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公开(公告)号：US10175555B2
公开(公告)日：2019-01-08
申请号：US15806953
申请日：2017-11-08
Applicant: KLA-Tencor Corporation
Inventor： Yung-Ho Alex Chuang , Xiaoxu Lu , Baigang Zhang , John Fielden , Vladimir Dribinski
Abstract: A laser assembly generates continuous wave (CW) laser output light in the range of approximately 181 nm to approximately 185 nm by generating fourth harmonic light from first fundamental CW light having a first fundamental wavelength between 1 μm and 1.1 μm, generating fifth harmonic light by mixing the fourth harmonic light with the first fundamental CW light, and then mixing the fifth harmonic light with second fundamental or signal CW light having a second wavelength between 1.26 μm and 1.82 μm. The fifth harmonic light is generated using an external cavity that circulates first fundamental CW light through a first nonlinear crystal, and by directing the fourth harmonic light through the first nonlinear crystal. The laser output light is generated using a second cavity that passes circulated second fundamental or signal CW light through a second nonlinear crystal, and directing the fifth harmonic light through the second nonlinear crystal.
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Patent Agency Ranking
公开(公告)号：US20180224711A1
公开(公告)日：2018-08-09
申请号：US15794887
申请日：2017-10-26
Applicant: KLA-Tencor Corporation
Inventor： Yung-Ho Alex Chuang , Vahid Esfandyarpour , John Fielden , Baigang Zhang , Yinying Xiao Li
IPC: G02F1/39 , G02F1/355 , H01L21/67 , G01N21/359 , G01N21/95
Abstract: Systems and methods for measuring or inspecting semiconductor structures using broadband infrared radiation are disclosed. The system may include an illumination source comprising a pump source configured to generate pump light and a nonlinear optical (NLO) assembly configured to generate broadband IR radiation in response to the pump light. The system may also include a detector assembly and a set of optics configured to direct the IR radiation onto a sample and direct a portion of the IR radiation reflected and/or scattered from the sample to the detector assembly.
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公开(公告)号：US20180188633A1
公开(公告)日：2018-07-05
申请号：US15806953
申请日：2017-11-08
Applicant: KLA-Tencor Corporation
Inventor： Yung-Ho Alex Chuang , Xiaoxu Lu , Baigang Zhang , John Fielden , Vladimir Dribinski
CPC classification number: G02F1/353 , G02F1/3501 , G02F1/3551 , G02F1/3558 , G02F2001/3503 , G02F2001/354
Abstract: A laser assembly generates continuous (CW) laser output light in the range of approximately 181 nm to approximately 185 nm by generating fourth harmonic light from first fundamental CW light having a first fundamental wavelength between 1 μm and 1.1 μm, generating fifth harmonic light by mixing the fourth harmonic light with the first fundamental CW light, and then mixing the fifth harmonic light with second fundamental or signal CW light having a second wavelength between 1.26 μm and 1.82 μm. The fifth harmonic light is generated using an external cavity that circulates first fundamental CW light through a first nonlinear crystal, and by directing the fourth harmonic light through the first nonlinear crystal. The laser output light is generated using a second cavity that passes circulated second fundamental or signal CW light through a second nonlinear crystal, and directing the fifth harmonic light through the second nonlinear crystal.
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公开(公告)号：US10429719B2
公开(公告)日：2019-10-01
申请号：US16205032
申请日：2018-11-29
Applicant: KLA-Tencor Corporation
Inventor： Yung-Ho Alex Chuang , Xiaoxu Lu , Baigang Zhang , John Fielden , Vladimir Dribinski
Abstract: An inspection system/method in which first optics direct continuous wave (CW) light at 181-185 nm to an inspected article, and second optics redirect image information affected by the article to detectors. A laser assembly generates the CW light by generating fourth harmonic light from first fundamental CW light having a first wavelength between 1 and 1.1 μm, generating fifth harmonic light by mixing the fourth harmonic light with the first fundamental CW light, and mixing the fifth harmonic light with second light having a second wavelength between 1.26 and 1.82 μm. An external cavity mixes the first light and the fourth harmonic light using a first nonlinear crystal. The CW light is generated using a second cavity that passes circulated second fundamental or signal CW light through a second nonlinear crystal, and directing the fifth harmonic light through the second nonlinear crystal.
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公开(公告)号：US11662646B2
公开(公告)日：2023-05-30
申请号：US15794887
申请日：2017-10-26
Applicant: KLA-Tencor Corporation
Inventor： Yung-Ho Alex Chuang , Vahid Esfandyarpour , John Fielden , Baigang Zhang , Yinying Xiao Li
IPC: G01N21/3563 , G02F1/39 , G01N21/88 , G01N21/956 , G01N21/359 , G01N21/95 , G02F1/355 , H01L21/67 , G01N21/21
CPC classification number: G02F1/39 , G01N21/359 , G01N21/3563 , G01N21/8806 , G01N21/9501 , G01N21/956 , G02F1/3551 , G02F1/3556 , G02F1/3558 , H01L21/67253 , G01N2021/213 , G01N2021/3568 , G01N2021/8848
Abstract: Systems and methods for measuring or inspecting semiconductor structures using broadband infrared radiation are disclosed. The system may include an illumination source comprising a pump source configured to generate pump light and a nonlinear optical (NLO) assembly configured to generate broadband IR radiation in response to the pump light. The system may also include a detector assembly and a set of optics configured to direct the IR radiation onto a sample and direct a portion of the IR radiation reflected and/or scattered from the sample to the detector assembly.
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公开(公告)号：US20190107766A1
公开(公告)日：2019-04-11
申请号：US16205032
申请日：2018-11-29
Applicant: KLA-Tencor Corporation
Inventor： Yung-Ho Alex Chuang , Xiaoxu Lu , Baigang Zhang , John Fielden , Vladimir Dribinski
CPC classification number: G02F1/353 , G02F1/3501 , G02F1/3551 , G02F1/3558 , G02F2001/3503 , G02F2001/354 , G02F2201/16
Abstract: A laser assembly generates continuous wave (CW) laser output light in the range of approximately 181 nm to approximately 185 nm by generating fourth harmonic light from first fundamental CW light having a first fundamental wavelength between 1 μm and 1.1 μm, generating fifth harmonic light by mixing the fourth harmonic light with the first fundamental CW light, and then mixing the fifth harmonic light with second fundamental or signal CW light having a second wavelength between 1.26 μm and 1.82 μm. The fifth harmonic light is generated using an external cavity that circulates first fundamental CW light through a first nonlinear crystal, and by directing the fourth harmonic light through the first nonlinear crystal. The laser output light is generated using a second cavity that passes circulated second fundamental or signal CW light through a second nonlinear crystal, and directing the fifth harmonic light through the second nonlinear crystal.
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