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    SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
    2.
    发明申请
    SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN 有权
    盐，光电组合物和生产光电子图案的方法

    公开(公告)号：US20130040237A1

    公开(公告)日：2013-02-14

    申请号：US13569787

    申请日：2012-08-08

    申请人： Tatsuro MASUYAMA ,  Yuichi MUKAI

    发明人： Tatsuro MASUYAMA ,  Yuichi MUKAI

    IPC分类号： C07C69/675 ,  G03F7/20 ,  G03F7/004

    CPC分类号： C07C381/12 ,  C07C309/08 ,  C07C309/17 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/20

    摘要： A photoresist composition which comprises a salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1, R2 and R3 each independently represent a hydrogen atom or a C1-C10 monovalent aliphatic saturated hydrocarbon group, X1 and X2 each independently represent a single bond, a carbonyl group, or a C1-C10 divalent aliphatic saturated hydrocarbon group where a hydrogen atom can be replaced by a hydroxy group and where a methylene group can be replaced by an oxygen atom, a sulfonyl group or a carbonyl group, A1 represents a C1-C30 organic group, m1 represents an integer of 1 to 4, and Z+ represents an organic cation, and a resin which is hardly soluble or insoluble but soluble in an aqueous alkali solution by action of an acid.

    摘要翻译： 一种光致抗蚀剂组合物，其包含式（I）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，R1，R2和R3各自独立地表示氢原子或C1-C10一价脂族 饱和烃基，X 1和X 2各自独立地表示单键，羰基或C 1 -C 10二价脂族饱和烃基，其中氢原子可以被羟基代替，并且其中亚甲基可被氧代替 原子，磺酰基或羰基，A1表示C1-C30有机基团，m1表示1〜4的整数，Z +表示有机阳离子，难溶于或不溶而溶于碱水溶液的树脂 溶液通过酸的作用。

    PHOTORESIST COMPOSITION
    4.
    发明申请
    PHOTORESIST COMPOSITION 有权
    光电组合物

    公开(公告)号：US20120264055A1

    公开(公告)日：2012-10-18

    申请号：US13443155

    申请日：2012-04-10

    申请人： Koji ICHIKAWA ,  Hiromu SAKAMOTO ,  Yuichi MUKAI

    发明人： Koji ICHIKAWA ,  Hiromu SAKAMOTO ,  Yuichi MUKAI

    IPC分类号： G03F7/027 ,  G03F7/20

    CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041

    摘要： The present invention provides a photoresist composition comprising a salt represented by the formula (I): wherein R1 and R2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group, etc., s1 represents 1 or 2, and t1 represents 0 or 1, with proviso that sum of s1 and t1 is 1 or 2, R3 represents a C1-C12 saturated hydrocarbon group, etc., u1 represents an integer of 0 to 8, and (z1)+ represents an organic cation,a salt represented by the formula (II-0): wherein R4 represents a C1-C24 hydrocarbon group etc., X2 represents a C1-C6 alkanediyl group etc., and (Z2)+ represents an organic cation, anda resin being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

    摘要翻译： 本发明提供了包含式（I）表示的盐的光致抗蚀剂组合物：其中R1和R2各自独立地表示氟原子或C1-C6全氟烷基，X1表示C1-C17二价饱和烃基等， s1表示1或2，t1表示0或1，条件是s1和t1之和为1或2，R3表示C1-C12饱和烃基等，u1表示0〜8的整数，（ z1）+表示有机阳离子，式（II-0）表示的盐：其中，R4表示C1-C24烃基等，X2表示C1-C6烷二基等，（Z2）+表示 有机阳离子和在碱性水溶液中不溶或难溶的树脂，但通过酸的作用变得可溶于碱性水溶液。

    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    5.
    发明申请
    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
    耐蚀组合物及其制造方法

    公开(公告)号：US20130022922A1

    公开(公告)日：2013-01-24

    申请号：US13552273

    申请日：2012-07-18

    申请人： Koji ICHIKAWA ,  Yuichi MUKAI ,  Satoshi YAMAMOTO

    发明人： Koji ICHIKAWA ,  Yuichi MUKAI ,  Satoshi YAMAMOTO

    IPC分类号： G03F7/027 ,  G03F7/20

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, R23, R24, R25, X21 and Z1+ are defined in the specification.

