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公开(公告)号：US09752866B2
公开(公告)日：2017-09-05
申请号：US14983053
申请日：2015-12-29
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor： Hsiang-Chun Wei , Yi-Sha Ku , Chia-Hung Cho , Chieh-Yu Wu , Chun-Wei Lo , Chih-Hsiang Liu
CPC classification number: G01B11/22 , G01B11/0616 , G01B11/2441 , G01B2210/56 , H01L22/12
Abstract: A measurement system is configured to measure a surface structure of a sample. The surface of the sample has a thin film and a via, the depth of the via is larger than the thickness of the thin film. The measurement system includes a light source, a first light splitter, a first aperture stop, a lens assembly, a second aperture stop, a spectrum analyzer and an analysis module. The first light splitter disposed in the light emitting direction of the light source. The first aperture stop disposed between the light source and the first light splitter. The lens assembly is disposed between the first light splitter and the sample. The second aperture stop is disposed between the lens assembly and the first light splitter. The spectrum analyzer is disposed to at a side of the first light splitter opposite to the sample.
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公开(公告)号：US11248903B2
公开(公告)日：2022-02-15
申请号：US16717425
申请日：2019-12-17
Applicant: Industrial Technology Research Institute
Inventor： Chia-Hung Cho , Po-Yi Chang , Yi-Sha Ku , Kai-Ping Chuang , Chih-Hsiang Liu , Fu-Cheng Yang
Abstract: A three-dimension measurement device includes a moving device, a projecting device, a surface-type image-capturing device and a processing device. The moving device carries an object, and moves the object to a plurality of positions. The projecting device generates a first light to the object. The surface-type image-capturing device senses a second light generated by the object in response to the first light to generate a phase image on each of the positions. The processing device is coupled to the surface-type image-capturing device and receives the phase images. The processing device performs a region-of-interest (ROI) operation for the phase images to generate a plurality of ROI images. The processing device performs a multi-step phase-shifting operation for the ROI images to calculate the surface height distribution of the object.
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公开(公告)号：US08830458B2
公开(公告)日：2014-09-09
申请号：US13752307
申请日：2013-01-28
Applicant: Industrial Technology Research Institute
Inventor： Deh-Ming Shyu , Yi-Sha Ku
Abstract: A measurement system is provided to measure a hole of a target, including a light source generation unit, a capturing unit and a processing unit. The light source generation unit generates a light source and focuses the light source on a plurality of different height planes. The capturing unit captures a plurality of images scattered from the plurality of different height planes. The processing unit obtains boundaries of the hole on the plurality of different height planes according to the plurality of images, samples image intensities of different azimuth angles on the boundaries of the hole on each of the plurality of different height planes to generate a plurality of sampling values, and develops a sidewall image of the hole according to the plurality of sampling values, the plurality of different height planes and the different azimuth angles.
Abstract translation: 提供测量系统来测量目标的孔，包括光源产生单元，捕获单元和处理单元。 光源生成单元生成光源并将光源聚焦在多个不同的高度平面上。 捕获单元捕获从多个不同高度平面散射的多个图像。 处理单元根据多个图像获得多个不同高度平面上的孔的边界，在多个不同高度平面中的每一个的孔的边界上采样不同方位角的图像强度，以产生多个采样 值，并且根据多个采样值，多个不同的高度平面和不同的方位角度来形成孔的侧壁图像。
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公开(公告)号：US10094774B2
公开(公告)日：2018-10-09
申请号：US15369190
申请日：2016-12-05
Applicant: Industrial Technology Research Institute
Inventor： Chia-Liang Yeh , Yi-Chang Chen , Yi-Sha Ku , Chun-Wei Lo
Abstract: A scattering measurement system is provided, including: a light source generator for generating a detection light beam with discontinuous multi-wavelengths, and generating a multi-order diffraction light beam with three-dimensional feature information when the detection light beam is incident on an object; a detector having a photosensitive array for receiving and converting the multi-order diffraction light beam into multi-order diffraction signals with the three-dimensional feature information; and a processing module for receiving the multi-order diffraction signals and comparing the multi-order diffraction signals with multi-order diffraction feature patterns in a database so as to analyze the three-dimensional feature information of the object.
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Patent Agency Ranking
5.发明授权Method and system for measuring a stacking overlay error by focusing on one of upper and lower layer overlay marks using a differential interference contrast microscope 有权使用微分干涉对比显微镜，通过聚焦于上层和下层覆盖标记之一来测量堆叠覆盖误差的方法和系统公开(公告)号：US09182681B2
公开(公告)日：2015-11-10
申请号：US13726409
申请日：2012-12-24
Applicant: Industrial Technology Research Institute
Inventor： Deh-Ming Shyu , Yi-Sha Ku
CPC classification number: G03F7/70633
Abstract: According to one embodiment of a method for measuring a stacking overlay error, the method may use a differential interference contrast microscope system to measure a stacking overlay mark and focus on one overlay mark of a lower layer overlay mark and an upper layer overlay mark when measuring the stacking overlay mark. Then, the method uses an image analysis scheme to obtain an image of the stacking overlay mark from a photo-detector and obtains a first reference position of the lower layer overlay mark in a direction and a second reference position of the upper layer overlay mark in the direction from the image; and computes the stacking overlay error in the direction according to the first and the second reference positions.
