公开(公告)号：US12013355B2

公开(公告)日：2024-06-18

申请号：US17411030

申请日：2021-08-24

Applicant: KLA Corporation

Inventor： David Y. Wang ,  Kerstin Purrucker ,  Michael Friedmann

IPC: G01N23/201

CPC classification number: G01N23/201 ,  G01N2223/054 ,  G01N2223/306 ,  G01N2223/6116

Abstract: Methods and systems for performing measurements of semiconductor structures based on high-brightness, Soft X-Ray (SXR) illumination over a small illumination spot size with a small physical footprint are presented herein. In one aspect, the focusing optics of an SXR based metrology system project an image of the illumination source onto a specimen under measurement with a demagnification of at least 1.25. In a further aspect, an illumination beam path from the x-ray illumination source to the specimen under measurement is less than 2 meters. In another aspect, SXR based measurements are performed with x-ray radiation in the soft x-ray region (i.e., 80-3000 eV). In some embodiments, SXR based measurements are performed at grazing angles of incidence in a range from near zero degrees to 90 degrees. In some embodiments, the illumination optics project an image of an illumination source onto a specimen under measurement with a demagnification of 50, or less.

公开(公告)号：US20200294774A1

公开(公告)日：2020-09-17

申请号：US16814319

申请日：2020-03-10

Applicant: KLA CORPORATION

Inventor： Chao Chang ,  Michael Friedmann

IPC: H01J37/32 ,  B01D53/04 ,  B01D53/047 ,  B01D53/22

Abstract: A process chamber, such as for semiconductor processing equipment, is connected with a recovery unit. The recovery unit includes a first storage tank for buffer gas and a second storage tank for rare gas. Both storage tanks are connected with a column in the recovery unit. The recovery unit and process chamber can operate as a closed system. The rare gas can be transported at a variable flow rate while separation in the recovery unit operates at a constant flow condition.

公开(公告)号：US20200274314A1

公开(公告)日：2020-08-27

申请号：US16791488

申请日：2020-02-14

Applicant: KLA Corporation

Inventor： Ilya Bezel ,  Matthew Derstine ,  William Schumaker ,  Michael Friedmann

IPC: H01S3/0943 ,  F21V9/06

Abstract: A system for pumping laser sustained plasma is disclosed. The system includes a plurality of pump modules configured to generate respective pulses of pump illumination for the laser sustained plasma, wherein at least one pump module is configured to generate a train of pump pulses that is interlaced in time with another train of pump pulses generated by at least one other pump module of the plurality of pump modules. The system further includes a plurality of non-collinear illumination paths configured to direct the respective pulses of pump illumination from the plurality of pump modules into a collection volume of the laser sustained plasma.

公开(公告)号：US20210136902A1

公开(公告)日：2021-05-06

申请号：US17076774

申请日：2020-10-21

Applicant: KLA Corporation

Inventor： Chao Chang ,  Michael Friedmann ,  Jongjin Kim ,  Will Schumaker ,  Ben Clarke

IPC: H05G2/00

Abstract: Methods and systems for generating X-ray illumination from a laser produced plasma (LPP) employing a low atomic number, cryogenic target are presented herein. A highly focused, short duration laser pulse is directed to a low atomic number, cryogenically frozen target, igniting a plasma. In some embodiments, the target material includes one or more elements having an atomic number less than 19. In some embodiments, the low atomic number, cryogenic target material is coated on the surface of a cryogenically cooled drum configured to rotate and translate with respect to incident laser light. In some embodiments, the low atomic number, cryogenic LPP light source generates multiple line or broadband X-ray illumination in a soft X-ray (SXR) spectral range used to measure structural and material characteristics of semiconductor structures. In some embodiments, Reflective, Small-Angle X-ray Scatterometry measurements are performed with a low atomic number, cryogenic LPP illumination source as described herein.

公开(公告)号：US11259394B2

公开(公告)日：2022-02-22

申请号：US17076767

申请日：2020-10-21

Applicant: KLA Corporation

Inventor： Chao Chang ,  Will Schumaker ,  Jongjin Kim ,  Michael Friedmann

IPC: H05G2/00

Abstract: Methods and systems for generating X-ray illumination from a laser produced plasma (LPP) employing a liquid sheet jet target are presented herein. A highly focused, short duration laser pulse is directed to a liquid sheet jet target. The interaction of the focused laser pulse with the sheet jet target ignites a plasma. In some embodiments, the liquid sheet jet is generated by a convergent capillary nozzle or a convergent, planar cavity nozzle. In some embodiments, the target material includes one or more elements having a relatively low atomic number. In some embodiments, the liquid sheet jet LPP light source generates multiple line or broadband X-ray illumination in a soft X-ray (SXR) spectral range used to measure structural and material characteristics of semiconductor structures. In some embodiments, Reflective, Small-Angle X-ray Scatterometry measurements are performed with a liquid sheet jet LPP illumination source as described herein.