    摘要翻译： 一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元 由式（I）表示的酸衍生物和由式（II）表示的酸产生剂，其中R1，A1，A13，A14，X12，R23，R24，R25，X21和Z1 +在说明书中定义。

    PHOTORESIST COMPOSITION
    7.
    发明申请
    PHOTORESIST COMPOSITION 有权
    光电组合物

    公开(公告)号：US20110171575A1

    公开(公告)日：2011-07-14

    申请号：US12983594

    申请日：2011-01-03

    申请人： Tatsuro MASUYAMA ,  Yuichi MUKAI ,  Masahiko SHIMADA

    发明人： Tatsuro MASUYAMA ,  Yuichi MUKAI ,  Masahiko SHIMADA

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041

    摘要： The present invention provides a photoresist composition comprising: at least one selected from the group consisting of a monomer represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, W1 represents a C3-C20 divalent saturated cyclic hydrocarbon group, A1 represents a single bond or *—O—CO—W1— wherein * represents a binding position to W1═N— and W1 represents a C1-C10 divalent saturated hydrocarbon group, a polymer consisting of a structural unit derived from the monomer represented by the formula (I) and a polymer consisting of a structural unit derived from the monomer represented by the formula (I) and a structural unit derived from a monomer represented by the formula (II): wherein R3 represents a hydrogen atom or a methyl group, A2 represents a single bond or *—O—CO—(CH2)n— wherein * represents a binding position to R4-, n represents an integer of 1 to 7 and R4 represents a C3-C20 saturated cyclic hydrocarbon group, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.

    摘要翻译： 本发明提供一种光致抗蚀剂组合物，其包括：选自由式（I）表示的单体中的至少一种：其中R1表示氢原子或甲基，W1表示C3-C20二价饱和环状烃基 ，A1表示单键或* -O-CO-W1-，其中*表示与W1 = N-的结合位置，W1表示C1-C10二价饱和烃基，由衍生自所表示的单体的结构单元组成的聚合物 由式（I）表示的结构单元和由式（I）表示的单体衍生的结构单元和由式（II）表示的单体衍生的结构单元构成的聚合物：其中，R3表示氢原子或甲基 基团，A2表示单键或* -O-CO-（CH2）n-，其中*表示与R4-的结合位置，n表示1〜7的整数，R4表示C3-C20饱和环状烃基， 树脂啊 酸不稳定的基团，并且在碱性水溶液中不溶或难溶，但是通过酸和酸产生剂可溶于碱水溶液。

    PHOTORESIST COMPOSITION
    10.
    发明申请
    PHOTORESIST COMPOSITION 有权
    光电组合物

    公开(公告)号：US20120251945A1

    公开(公告)日：2012-10-04

    申请号：US13428555

    申请日：2012-03-23

    申请人： Koji ICHIKAWA ,  Hiromu SAKAMOTO ,  Yuichi MUKAI

    发明人： Koji ICHIKAWA ,  Hiromu SAKAMOTO ,  Yuichi MUKAI

    IPC分类号： G03F7/004 ,  C07D411/12 ,  C07D305/06 ,  G03F7/027 ,  G03F7/20

    CPC分类号： C07D411/12 ,  C07D305/06 ,  C07D307/93 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

    摘要： The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator and a compound represented by the formula (I): wherein R1, X1, R2, u1, s1, t1 are each defined in the specification, with the proviso that sum of s1 and t1 is 1 or 2.

    摘要翻译： 本发明提供一种光致抗蚀剂组合物，其含有：含有来自具有酸不稳定基团的化合物的结构单元的树脂，其在碱性水溶液中不溶或难溶于碱性水溶液，但通过 酸; 酸产生剂和由式（I）表示的化合物：其中R1，X1，R2，u1，s1，t1各自在说明书中定义，条件是s1和t1的和为1或2。