公开(公告)号：US20230238212A1

公开(公告)日：2023-07-27

申请号：US18010939

申请日：2021-09-24

Applicant: Hitachi High-Tech Corporation

Inventor： Hiroyasu SHICHI ,  Nobuhiro OKAI ,  Naomasa SUZUKI ,  Masanobu IEDA

IPC: H01J37/26 ,  H01J37/285 ,  H01J37/244

CPC classification number: H01J37/268 ,  H01J37/285 ,  H01J37/244

Abstract: Provided is an electron microscope for generating an observation image of a sample by using an electron beam in order to obtain a scanning electron microscope image by low angle backscattered electrons, which are backscattered electrons emitted at a low angle with respect to a sample surface, even for an electron microscope including an objective lens that leaks a magnetic field to a sample. The electron microscope includes: an electron source configured to irradiate the sample with the electron beam; an objective lens configured to focus the electron beam by a leakage magnetic field which is a magnetic field leaked toward the sample; a detector configured to detect a third electron which is an electron emitted when a low angle backscattered electron is caused to collide with the sample by the leakage magnetic field, the low angle backscattered electron being a backscattered electron emitted at a low angle with respect to a surface of the sample; and a compensation electrode or a compensation magnetic pole provided between the sample and the detector and configured to control a trajectory of the third electron.

公开(公告)号：US20210249221A1

公开(公告)日：2021-08-12

申请号：US17049353

申请日：2018-04-26

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Nobuhiro OKAI ,  Daisuke BIZEN ,  Tomoyasu SHOJO ,  Naomasa SUZUKI ,  Muneyuki FUKUDA

IPC: H01J37/244 ,  H01J37/147 ,  H01J37/12 ,  H01J37/28

Abstract: To improve detection efficiency of secondary particles without increasing a size of a charged particle beam apparatus, a charged particle beam apparatus according to the invention includes: a charged particle beam source configured to irradiate a sample with a primary particle beam; a scanning deflector configured to scan and deflect the primary particle beam to a desired position of the sample; and a detector configured to detect secondary particles emitted from the desired position. The charged particle beam apparatus further includes: a focusing lens electrode arranged coaxially with the primary particle beam and configured to generate a focusing electric field that is an electric field that focuses a trajectory of the secondary particles; and a mesh electrode configured to reduce leakage of the focusing electric field on a trajectory of the primary particle beam.

公开(公告)号：US20250003898A1

公开(公告)日：2025-01-02

申请号：US18708615

申请日：2022-01-26

Applicant: Hitachi High-Tech Corporation

Inventor： Wei SUN ,  Naomasa SUZUKI ,  Nobuhiro OKAI ,  Keiichiro HITOMI

IPC: G01N23/2251 ,  G01B15/02 ,  G06T7/00 ,  G06T7/60

Abstract: A foreign object height measurement method including: storing in advance dependence data indicating a dependence of a calculated value of the height of the foreign object calculated from a foreign object image extracted from the charged particle image on an orientation of the foreign object; extracting a measurement target foreign object image, being an image of a measurement target foreign object, from the charged particle image; and outputting a measurement value of a height of the measurement target foreign object along with a warning regarding reliability or measuring the height of the measurement target foreign object from a charged particle image acquired by rotating the sample stage and changing an orientation of the measurement target foreign object detected from the measurement target foreign object image when it is determined that the orientation of the measurement target foreign object does not satisfy an acceptable error range based on the dependence data.