公开(公告)号：US20220196576A1

公开(公告)日：2022-06-23

申请号：US17411030

申请日：2021-08-24

Applicant: KLA Corporation

Inventor： David Y. Wang ,  Kerstin Purrucker ,  Michael Friedmann

IPC: G01N23/201

Abstract: Methods and systems for performing measurements of semiconductor structures based on high-brightness, Soft X-Ray (SXR) illumination over a small illumination spot size with a small physical footprint are presented herein. In one aspect, the focusing optics of an SXR based metrology system project an image of the illumination source onto a specimen under measurement with a demagnification of at least 1.25. In a further aspect, an illumination beam path from the x-ray illumination source to the specimen under measurement is less than 2 meters. In another aspect, SXR based measurements are performed with x-ray radiation in the soft x-ray region (i.e., 80-3000 eV). In some embodiments, SXR based measurements are performed at grazing angles of incidence in a range from near zero degrees to 90 degrees. In some embodiments, the illumination optics project an image of an illumination source onto a specimen under measurement with a demagnification of 50, or less.

公开(公告)号：US11272607B2

公开(公告)日：2022-03-08

申请号：US17076774

申请日：2020-10-21

Applicant: KLA Corporation

Inventor： Chao Chang ,  Michael Friedmann ,  Jongjin Kim ,  Will Schumaker ,  Ben Clarke

IPC: H05G2/00

Abstract: Methods and systems for generating X-ray illumination from a laser produced plasma (LPP) employing a low atomic number, cryogenic target are presented herein. A highly focused, short duration laser pulse is directed to a low atomic number, cryogenically frozen target, igniting a plasma. In some embodiments, the target material includes one or more elements having an atomic number less than 19. In some embodiments, the low atomic number, cryogenic target material is coated on the surface of a cryogenically cooled drum configured to rotate and translate with respect to incident laser light. In some embodiments, the low atomic number, cryogenic LPP light source generates multiple line or broadband X-ray illumination in a soft X-ray (SXR) spectral range used to measure structural and material characteristics of semiconductor structures. In some embodiments, Reflective, Small-Angle X-ray Scatterometry measurements are performed with a low atomic number, cryogenic LPP illumination source as described herein.

公开(公告)号：US11268901B2

公开(公告)日：2022-03-08

申请号：US15930379

申请日：2020-05-12

Applicant: KLA Corporation

Inventor： Barry Blasenheim ,  Noam Sapiens ,  Michael Friedmann ,  Pablo Rovira

IPC: G01N21/21 ,  G01J3/02 ,  G01J4/00 ,  G02B27/28 ,  G02B27/30

Abstract: A collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and a spectrometer to receive the reflected optical beam. The collection system also includes a plurality of aperture masks arranged in a rotatable sequence about an axis parallel to an optical axis. Each aperture mask of the plurality of aperture masks is rotatable into and out of the reflected optical beam between the chuck and the spectrometer to selectively mask the reflected optical beam.

公开(公告)号：US20210136901A1

公开(公告)日：2021-05-06

申请号：US17076767

申请日：2020-10-21

Applicant: KLA Corporation

Inventor： Chao Chang ,  Will Schumaker ,  Jongjin Kim ,  Michael Friedmann

IPC: H05G2/00

Abstract: Methods and systems for generating X-ray illumination from a laser produced plasma (LPP) employing a liquid sheet jet target are presented herein. A highly focused, short duration laser pulse is directed to a liquid sheet jet target. The interaction of the focused laser pulse with the sheet jet target ignites a plasma. In some embodiments, the liquid sheet jet is generated by a convergent capillary nozzle or a convergent, planar cavity nozzle. In some embodiments, the target material includes one or more elements having a relatively low atomic number. In some embodiments, the liquid sheet jet LPP light source generates multiple line or broadband X-ray illumination in a soft X-ray (SXR) spectral range used to measure structural and material characteristics of semiconductor structures. In some embodiments, Reflective, Small-Angle X-ray Scatterometry measurements are performed with a liquid sheet jet LPP illumination source as described herein.

公开(公告)号：US11557462B2

公开(公告)日：2023-01-17

申请号：US16814319

申请日：2020-03-10

Applicant: KLA CORPORATION

Inventor： Chao Chang ,  Michael Friedmann

IPC: H01J37/32 ,  B01D53/04 ,  B01D53/047 ,  B01D53/22

Abstract: A process chamber, such as for semiconductor processing equipment, is connected with a recovery unit. The recovery unit includes a first storage tank for buffer gas and a second storage tank for rare gas. Both storage tanks are connected with a column in the recovery unit. The recovery unit and process chamber can operate as a closed system. The rare gas can be transported at a variable flow rate while separation in the recovery unit operates at a constant flow condition.