公开(公告)号：US08246900B2

公开(公告)日：2012-08-21

申请号：US12440034

申请日：2007-08-31

Applicant: Shigeru Kasai ,  Hiroyuki Miyashita ,  Masatake Yoneda ,  Tomohiro Suzuki ,  Sumi Tanaka ,  Masamichi Nomura ,  Miwa Shimizu

Inventor： Shigeru Kasai ,  Hiroyuki Miyashita ,  Masatake Yoneda ,  Tomohiro Suzuki ,  Sumi Tanaka ,  Masamichi Nomura ,  Miwa Shimizu

IPC: H01L21/26 ,  C21D1/74

CPC classification number: H01L21/67115 ,  H01L21/67109 ,  H01L31/1864 ,  Y02E10/50 ,  Y02P70/521

Abstract: Provided is an annealing apparatus, which is free from a problem of reduced light energy efficiency resulted by the reduction of light emission amount due to a heat generation and capable of maintaining stable performance. The apparatus includes: a processing chamber 1 for accommodating a wafer W; heating sources 17a and 17b including LEDs 33 and facing the surface of the wafer W to irradiate light on the wafer W; light-transmitting members 18a and 18b arranged in alignment with the heating sources 17a and 17b to transmit the light emitted from the LEDs 33; cooling members 4a and 4b supporting the light-transmitting members 18a and 18b at opposite side to the processing chamber 1 to make direct contact with the heating sources 17a and 17b and made of a material of high thermal conductivity; and a cooling mechanism for cooling the cooling members 4a and 4b with a coolant.

Abstract translation: 提供一种退火装置，其不会由于发热而导致的发光量的降低而导致光能效率降低的问题，并且能够保持稳定的性能。 该装置包括：用于容纳晶片W的处理室1; 加热源17a和17b包括LED33并面向晶片W的表面以将光照射在晶片W上; 与发热源17a和17b对准布置的透光部件18a和18b，以透射从LED33发出的光; 在与处理室1相反的一侧支撑透光部件18a和18b的冷却部件4a和4b与加热源17a和17b直接接触并由导热性高的材料制成; 以及用冷却剂冷却冷却部件4a，4b的冷却机构。

公开(公告)号：US20110033175A1

公开(公告)日：2011-02-10

申请号：US12864792

申请日：2009-01-19

Applicant: Shigeru Kasai ,  Hiroyuki Miyashita ,  Tomohiro Suzuki ,  Masatake Yoneda ,  Kazuhiro Ooya

Inventor： Shigeru Kasai ,  Hiroyuki Miyashita ,  Tomohiro Suzuki ,  Masatake Yoneda ,  Kazuhiro Ooya

IPC: F27D11/12

CPC classification number: H01L21/67109 ,  H01L21/268 ,  H01L21/324 ,  H01L21/67115

Abstract: An annealing apparatus includes heating sources 17a and 17b provided to face a wafer W, the heating sources 17a and 17b having LEDs 33 emitting lights to the wafer; light-transmitting members 18a and 18b for transmitting the lights emitted from the LEDs 33; and cooling members 4a and 4b made of aluminum and provided to directly contact with the heating sources 17a and 17b, respectively. The heating sources 17a and 17b include a plurality of LED arrays having supporters 32 made of AlN, each having one surface on which the LEDs 33 are adhered by using a silver paste 56; and other surface on which thermal diffusion members 50 made of copper are adhered by using a solder 57. The LED arrays 34 are fixed to the cooling member 4a(4b) by using screws via a silicon grease.

Abstract translation: 退火装置包括设置成面向晶片W的加热源17a和17b，具有向该晶片发光的LED 33的加热源17a和17b; 用于透射从LED 33发射的光的透光构件18a和18b; 以及由铝制成并分别与加热源17a和17b直接接触的冷却构件4a和4b。 加热源17a和17b包括多个LED阵列，其具有由AlN制成的支撑体32，每个具有一个表面，其上通过使用银膏56粘附LED 33; 和由铜制成的热扩散构件50的其他表面通过使用焊料57粘附在其上。LED阵列34通过使用经由硅油脂的螺钉固定到冷却构件4a（4b）。

