公开(公告)号：US20220071461A1

公开(公告)日：2022-03-10

申请号：US17106222

申请日：2020-11-30

Applicant: Industrial Technology Research Institute

Inventor： FU-CHING TUNG ,  HSUAN-FU WANG ,  JWU-SHENG HU ,  YUNG-JEN CHENG ,  HUNG-CHENG YEN ,  MENG-CHUN CHEN

IPC: A47L9/16 ,  B04C5/26

Abstract: A particles capturing system includes a venturi filter device, a cyclone filter device, a plurality of first nozzles and air to flow through the system. The venturi filter device has an air intake portion, a neck portion and an air outlet portion. The cyclone filter device, disposed in the air outlet portion, has an entrance and an exit. The plurality of first nozzles, disposed inside the venturi filter device, have a height greater than that of the the neck portion. When the air flows, the air enters the venturi filter device via an air inlet of the air intake portion, then orderly passes through the neck portion and the plurality of first nozzles, then enters the cyclone filter device via the entrance, and finally leaves the cyclone filter device via the exit, such that particles in the flowing air can be captured.

公开(公告)号：US20170159171A1

公开(公告)日：2017-06-08

申请号：US15432426

申请日：2017-02-14

Applicant: Industrial Technology Research Institute

Inventor： FU-CHING TUNG ,  Ching-Chiun Wang ,  Shih-Hsiang Lai

IPC: C23C14/54 ,  C23C14/28

CPC classification number: C23C14/542 ,  C23C14/24 ,  C23C14/28

Abstract: An evaporation method in this disclosure is adapted for performing an evaporation process upon a surface of an evaporation target substrate. In an embodiment, an evaporation source plate is arranged to be heated by a heater so as to evaporate an evaporation material to its gaseous state, and then enable the gaseous evaporation material to travel passing through holes of a shutter device and thus spread toward the surface of the evaporation target substrate for depositing a film. Moreover, the evaporation method uses a transmission device for controlling the opening/closing of the holes, and there is a heating area formed at a position between the shutter device and the evaporation source plate for allowing the evaporation source plate, the plural holes, the heating area, the evaporation material and the heater to be arranged parallel to one another from the top to bottom.

公开(公告)号：US20160122866A1

公开(公告)日：2016-05-05

申请号：US14851472

申请日：2015-09-11

Applicant: Industrial Technology Research Institute

Inventor： FU-CHING TUNG ,  CHING-CHIUN WANG ,  SHIH-HSIANG LAI

IPC: C23C14/54 ,  C23C14/28

CPC classification number: C23C14/542 ,  C23C14/24 ,  C23C14/28

Abstract: An evaporation system and an evaporation method are disclosed, which are adapted for performing an evaporation process upon a surface of an evaporation target substrate. In an embodiment, the evaporation system comprises an evaporation material and an evaporation source plate, whereas the evaporation source plate is arranged to be heated by a heater so as to evaporate the evaporation material form its solid state into its gaseous state, and then enable the gaseous state evaporation material to travel passing through holes by the use of a shutter device so as to spread toward the surface of the evaporation target substrate for forming a film thereon. In addition, the evaporation system further comprises a transmission device, which is to be used for controlling the opening/closing of the holes of the shutter device.

Abstract translation: 公开了一种蒸发系统和蒸发方法，其适于在蒸发对象基板的表面上进行蒸发处理。 在一个实施例中，蒸发系统包括蒸发材料和蒸发源板，而蒸发源板被布置成被加热器加热，以使蒸发材料从其固态蒸发成其气态，然后使能 气态蒸发材料通过使用快门装置行进通过孔，以朝向蒸发对象基板的表面扩散以在其上形成膜。 此外，蒸发系统还包括用于控制快门装置的孔的打开/关闭的传动装置。