公开(公告)号：US20200184372A1

公开(公告)日：2020-06-11

申请号：US16287523

申请日：2019-02-27

Applicant: KLA-Tencor Corporation

Inventor： Song Wu ,  Yin Xu ,  Andrei V. Shchegrov ,  Lie-Quan Lee ,  Pablo Rovira ,  Jonathan Madsen

IPC: G06N20/00 ,  G01Q30/04 ,  H01J37/26 ,  G01N23/201 ,  G01N21/95

Abstract: A metrology system is disclosed. In one embodiment, the metrology system includes a controller communicatively coupled to a reference metrology tool and an optical metrology tool, the controller including one or more processors configured to: generate a geometric model for determining a profile of a test HAR structure from metrology data from a reference metrology tool; generate a material model for determining one or more material parameters of a test HAR structure from metrology data from the optical metrology tool; form a composite model from the geometric model and the material model; measure at least one additional test HAR structure with the optical metrology tool; and determine a profile of the at least one additional test HAR structure based on the composite model and metrology data from the optical metrology tool associated with the at least one HAR test structure.

公开(公告)号：US11562289B2

公开(公告)日：2023-01-24

申请号：US16287523

申请日：2019-02-27

Applicant: KLA-Tencor Corporation

Inventor： Song Wu ,  Yin Xu ,  Andrei V. Shchegrov ,  Lie-Quan Lee ,  Pablo Rovira ,  Jonathan Madsen

IPC: G06N20/00 ,  G01Q30/04 ,  H01J37/26 ,  G01N21/95 ,  G01N23/201 ,  G03F7/20

Abstract: A metrology system is disclosed. In one embodiment, the metrology system includes a controller communicatively coupled to a reference metrology tool and an optical metrology tool, the controller including one or more processors configured to: generate a geometric model for determining a profile of a test HAR structure from metrology data from a reference metrology tool; generate a material model for determining one or more material parameters of a test HAR structure from metrology data from the optical metrology tool; form a composite model from the geometric model and the material model; measure at least one additional test HAR structure with the optical metrology tool; and determine a profile of the at least one additional test HAR structure based on the composite model and metrology data from the optical metrology tool associated with the at least one HAR test structure.