公开(公告)号：US20140212813A1

公开(公告)日：2014-07-31

申请号：US14242957

申请日：2014-04-02

Applicant: JSR Corporation

Inventor： Yuusuke ASANO ,  Mitsuo SATOU ,  Hiromitsu NAKASHIMA ,  Kazuki KASAHARA ,  Yoshifumi OIZUMI ,  Masafumi HORI ,  Takanori KAWAKAMI ,  Yasuhiko MATSUDA ,  Kazuo NAKAHARA

IPC: G03F7/038

CPC classification number: G03F7/0392 ,  C08F20/22 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/039 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/32

Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1. -A-R1   (x)

Abstract translation: 辐射敏感性树脂组合物包括包含酸不稳定基团的第一聚合物，暴露于辐射时产生酸的酸产生剂和包含氟原子的第二聚合物和由通式（x）表示的官能团。 第二聚合物的氟原子含量高于第一聚合物的氟原子含量。 R1表示碱不稳定基团。 A表示氧原子，-NR' - ， - CO-O - 或-SO 2 -O - ，其中由A表示的氧原子不是直接与芳环键合的氧原子，羰基或 磺酰基，R'表示氢原子或碱不稳定基团，“＃”和“##”表示与R1键合的键。 -A-R1（x）

公开(公告)号：US20140023968A1

公开(公告)日：2014-01-23

申请号：US14037659

申请日：2013-09-26

Applicant: JSR CORPORATION

Inventor： Hiromitsu NAKASHIMA ,  Toru KIMURA ,  Yusuke ASANO ,  Masafumi HORI ,  Reiko KIMURA ,  Kazuki KASAHARA ,  Hiromu MIYATA ,  Masafumi YOSHIDA

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0041 ,  C08F220/22 ,  C08F220/24 ,  C08F220/28 ,  C08F2220/283 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  H01L21/027 ,  H01L21/0274

Abstract: A resist pattern-forming method includes providing a resist film having a surface free energy of 30 to 40 mN/m on a substrate using a radiation-sensitive resin composition. The resist film is exposed by applying radiation via a mask. The exposed resist film is developed. It is preferable that the exposing of the resist film includes exposing the resist film via an immersion liquid that is provided over the resist film

Abstract translation: 抗蚀剂图案形成方法包括使用辐射敏感性树脂组合物在基板上提供具有30至40mN / m的表面自由能的抗蚀剂膜。 通过经由掩模施加辐射来曝光抗蚀剂膜。 显影出抗蚀剂膜。 优选的是，抗蚀剂膜的曝光包括通过设置在抗蚀剂膜上的浸渍液体曝光抗蚀剂膜

公开(公告)号：US20190135967A1

公开(公告)日：2019-05-09

申请号：US16240070

申请日：2019-01-04

Applicant: JSR Corporation

Inventor： Masafumi HORI ,  Hiroyuki Komatsu ,  Tomohiro Oda ,  Hitoshi Osaki ,  Takehiko Naruoka

IPC: C08F297/02 ,  C08K5/10 ,  C08L25/04 ,  H01L21/027 ,  C08L53/00

Abstract: A composition for pattern formation includes a first polymer, a second polymer and a solvent. The first polymer includes: a first block including a first structural unit derived from a substituted or unsubstituted styrene; and a second block including a second structural unit other than the first structural unit. The second polymer includes: the first structural unit; and a group bonding to at least one end of a main chain thereof and including a polar group. The polar group is preferably a hydroxy group or a carboxyl group. A number average molecular weight of the second polymer is preferably no greater than 6,000. A mass ratio of the second polymer to the first polymer is preferably no less than 0.15 and no greater than 0.4. The solvent preferably comprises a compound comprising a hydroxyl group and an alkyl ester group.

公开(公告)号：US20190198316A1

公开(公告)日：2019-06-27

申请号：US16288354

申请日：2019-02-28

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Tomohiro ODA ,  Hitoshi OSAKI ,  Masafumi HORI ,  Takehiko NARUOKA

IPC: H01L21/027 ,  H01L21/02 ,  H01L21/311

CPC classification number: H01L21/0271 ,  C08L25/06 ,  C08L33/10 ,  C08L2203/206 ,  C08L2312/02 ,  H01L21/02118 ,  H01L21/02282 ,  H01L21/02334 ,  H01L21/02359 ,  H01L21/28 ,  H01L21/285 ,  H01L21/31133

Abstract: A method for selectively modifying a base material surface, includes applying a composition on a surface of a base material to form a coating film. The coating film is heated. The base material includes a surface layer which includes a first region including a metal. The composition includes a first polymer and a solvent. The first polymer includes at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with the metal. It is preferred that the base material further includes a second region comprising substantially only a non-metal, and the method further includes, after the heating, removing with a rinse agent a portion formed on the second region, of the coating film. The metal is preferably a constituent of a metal substance, an alloy, an oxide, an electrically conductive nitride or a silicide.

