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公开(公告)号:US20200156261A1
公开(公告)日:2020-05-21
申请号:US16682600
申请日:2019-11-13
Applicant: KLA Corporation
Inventor: Mark Lin , Ben Clarke
Abstract: A gripper assembly is disclosed. The gripper assembly includes a stage, a mounting platform, and a plurality of the flexible gripper elements. The flexible gripper element is configured to grip an object. The flexible gripper elements are supported by a first end piece, where the first end piece is attached to the mounting platform. The mounting platform is connected to the stage, where the stage is moveable. The flexible gripper element includes a hollow section that is selectively pressurizable. The hollow section includes one or more zones, where each zone includes chambers which are pressurizable by a fluid input. The selective pressurization of the hollow section allows the flexible gripper element to grip the object.
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公开(公告)号:US11272607B2
公开(公告)日:2022-03-08
申请号:US17076774
申请日:2020-10-21
Applicant: KLA Corporation
Inventor: Chao Chang , Michael Friedmann , Jongjin Kim , Will Schumaker , Ben Clarke
IPC: H05G2/00
Abstract: Methods and systems for generating X-ray illumination from a laser produced plasma (LPP) employing a low atomic number, cryogenic target are presented herein. A highly focused, short duration laser pulse is directed to a low atomic number, cryogenically frozen target, igniting a plasma. In some embodiments, the target material includes one or more elements having an atomic number less than 19. In some embodiments, the low atomic number, cryogenic target material is coated on the surface of a cryogenically cooled drum configured to rotate and translate with respect to incident laser light. In some embodiments, the low atomic number, cryogenic LPP light source generates multiple line or broadband X-ray illumination in a soft X-ray (SXR) spectral range used to measure structural and material characteristics of semiconductor structures. In some embodiments, Reflective, Small-Angle X-ray Scatterometry measurements are performed with a low atomic number, cryogenic LPP illumination source as described herein.
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公开(公告)号:US11426880B2
公开(公告)日:2022-08-30
申请号:US16682600
申请日:2019-11-13
Applicant: KLA Corporation
Inventor: Mark Lin , Ben Clarke
Abstract: A gripper assembly is disclosed. The gripper assembly includes a stage, a mounting platform, and a plurality of the flexible gripper elements. The flexible gripper element is configured to grip an object. The flexible gripper elements are supported by a first end piece, where the first end piece is attached to the mounting platform. The mounting platform is connected to the stage, where the stage is moveable. The flexible gripper element includes a hollow section that is selectively pressurizable. The hollow section includes one or more zones, where each zone includes chambers which are pressurizable by a fluid input. The selective pressurization of the hollow section allows the flexible gripper element to grip the object.
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公开(公告)号:US20210136902A1
公开(公告)日:2021-05-06
申请号:US17076774
申请日:2020-10-21
Applicant: KLA Corporation
Inventor: Chao Chang , Michael Friedmann , Jongjin Kim , Will Schumaker , Ben Clarke
IPC: H05G2/00
Abstract: Methods and systems for generating X-ray illumination from a laser produced plasma (LPP) employing a low atomic number, cryogenic target are presented herein. A highly focused, short duration laser pulse is directed to a low atomic number, cryogenically frozen target, igniting a plasma. In some embodiments, the target material includes one or more elements having an atomic number less than 19. In some embodiments, the low atomic number, cryogenic target material is coated on the surface of a cryogenically cooled drum configured to rotate and translate with respect to incident laser light. In some embodiments, the low atomic number, cryogenic LPP light source generates multiple line or broadband X-ray illumination in a soft X-ray (SXR) spectral range used to measure structural and material characteristics of semiconductor structures. In some embodiments, Reflective, Small-Angle X-ray Scatterometry measurements are performed with a low atomic number, cryogenic LPP illumination source as described herein.
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