公开(公告)号：US07817077B2

公开(公告)日：2010-10-19

申请号：US12404835

申请日：2009-03-16

Applicant: Hiroyuki Miyashita

Inventor： Hiroyuki Miyashita

IPC: H03M1/38

CPC classification number: H03F3/45183 ,  H03F2203/45702 ,  H03F2203/45726 ,  H03K3/356139

Abstract: In some examples, a differential comparator includes a differential amplifier configured to output differential output signals, a first switch portion configured to input the differential output signals from the differential amplifier and output the differential output signals from output terminals while alternatively changing over the output terminals, a latch portion configured to update and latch the differential output signals from the output terminals of the first switch portion, and a second switch portion configured to input output signals from the latch portion and output the latched output signals. The first switch portion and the second switch portion are changed over complementarily so that the differential output signals from the differential amplifier are always outputted from the same first and second output terminals of the second switch portion respectively.

Abstract translation: 在一些示例中，差分比较器包括：差分放大器，被配置为输出差分输出信号;第一开关部分，被配置为从差分放大器输入差分输出信号，并且在输出端子交替地切换时输出来自输出端子的差分输出信号， 闩锁部分，被配置为更新并锁存来自第一开关部分的输出端的差分输出信号;以及第二开关部分，被配置为输入来自锁存部分的输出信号并输出​​锁存的输出信号。 第一开关部分和第二开关部分互补地改变，使得来自差分放大器的差分输出信号总是分别从第二开关部分的相同的第一和第二输出端子输出。

公开(公告)号：US5614336A

公开(公告)日：1997-03-25

申请号：US337136

申请日：1994-11-10

Applicant: Koichi Mikami ,  Hiroyuki Miyashita ,  Yoichi Takahashi ,  Hiroshi Fujita ,  Masa-aki Kurihara

Inventor： Koichi Mikami ,  Hiroyuki Miyashita ,  Yoichi Takahashi ,  Hiroshi Fujita ,  Masa-aki Kurihara

IPC: G03F1/00 ,  G03F9/00

CPC classification number: G03F1/72 ,  G03F1/26 ,  G03F1/29 ,  G03F1/30

Abstract: The present invention relates particularly to a process for producing phase shift layer-containing photomasks, which can produce phase shift photomasks through a reduced or limited number of steps to reduce or limit the incidence of phase shifter pattern deficiencies or other defects and at lower costs as well.For instance, a photomask blank of the structure that a substrate is provided thereon with an electrically conductive layer and a light-shielding thin film in this order is used to coat a starting material for spin-on-glass uniformly on a light-shielding pattern formed thereon. A pattern is directly drawn on the coated spin-on-glass layer with energy beams emanating from electron beam exposure hardware, etc., and the substrate is developed with a solvent after pattern drawing with energy beams to wash off an excessive spin-on-glass portion other than the spin-on-glass layer irradiated with the ionizing radiations. Finally, the post-development substrate is baked to form a phase shifter pattern.

Abstract translation: 本发明特别涉及一种用于生产含相移层的光掩模的方法，其可以通过减少或限制数量的步骤产生相移光掩模，以减少或限制移相器图案缺陷或其它缺陷的发生，并以较低的成本 好。 例如，使用具有依次设置有导电层和遮光薄膜的基板的结构的光掩模坯料，以均匀地在遮光图案上涂布旋涂玻璃原料 形成在其上。 通过电子束曝光硬件等发出的能量束，直接在涂覆的旋涂玻璃层上绘制图案，在用能量束进行图案绘制之后，用溶剂对基板进行显影，以洗涤过量的自旋 - 除了用电离辐射照射的旋涂玻璃层以外的玻璃部分。 最后，烘烤后显影衬底以形成移相器图案。

公开(公告)号：US5880437A

公开(公告)日：1999-03-09

申请号：US917873

申请日：1997-08-27

Applicant: Shigeru Kasai ,  Hiroyuki Miyashita

Inventor： Shigeru Kasai ,  Hiroyuki Miyashita

IPC: H01L21/205 ,  G05B13/02 ,  G05D23/19 ,  H01L21/31 ,  H05B1/02

CPC classification number: G05B13/021 ,  G05D23/1917

Abstract: An automatic control system controls a controlled variable serving as an object 2 to be controlled so that the object 2 approaches a predetermined target value, by means of an optimum regulator 4. The automatic control system include: a gain setting section 48 for setting a gain; a comparing section 48 for comparing the target value with the controlled variable serving as the object; and a weight control section 50 for weighting the gain set by the gain setting section so as to increase the weight from 0 to 1 within a predetermined period of time and for deriving a corrected manipulated variable in response to the time when a difference between the target value and the controlled variable comes within a range of a predetermined percentage of the target value, so that the corrected manipulated variable is added to the manipulated variable derived by the optimum regulator. Thus, the gain is controlled so as to gradually increase only within a restricted range, so that it is possible to quickly and accurately control an object.