公开(公告)号：US20150177616A1

公开(公告)日：2015-06-25

申请号：US14640882

申请日：2015-03-06

Applicant: JSR CORPORATION

Inventor： Hirokazu SAKAKIBARA ,  Masafumi HORI ,  Taiichi FURUKAWA ,  Koji ITO

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/038 ,  C07C381/12 ,  C08F220/10 ,  C08F220/24 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  Y10S430/114 ,  Y10S430/115

Abstract: A pattern-forming method includes providing a resist film on a substrate using a radiation-sensitive composition. The resist film is exposed. The exposed resist film is developed using a developer solution. The developer solution includes no less than 80% by mass of an organic solvent. The radiation-sensitive composition includes at least two components including a first polymer and a radiation-sensitive acid generator. The first polymer includes a structural unit having an acid-labile group. One or more components of the radiation-sensitive composition have a group represented by a formula (1). A− represents —N−—SO2—RD, —COO−, —O− or —SO3−. —SO3− does not directly bond to a carbon atom having a fluorine atom. RD represents a linear or branched monovalent hydrocarbon group, or the like. X+ represents an onium cation. -A−X+  (1)

Abstract translation: 图案形成方法包括使用辐射敏感组合物在衬底上提供抗蚀剂膜。 抗蚀剂膜被曝光。 使用显影剂溶液显影曝光的抗蚀剂膜。 显影剂溶液含有不少于80质量％的有机溶剂。 辐射敏感组合物包括至少两种组分，包括第一聚合物和辐射敏感性酸产生剂。 第一聚合物包括具有酸不稳定基团的结构单元。 辐射敏感组合物的一种或多种组分具有由式（1）表示的基团。 A-表示-N-SO 2 -R D，-COO-，-O-或-SO 3 - 。 -SO 3 - 不直接键合到具有氟原子的碳原子。 RD表示直链或支链一价烃基等。 X +表示鎓阳离子。 -A-X +（1）

公开(公告)号：US20150004547A1

公开(公告)日：2015-01-01

申请号：US14487894

申请日：2014-09-16

Applicant: JSR Corporation

Inventor： Gouji WAKAMATSU ,  Masafumi HORI ,  Kouichi FUJIWARA ,  Makoto SUGIURA

IPC: G03F7/40 ,  G03F7/20

CPC classification number: G03F7/40 ,  G03F7/0035 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2024 ,  H01L21/0273

Abstract: A resist pattern-insolubilizing resin composition is used in a resist pattern-forming method. The resist pattern-insolubilizing resin composition includes solvent and a resin. The resin includes a first repeating unit that includes a hydroxyl group in its side chain and at least one of a second repeating unit derived from a monomer shown by a following formula (1-1) and a third repeating unit derived from a monomer shown by a following formula (1-2), wherein for example, R1 represents a hydrogen atom, A represents a methylene group, R2 represents a group shown by a following formula (2-1) or a group shown by a following formula (2-2), R3 represents a methylene group, R4 represents a hydrogen atom, and n is 0 or 1, wherein each of R34 represents at least one of a hydrogen atom and a linear or branched alkyl group having 1 to 10 carbon atoms.

Abstract translation: 抗蚀剂图案不溶化树脂组合物用于抗蚀剂图案形成方法。 抗蚀剂图案不溶化树脂组合物包括溶剂和树脂。 树脂包括在其侧链中包含羟基的第一重复单元和由下式（1-1）所示的单体衍生的第二重复单元和由下式表示的单体衍生的第三重复单元中的至少一种： 下述式（1-2）表示的基团，其中，例如，R1表示氢原子，A表示亚甲基，R2表示下述式（2-1）所示的基团或下述式（2- 2）中，R3表示亚甲基，R4表示氢原子，n表示0或1，R34表示氢原子和碳原子数1〜10的直链或支链烷基中的至少一种。

公开(公告)号：US20130295506A1

公开(公告)日：2013-11-07

申请号：US13940119

申请日：2013-07-11

Applicant: JSR CORPORATION

Inventor： Hirokazu SAKAKIBARA ,  Taiichi FURUKAWA ,  Masafumi HORI ,  Koji ITO ,  Hiromu MIYATA

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0041 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/38

Abstract: A resist pattern-forming method includes forming a resist coating film using a radiation-sensitive resin composition. The resist coating film is exposed and developed using a developer solution containing no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a polymer component including a polymer having an acid-labile group, and a radiation-sensitive acid generator. The polymer component includes, in an identical polymer or different polymers, a first structural unit having a first hydrocarbon group, and a second structural unit having a second hydrocarbon group. The first hydrocarbon group is an unsubstituted or substituted branched chain group, or the is like. The second hydrocarbon group has an adamantane skeleton. A molar ratio of the second hydrocarbon group to the first hydrocarbon group is less than 1. A proportion of a structural unit having a hydroxyl group in the polymer component is less than 5 mol %.

