曝光掩模，电阻图案形成方法，器件制造方法，近场曝光方法，图案形成方法，近场光学成像方法和近场纳米方法公开(公告)号：US20150246478A1
公开(公告)日：2015-09-03
申请号：US14683794
申请日：2015-04-10
Applicant: KABUSHIKI KAISHA TOSHIBA
Inventor： Naomi Shida , Kenji Todori , Shigehiko Mori , Ko Yamada , Masakazu Yamagiwa , Reiko Yoshimura , Yasuyuki Hotta , Tsukasa Tada , Hiroyuki Kashiwagi , Ikuo Yoneda
CPC classification number: B29C59/16 , B29D11/0074 , B29L2011/00 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F1/50 , G03F7/0002 , G03F7/70325
Abstract: A near-field exposure mask according to an embodiment includes: a silicon substrate; and a near-field light generating unit that is formed on the silicon substrate, the near-field light generating unit being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials.
Abstract translation: 根据实施例的近场曝光掩模包括：硅衬底; 以及形成在所述硅基板上的近场光产生单元，所述近场光产生单元是包含选自Au，Al，Ag，Cu，Cr，Sb，W中的至少一种元素的层 ，Ni，In，Ge，Sn，Pb，Zn，Pd和C，或由其中一些材料制成的层形成的膜叠层。
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