公开(公告)号：US07869894B2

公开(公告)日：2011-01-11

申请号：US11420625

申请日：2006-05-26

Applicant: James Broc Stirton ,  Andre Holfeld

Inventor： James Broc Stirton ,  Andre Holfeld

IPC: G06F19/00

CPC classification number: G05B19/41875 ,  G05B2219/37224 ,  G05B2219/45031 ,  G05B2219/50058 ,  H01L22/20 ,  Y02P90/22

Abstract: By directly using relative biases, contained in the relative bias date matrix, and by appropriately weighting the components thereof, sampling rate limitations in an APC control scheme may be efficiently compensated for. In particular embodiments, an age-based weighting factor is established that scales measurement data uncertainty according to the delay with which the corresponding measurement data for a specific control thread are obtained.

Abstract translation: 通过直接使用包含在相对偏置日期矩阵中的相对偏差，并且通过适当地加权其组件，可以有效地补偿APC控制方案中的采样率限制。 在具体实施例中，建立基于年龄的加权因子，其根据获得特定控制线程的相应测量数据的延迟来缩放测量数据不确定度。

公开(公告)号：US07299105B2

公开(公告)日：2007-11-20

申请号：US11030863

申请日：2005-01-06

Applicant: Andre Holfeld ,  Jan Raebiger ,  Lutz Herrmann

Inventor： Andre Holfeld ,  Jan Raebiger ,  Lutz Herrmann

IPC: G06F19/00

CPC classification number: H01L22/20 ,  H01L29/6659

Abstract: Methods and systems are disclosed that allow an adjustment of a product parameter, such as operating speed, of a circuit element, such as a field effect transistor, during the fabrication of the device. A manufacturing process downstream of a first controlled process is controlled by a superior control scheme in response to the measurement data of the first and second processes and on the basis of a sensitivity function, which describes the effect a variation of the product parameter generates in the measurement data. The superior control scheme may provide a compensated target value for the downstream process.

Abstract translation: 公开了在制造装置期间允许调整电路元件（例如场效应晶体管）的乘积参数（诸如工作速度）的方法和系统。 响应于第一和第二过程的测量数据并且基于灵敏度函数，通过优异的控制方案来控制第一受控过程下游的制造过程，该灵敏度函数描述了产品参数的变化在 测量数据。 优越的控制方案可以为下游过程提供补偿的目标值。

公开(公告)号：US20050048417A1

公开(公告)日：2005-03-03

申请号：US10813374

申请日：2004-03-30

Applicant: Jan Raebiger ,  Andre Holfeld

Inventor： Jan Raebiger ,  Andre Holfeld

IPC: G02B1/11 ,  G03F1/00 ,  G03F7/20 ,  G03F7/26 ,  G03F7/36 ,  G03F7/40 ,  H01L21/336

CPC classification number: G03F7/40

Abstract: In an improved technique for adjusting an etch time of a resist trim process, additional measurement data representing an optical characteristic, such as the reflectivity of an anti-reflective coating, is used. Since the initial thickness of the resist mask features may significantly depend on the optical characteristics of the anti-reflective coating, the additional measurement data allow compensation for process variations more efficiently as compared to the conventional approach.

Abstract translation: 在用于调整抗蚀剂修整工艺的蚀刻时间的改进技术中，使用表示光学特性的附加测量数据，例如抗反射涂层的反射率。 由于抗蚀剂掩模特征的初始厚度可能显着取决于抗反射涂层的光学特性，所以与常规方法相比，附加测量数据可以更有效地补偿工艺变化。

公开(公告)号：US20070078556A1

公开(公告)日：2007-04-05

申请号：US11420625

申请日：2006-05-26

Applicant: James Stirton ,  Andre Holfeld

Inventor： James Stirton ,  Andre Holfeld

IPC: G06F19/00

CPC classification number: G05B19/41875 ,  G05B2219/37224 ,  G05B2219/45031 ,  G05B2219/50058 ,  H01L22/20 ,  Y02P90/22

Abstract: By directly using relative biases, contained in the relative bias date matrix, and by appropriately weighting the components thereof, sampling rate limitations in an APC control scheme may be efficiently compensated for. In particular embodiments, an age-based weighting factor is established that scales measurement data uncertainty according to the delay with which the corresponding measurement data for a specific control thread are obtained.

Abstract translation: 通过直接使用包含在相对偏置日期矩阵中的相对偏差，并且通过适当地加权其组件，可以有效地补偿APC控制方案中的采样率限制。 在具体实施例中，建立基于年龄的加权因子，其根据获得特定控制线程的相应测量数据的延迟来缩放测量数据不确定度。

公开(公告)号：US20050192700A1

公开(公告)日：2005-09-01

申请号：US11030863

申请日：2005-01-06

Applicant: Andre Holfeld ,  Jan Raebiger ,  Lutz Herrmann

Inventor： Andre Holfeld ,  Jan Raebiger ,  Lutz Herrmann

IPC: G06F19/00 ,  H01L21/336 ,  H01L21/66

CPC classification number: H01L22/20 ,  H01L29/6659

Abstract: Methods and systems are disclosed that allow an adjustment of a product parameter, such as operating speed, of a circuit element, such as a field effect transistor, during the fabrication of the device. A manufacturing process downstream of a first controlled process is controlled by a superior control scheme in response to the measurement data of the first and second processes and on the basis of a sensitivity function, which describes the effect a variation of the product parameter generates in the measurement data. The superior control scheme may provide a compensated target value for the downstream process.

Abstract translation: 公开了在制造装置期间允许调整诸如场效应晶体管之类的电路元件的产品参数（诸如工作速度）的方法和系统。 响应于第一和第二过程的测量数据并且基于灵敏度函数，通过优异的控制方案来控制第一受控过程下游的制造过程，该灵敏度函数描述了产品参数的变化在 测量数据。 优越的控制方案可以为下游过程提供补偿的目标值。