公开(公告)号：US20240085321A1

公开(公告)日：2024-03-14

申请号：US18136739

申请日：2023-04-19

Applicant: KLA Corporation

Inventor： John Hench ,  Akshay Krishna ,  Christopher Liman ,  Jeremy Smith ,  Liang Yin ,  Hyowon Park ,  Tianhan Wang ,  Boxue Chen

IPC: G01N21/47

CPC classification number: G01N21/4738

Abstract: Methods and systems for performing model-less measurements of semiconductor structures based on scatterometry measurement data are described herein. Scatterometry measurement data is processed directly, without the use of a traditional measurement model. Measurement sensitivity is defined by the changes in detected diffraction images at one or more non-zero diffraction orders over at least two different illumination incidence angles. Discrete values of a scalar function are determined directly from measured images at each incidence angle. A continuous mathematical function is fit to the set of discrete values of the scalar function determined at each incidence angle. A value of a parameter of interest is determined based on analysis of the mathematical function. In some embodiments, the scalar function includes a weighting function, and the weighting values associated with weighting function are optimized to yield an accurate fit of the mathematical function to the scalar values.

公开(公告)号：US20220349752A1

公开(公告)日：2022-11-03

申请号：US17856660

申请日：2022-07-01

Applicant: KLA Corporation

Inventor： Tianhan Wang ,  Aaron Rosenberg ,  Dawei Hu ,  Alexander Kuznetsov ,  Manh Dang Nguyen ,  Stilian Pandev ,  John Lesoine ,  Qiang Zhao ,  Liequan Lee ,  Houssam Chouaib ,  Ming Di ,  Torsten R. Kaack ,  Andrei V. Shchegrov ,  Zhengquan Tan

IPC: G01J3/18 ,  G01J3/28 ,  G01N21/55 ,  G01N21/956 ,  G01N21/21 ,  G01N21/25 ,  G01N21/88 ,  G01N21/84

Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.

公开(公告)号：US11796390B2

公开(公告)日：2023-10-24

申请号：US17856660

申请日：2022-07-01

Applicant: KLA Corporation

Inventor： Tianhan Wang ,  Aaron Rosenberg ,  Dawei Hu ,  Alexander Kuznetsov ,  Manh Dang Nguyen ,  Stilian Pandev ,  John Lesoine ,  Qiang Zhao ,  Liequan Lee ,  Houssam Chouaib ,  Ming Di ,  Torsten R. Kaack ,  Andrei V. Shchegrov ,  Zhengquan Tan

IPC: G01J3/18 ,  G01J3/28 ,  G01N21/55 ,  G01N21/956 ,  G01N21/21 ,  G01N21/25 ,  G01N21/88 ,  G01N21/84

CPC classification number: G01J3/18 ,  G01J3/28 ,  G01N21/21 ,  G01N21/25 ,  G01N21/55 ,  G01N21/8422 ,  G01N21/8851 ,  G01N21/956 ,  G01J2003/2836 ,  G01N2021/8883

Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.