FLOW CELLS
    1.
    发明申请

    公开(公告)号:US20230042267A1

    公开(公告)日:2023-02-09

    申请号:US17855325

    申请日:2022-06-30

    摘要: An example of a kit includes a flow cell, a primer fluid, and a cleaving fluid. The flow cell includes at least one surface functionalized with a polymeric hydrogel including azide functional groups or amine functional groups. The primer fluid includes a plurality of alkyne-containing primers, each alkyne-containing primer having an amino cleavable group attaching a primer sequence of the alkyne-containing primer to an alkyne-containing moiety of the alkyne-containing primer. The cleaving fluid includes a substance that is reactive with the amino cleavable group.

    POLYMERS, METHODS OF MAKING POLYMERS, AND METHODS OF COUPLING OLIGONUCLEOTIDES TO POLYMERS

    公开(公告)号:US20220289876A1

    公开(公告)日:2022-09-15

    申请号:US17686828

    申请日:2022-03-04

    申请人: ILLUMINA, INC.

    IPC分类号: C08F8/30 C08F220/56

    摘要: In some examples, a method of coupling oligonucleotides to a polymer is provided. Inactive moieties in a first region of a polymer may be selectively irradiated with light, while inactive moieties in a second region of the polymer are not irradiated, to generate first active moieties in the first region of the polymer. The first active moieties may be coupled to first oligonucleotides. The inactive moieties in the second region of the polymer may be irradiated with light to generate second active moieties in the second region of the polymer. The second active moieties may be coupled to second oligonucleotides.

    METHODS FOR MAKING FLOW CELLS
    8.
    发明公开

    公开(公告)号:US20240210829A1

    公开(公告)日:2024-06-27

    申请号:US18520093

    申请日:2023-11-27

    申请人: ILLUMINA, INC.

    摘要: In an example method, a positive photoresist is deposited over a substrate that includes depressions separated by interstitial regions. The positive photoresist is exposed to ultraviolet light at an angle that is non-perpendicular, non-parallel, and offset from a surface plane of the depressions such that a first portion of the positive photoresist in each depression remains soluble and a second portion of the positive photoresist in each depression is rendered insoluble. The soluble portions of the positive photoresist are removed, which exposes a first substrate portion in each depression. A first functionalized layer is deposited over the first substrate portion in each depression. The insoluble portions of the positive photoresist are removed, which exposes a second substrate portion in each depression. The second functionalized layer is selectively deposited over the second substrate portion in each depression.