Method of processing light sensitive planographic printing plate precursor

    公开(公告)号:US20040131974A1

    公开(公告)日:2004-07-08

    申请号:US10443940

    申请日:2003-05-22

    CPC classification number: G03F7/322 G03F7/30

    Abstract: Disclosed is a method of processing a light sensitive planographic printing plate precursor comprising a support, and provided thereon, a photopolymerizable light sensitive layer and an overcoat layer in that order, the method comprising the steps of imagewise exposing the light sensitive planographic printing plate precursor, pre-washing the exposed light sensitive planographic printing plate precursor with washing water, and developing the pre-washed light sensitive planographic printing plate precursor with a developer containing an alkali metal-containing compound, wherein the pre-washing step comprises first washing the exposed light sensitive planographic printing plate precursor with a first water being water which has been used at least one time for washing the exposed light sensitive planographic printing plate precursor, and then washing the resulting precursor with a second water being fresh water which has not been used before for washing the exposed light sensitive planographic printing plate precursor.

    Method of processing light sensitive planographic printing plate precursor and pre-washing solution used in the method
    2.
    发明申请
    Method of processing light sensitive planographic printing plate precursor and pre-washing solution used in the method 失效
    在该方法中使用的光敏平版印刷版前体和预洗液的处理方法

    公开(公告)号:US20040072102A1

    公开(公告)日:2004-04-15

    申请号:US10628928

    申请日:2003-07-28

    CPC classification number: G03F7/3057 G03F7/38

    Abstract: Disclosed is a method of processing a light sensitive planographic printing plate precursor comprising a support, and provided thereon, a light sensitive layer and an overcoat layer in that order, the method comprising the steps of imagewise exposing the light sensitive planographic printing plate precursor, pre-washing the exposed light sensitive planographic printing plate precursor with a pre-washing solution in the presence of a compound represented by the following formula (1) or (2), or an N-alkyliminodiacetic acid or its salt, the alkyl having a carbon atom number of 1 to 3, and developing the pre-washed light sensitive planographic printing plate precursor with a developer, 1

    Abstract translation: 公开了一种处理光敏平版印刷版原版的方法,该平版印刷版前体包含一个载体,并在其上设置有光敏层和外涂层,该方法包括以下步骤:将感光平版印刷版原版成像曝光, 在由下式(1)或(2)表示的化合物或N-烷基亚氨基二乙酸或其盐的存在下,用预洗涤溶液洗涤曝光的光敏平版印刷版前体,所述烷基具有碳 原子数为1至3,并用显影剂显影预洗光敏平版印刷版原版,

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