Abstract translation: 自动控制系统通过最佳调节器4控制作为被控制对象2的受控变量，使物体2接近预定的目标值。自动控制系统包括：增益设定部分48，用于设定增益 ; 比较部分48，用于将目标值与用作对象的受控变量进行比较; 以及权重控制部分50，用于对由增益设置部分设置的增益进行加权，以在预定时间段内将权重从0增加到1，并且响应于目标之间的差异导出校正的操纵变量 值和受控变量在目标值的预定百分比的范围内，使得校正的操作变量被添加到由最佳调节器导出的操纵变量。 因此，增益被控制为仅在限制范围内逐渐增加，从而可以快速且准确地控制物体。

公开(公告)号：US5702847A

公开(公告)日：1997-12-30

申请号：US453079

申请日：1995-05-30

Applicant: Norihiro Tarumoto ,  Hiroyuki Miyashita ,  Yukio Iimura ,  Koichi Mikami

Inventor： Norihiro Tarumoto ,  Hiroyuki Miyashita ,  Yukio Iimura ,  Koichi Mikami

IPC: G03F1/00 ,  G03F9/00

CPC classification number: G03F1/26 ,  G03F1/29 ,  G03F1/30 ,  G03F1/32

Abstract: The invention relates to a phase shift photomask in which the peripheral region portion of a phase shift layer is removed by a relatively simple procedure and which has no or little defect and is inexpensive, a blank therefor, and a process for fabricating them. The process includes the steps of forming phase shift layer 23 all over the surface of one side of transparent substrate 21, and immersing only the peripheral region of substrate 21 in etching solution 25 to etch away the peripheral region of phase shift layer 23, whereby phase shift layer 27 is confined within an area smaller than that of substrate 21.

Abstract translation: 本发明涉及一种相移光掩模，其中通过相对简单的程序除去相移层的外围区域部分，并且没有或很少缺陷，并且便宜，其空白和其制造方法。 该方法包括在透明基板21的整个表面的整个表面上形成相移层23，并且仅将基板21的周边区域浸入蚀刻溶液25中以蚀刻掉相移层23的周边区域，由此相位 位移层27被限制在比衬底21的面积小的区域内。

公开(公告)号：US5604060A

公开(公告)日：1997-02-18

申请号：US357350

申请日：1994-12-16

Applicant: Hiroyuki Miyashita ,  Sachiko Ishikita ,  Koichi Mikami

Inventor： Hiroyuki Miyashita ,  Sachiko Ishikita ,  Koichi Mikami

IPC: G03F1/32 ,  G03F9/00

CPC classification number: G03F1/32

Abstract: The invention provides a halftone phase shift photomask that is of much more simplified structure and so can be fabricated much more easily, which comprises a transparent substrate 10 and a single halftone light-blocking and phase shift layer 11 that is formed on the surface thereof according to a predetermined pattern and is made up of a material of homogeneous composition, characterized in that:said single halftone light-blocking and phase shift layer has a film thickness d that is virtually equal to a value defined byd=.lambda./{2(n-1)}where .lambda. is the wavelength at which the photomask is used, and n is the index of refraction of the single layer, or that is an odd-numbered multiple of said value, and has a transmittance lying substantially in the range of 5 to 30%. The layer 11 may be made up of any of CrO.sub.x, CrN.sub.x, CrO.sub.x N.sub.y and CrO.sub.x N.sub.y C.sub.z.

