System and Method for Inhibiting Radiative Emission of a Laser-Sustained Plasma Source
    2.
    发明申请
    System and Method for Inhibiting Radiative Emission of a Laser-Sustained Plasma Source 有权
    用于抑制激光持续等离子体源的辐射发射的系统和方法

    公开(公告)号:US20160205758A1

    公开(公告)日:2016-07-14

    申请号:US14989348

    申请日:2016-01-06

    CPC classification number: H05G2/008 H01J61/16 H01J65/00 H01J65/04 H05G2/003

    Abstract: A system for forming a laser-sustained plasma includes a gas containment element, an illumination source configured to generate pump illumination, and a collector element. The gas containment element is configured to contain a volume of a gas mixture. The collector element is configured to focus the pump illumination from the pumping source into the volume of the gas mixture contained within the gas containment element in order to generate a plasma within the volume of the gas mixture that emits broadband radiation. The gas mixture filters one or more selected wavelengths of radiation emitted by the plasma.

    Abstract translation: 用于形成激光维持等离子体的系统包括气体容纳元件,被配置为产生泵浦照明的照明源和收集器元件。 气体容纳元件构造成容纳一定体积的气体混合物。 收集器元件被配置为将来自泵送源的泵浦照明聚焦到容纳在气体容纳元件内的气体混合物的体积中,以便在发射宽带辐射的气体混合物的体积内产生等离子体。 气体混合物过滤由等离子体发射的一个或多个选定波长的辐射。

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