Method and Device for Producing an Edge Structure of a Semiconductor Component

    公开(公告)号:US20220416019A1

    公开(公告)日:2022-12-29

    申请号:US17841871

    申请日:2022-06-16

    摘要: A method for producing an edge structure of a semiconductor component includes: providing a semiconductor body having at least two mutually spaced-apart main faces respectively having an edge, between which edges an edge face extends; and etching a predetermined edge contour by purposely applying a chemical etchant onto the edge face by an etchant jet with simultaneous rotation of the semiconductor body about a rotation axis. The etchant jet is guided with a predetermined jet cross section, while being directed tangentially with respect to the edge face, such that the etchant jet impinges on the edge face only with a part of the jet cross section. A corresponding device for producing an edge structure of a semiconductor component is also described.

    SEMICONDUCTOR COMPONENT WITH OPTIMIZED EDGE TERMINATION
    7.
    发明申请
    SEMICONDUCTOR COMPONENT WITH OPTIMIZED EDGE TERMINATION 有权
    具有优化边缘终止的半导体器件

    公开(公告)号:US20140327114A1

    公开(公告)日:2014-11-06

    申请号:US14361376

    申请日:2012-09-06

    摘要: A semiconductor component includes a two-sided semiconductor body, an inner zone with a basic doping of a first conduction type, and two semiconductor zones. The first zone, disposed between the first side and inner zone, is of the first conduction type with a doping concentration higher than that of the inner zone. The second zone, disposed between the second side and inner zone, is of a second conduction type complementary to the first type with a doping concentration higher than that of the inner zone.At least one first edge chamfer extends at a first angle to the extension plane of the transition from the second zone to the inner zone at least along the edge of the second zone and inner zone.At least one buried zone of the second conduction type is provided between the first zone and inner zone, and extends substantially parallel to the first zone.

    摘要翻译: 半导体部件包括双面半导体本体,具有第一导电类型的基本掺杂的内部区域和两个半导体区域。 设置在第一侧面和内部区域之间的第一区域是具有比内部区域高的掺杂浓度的第一导电类型。 设置在第二侧面和内部区域之间的第二区域具有与第一类型互补的第二导电类型,其掺杂浓度高于内部区域的掺杂浓度。 至少一个第一边缘倒角至少沿着第二区域和内部区域的边缘以第一角度延伸到从第二区域到内部区域的过渡的延伸平面。 第二导电类型的至少一个埋置区域设置在第一区域和内部区域之间,并且基本平行于第一区域延伸。