Abstract translation: 抗蚀剂图案形成方法包括使用辐射敏感性树脂组合物形成抗蚀剂涂膜。 使用含有不少于80质量％的有机溶剂的显影剂溶液将抗蚀剂涂膜曝光和显影。 辐射敏感性树脂组合物包括含有酸不稳定基团的聚合物和辐射敏感性酸产生剂的聚合物组分。 聚合物组分包括在相同聚合物或不同聚合物中的具有第一烃基的第一结构单元和具有第二烃基的第二结构单元。 第一个烃基是未取代或取代的支链基团，或类似的。 第二个烃基具有金刚烷骨架。 第二烃基与第一烃基的摩尔比小于1.聚合物组分中具有羟基的结构单元的比例小于5摩尔％。

公开(公告)号：US20150093703A1

公开(公告)日：2015-04-02

申请号：US14502024

申请日：2014-09-30

Applicant: JSR CORPORATION

Inventor： Hiromu MIYATA ,  Hayato NAMAI ,  Masafumi HORI

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/0045 ,  G03F7/0042 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: The present invention relates to a radiation-sensitive resin composition that contains: a compound that has a structure represented by the following formula (1); a first polymer that includes a fluorine atom; and a solvent. In the following formula (1), X represents a carbonyl group, a sulfonyl group or a single bond. Y+ represents a monovalent radiation-degradable onium cation. The first polymer preferably has at least one selected from the group consisting of a structural unit represented by the following formula (2a) and a structural unit represented by the following formula (2b). The first polymer preferably includes an alkali-labile group. The first polymer preferably includes an acid-labile group. It is preferred that a radiation-sensitive acid generator is further contained.

Abstract translation: 本发明涉及具有下述式（1）所示结构的化合物的放射线敏感性树脂组合物。 包含氟原子的第一聚合物; 和溶剂。 在下式（1）中，X表示羰基，磺酰基或单键。 Y +表示一价可辐射降解的鎓阳离子。 第一聚合物优选具有选自由下式（2a）表示的结构单元和由下式（2b）表示的结构单元组成的组中的至少一种。 第一聚合物优选包括碱不稳定基团。 第一聚合物优选包含酸不稳定基团。 进一步含有辐射敏感性酸发生剂是优选的。

公开(公告)号：US20140363766A9

公开(公告)日：2014-12-11

申请号：US13940119

申请日：2013-07-11

Applicant: JSR CORPORATION

Inventor： Hirokazu SAKAKIBARA ,  Taiichi FURUKAWA ,  Masafumi HORI ,  Koji ITO ,  Hiromu MIYATA

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0041 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/38

Abstract: A resist pattern-forming method includes forming a resist coating film using a radiation-sensitive resin composition. The resist coating film is exposed and developed using a developer solution containing no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a polymer component including a polymer having an acid-labile group, and a radiation-sensitive acid generator. The polymer component includes, in an identical polymer or different polymers, a first structural unit having a first hydrocarbon group, and a second structural unit having a second hydrocarbon group. The first hydrocarbon group is an unsubstituted or substituted branched chain group, or the is like. The second hydrocarbon group has an adamantane skeleton. A molar ratio of the second hydrocarbon group to the first hydrocarbon group is less than 1. A proportion of a structural unit having a hydroxyl group in the polymer component is less than 5 mol %.

Abstract translation: 抗蚀剂图案形成方法包括使用辐射敏感性树脂组合物形成抗蚀剂涂膜。 使用含有不少于80质量％的有机溶剂的显影剂溶液将抗蚀剂涂膜曝光和显影。 辐射敏感性树脂组合物包括含有酸不稳定基团的聚合物和辐射敏感性酸产生剂的聚合物组分。 聚合物组分包括在相同聚合物或不同聚合物中的具有第一烃基的第一结构单元和具有第二烃基的第二结构单元。 第一个烃基是未取代或取代的支链基团，或类似的。 第二个烃基具有金刚烷骨架。 第二烃基与第一烃基的摩尔比小于1.聚合物组分中具有羟基的结构单元的比例小于5摩尔％。

公开(公告)号：US20140295350A1

公开(公告)日：2014-10-02

申请号：US14307296

申请日：2014-06-17

Applicant: JSR CORPORATION

Inventor： Hirokazu SAKAKIBARA ,  Taiichi FURUKAWA ,  Reiko KIMURA ,  Masafumi HORI

IPC: G03F7/038

CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/325

Abstract: A resist pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed using a developer solution including no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a polymer, a radiation-sensitive acid generator, and an acid diffusion controller which includes a compound having an amide group. The polymer has a weight average molecular weight in terms of the polystyrene equivalent of greater than 6,000 and includes a first structural unit that includes an acid-labile group. The polymer includes less than 5 mol % or 0 mol % of a second structural unit that includes a hydroxyl group.

Abstract translation: 抗蚀剂图案形成方法包括在基板上涂布辐射敏感性树脂组合物以提供抗蚀剂膜。 抗蚀剂膜被曝光。 使用包含不少于80质量％的有机溶剂的显影剂溶液显影曝光的抗蚀剂膜。 辐射敏感性树脂组合物包括聚合物，辐射敏感性酸产生剂和包含具有酰胺基的化合物的酸扩散控制剂。 聚合物的重均分子量以聚苯乙烯当量大于6000表示，并且包括包含酸不稳定基团的第一结构单元。 聚合物包含小于5mol％或0mol％的包含羟基的第二结构单元。