Abstract translation: 根据用于测量堆叠重叠误差的方法的一个实施例，该方法可以使用微分干涉对比度显微镜系统来测量堆叠叠加标记并且在测量时聚焦在下层覆盖标记和上层覆盖标记的一个覆盖标记上 堆叠叠加标记。 然后，该方法使用图像分析方案从光电检测器获得堆叠叠加标记的图像，并且在上层叠加标记的方向和第二参考位置上获得下层重叠标记的第一参考位置 从图像的方向; 并根据第一和第二参考位置计算方向上的堆叠叠加误差。
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6.发明授权公开(公告)号：US12007221B2
公开(公告)日：2024-06-11
申请号：US17562019
申请日：2021-12-27
Applicant: Industrial Technology Research Institute
Inventor： Hsiang-Chun Wei , Chih-Hsiang Liu , Yi-Sha Ku , Chung-Lun Kuo , Chun-Wei Lo , Chieh-Yi Lo
IPC: G01B11/22 , G01B9/02 , G01B9/02015
CPC classification number: G01B11/22 , G01B9/0203 , G01B9/02049
Abstract: A heterogeneous integration detecting method and a heterogeneous integration detecting apparatus are provided. The heterogeneous integration detecting method includes the following. Under the condition of maintaining the same relative distance between an interference objective lens and a sample, the relative posture of the interference objective lens and the sample is continuously adjusted according to the change of an image of the sample in the field of view of the interference objective lens until a first optical axis of the interference objective lens is determined to be substantially perpendicular to the surface of the sample according to the image. The interference objective lens is replaced with an imaging objective lens and the geometric profile of at least one via of the sample is detected. A second optical axis of the imaging objective lens after replacement overlaps with the first optical axis of the interference objective lens before replacement.
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公开(公告)号：US20140118721A1
公开(公告)日：2014-05-01
申请号：US13726409
申请日：2012-12-24
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor： Deh-Ming Shyu , Yi-Sha Ku
IPC: G03F9/00
CPC classification number: G03F7/70633
Abstract: According to one embodiment of a method for measuring a stacking overlay error, the method may use a differential interference contrast microscope system to measure a stacking overlay mark and focus on one overlay mark of a lower layer overlay mark and an upper layer overlay mark when measuring the stacking overlay mark. Then, the method uses an image analysis scheme to obtain an image of the stacking overlay mark from a photo-detector and obtains a first reference position of the lower layer overlay mark in a direction and a second reference position of the upper layer overlay mark in the direction from the image; and computes the stacking overlay error in the direction according to the first and the second reference positions.
Abstract translation: 根据用于测量堆叠重叠误差的方法的一个实施例，该方法可以使用微分干涉对比度显微镜系统来测量堆叠叠加标记并且在测量时聚焦在下层覆盖标记和上层覆盖标记的一个覆盖标记上 堆叠叠加标记。 然后，该方法使用图像分析方案从光电检测器获得堆叠叠加标记的图像，并且在上层叠加标记的方向和第二参考位置上获得下层重叠标记的第一参考位置 从图像的方向; 并根据第一和第二参考位置计算方向上的堆叠叠加误差。
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8.发明公开公开(公告)号：US20230152086A1
公开(公告)日：2023-05-18
申请号：US17562019
申请日：2021-12-27
Applicant: Industrial Technology Research Institute
Inventor： Hsiang-Chun Wei , Chih-Hsiang Liu , Yi-Sha Ku , Chung-Lun Kuo , Chun-Wei Lo , Chieh-Yi Lo
IPC: G01B11/22 , G01B9/02 , G01B9/02015
CPC classification number: G01B11/22 , G01B9/02049 , G01B9/0203
Abstract: A heterogeneous integration detecting method and a heterogeneous integration detecting apparatus are provided. The heterogeneous integration detecting method includes the following. Under the condition of maintaining the same relative distance between an interference objective lens and a sample, the relative posture of the interference objective lens and the sample is continuously adjusted according to the change of an image of the sample in the field of view of the interference objective lens until a first optical axis of the interference objective lens is determined to be substantially perpendicular to the surface of the sample according to the image. The interference objective lens is replaced with an imaging objective lens and the geometric profile of at least one via of the sample is detected. A second optical axis of the imaging objective lens after replacement overlaps with the first optical axis of the interference objective lens before replacement.
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公开(公告)号：US20140085640A1
公开(公告)日：2014-03-27
申请号：US13752307
申请日：2013-01-28
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor： Deh-Ming Shyu , Yi-Sha Ku
IPC: G01B11/24
Abstract: A measurement system is provided to measure a hole of a target, including a light source generation unit, a capturing unit and a processing unit. The light source generation unit generates a light source and focuses the light source on a plurality of different height planes. The capturing unit captures a plurality of images scattered from the plurality of different height planes. The processing unit obtains boundaries of the hole on the plurality of different height planes according to the plurality of images, samples image intensities of different azimuth angles on the boundaries of the hole on each of the plurality of different height planes to generate a plurality of sampling values, and develops a sidewall image of the hole according to the plurality of sampling values, the plurality of different height planes and the different azimuth angles.
Abstract translation: 提供测量系统来测量目标的孔，包括光源产生单元，捕获单元和处理单元。 光源生成单元生成光源并将光源聚焦在多个不同的高度平面上。 捕获单元捕获从多个不同高度平面散射的多个图像。 处理单元根据多个图像获得多个不同高度平面上的孔的边界，在多个不同高度平面中的每一个的孔的边界上采样不同方位角的图像强度，以产生多个采样 值，并且根据多个采样值，多个不同的高度平面和不同的方位角度来形成孔的侧壁图像。
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