Abstract translation: 本发明提供了一种半色调相移光掩模，其结构非常简化，因此可以更容易地制造，其包括透明基板10和在其表面上形成的单个半色调光阻挡和相移层11，根据 由均匀组成的材料构成，其特征在于：所述单个半色调遮光和相移层的膜厚d实质上等于由d =λ/ {2（ n-1）}其中λ是使用光掩模的波长，n是单层的折射率，或者是所述值的奇数倍，并且具有基本上在该范围内的透射率 为5〜30％。 层11可以由CrO x，CrN x，CrO x N y和CrO x N y C z中的任一种构成。

公开(公告)号：US5380608A

公开(公告)日：1995-01-10

申请号：US974919

申请日：1992-11-12

Applicant: Hiroyuki Miyashita ,  Masahiro Takahashi ,  Hiroshi Mohri

Inventor： Hiroyuki Miyashita ,  Masahiro Takahashi ,  Hiroshi Mohri

IPC: G03F1/26 ,  G03F1/29 ,  G03F1/30 ,  G03F9/00

CPC classification number: G03F1/29 ,  G03F1/30 ,  G03F1/26

Abstract: The invention is directed to a phase shift photomask for which a film made of a material capable of providing an etching stopper layer that excels in etching selectivity and can interrupt etching surely and automatically, and provides a phase shift photomask at least comprising a substrate 30 and a phase shifter pattern made of a material composed mainly of silicon oxide that is provided on the surface of the substrate directly or with an opaque layer 37 interposed therebetween, said phase shift photomask being characterized in that the surface 30 is provided on the surface with an etching stopper layer 30 that comprises a mixture of Al.sub.2 O.sub.3 with MgO, ZrO.sub.2, Ta.sub.2 O.sub.5 or HfO, or CrO.sub.x, CrN.sub.y, CrC.sub.z, CrO.sub.x N.sub.y, CrO.sub.x C.sub.z or CrO.sub.x N.sub.y C.sub.z, or MgF.sub.2-2x O.sub.y, CaF.sub.2-2x O.sub.y, LiF.sub.2-2x O.sub.y, BaF.sub.2-2x O.sub.y, La.sub.2 F.sub.6-2x O.sub.y or Ce.sub.2 F.sub.6-2x O.sub.y, whereby the etching stopper layer is allowed to etch a transparent film for a phase shifter surely and accurately, when making a phase shifter pattern by etching.

Abstract translation: 本发明涉及一种相移光掩模，其中由能够提供蚀刻选择性优异并且可以中断和自动中断蚀刻的蚀刻阻挡层的材料制成的膜，并且提供至少包括基板30的相移光掩模和 由主要由氧化硅构成的材料制成的移相器图案，其直接设置在基板的表面上，或者设置在其间的不透明层37，所述相移光掩模的特征在于，表面30设置在表面上 蚀刻阻挡层30，其包含Al 2 O 3与MgO，ZrO 2，Ta 2 O 5或HfO，或CrO x，CrN y，CrC z，CrO x N y，CrO x C z或CrO x N y C z或MgF 2 -2 x O y，CaF 2 -2 x O y，LiF 2 -2 x O y，BaF 2 -2 x O y，La 2 F 6 -2xOy或Ce2F6-2x Oy，从而当通过蚀刻制造移相器图案时，可以确切地和准确地蚀刻蚀刻停止层用于移相器的透明膜。

公开(公告)号：US4592046A

公开(公告)日：1986-05-27

申请号：US595668

申请日：1984-04-02

Applicant: Yoshihiro Kawata ,  Tsunetaka Sakata ,  Teruo Matsufuji ,  Tetsuro Inomata ,  Hiroyuki Miyashita

Inventor： Yoshihiro Kawata ,  Tsunetaka Sakata ,  Teruo Matsufuji ,  Tetsuro Inomata ,  Hiroyuki Miyashita

IPC: H04Q11/04 ,  H04J3/12 ,  H04M1/00 ,  H04M3/00

CPC classification number: H04Q11/04

Abstract: A click tone removing system for a time division switching system which performs switching of speech channels by a highway switch inserted in a highway. When a hook information detector and a dial information detector detect hook information and a dial information, respectively, delivery of a PCM speech sending signal to the highway is prevented by a blocking function for a fixed period of time, so that the highway is controlled to switch the speech channel, thereby removing a click tone generated by dialing. A subscriber's circuit of an exchange, which changes over a speech sending highway and a speech receiving highway by means of a highway switch, is characterized by the provision of an A/D converter for digitizing a speech sending signal to a digitized speech sending signal sent out to the speech sending highway, a D/A converter for converting a digitized speech receiving signal applied from the speech receiving highway into an analog signal, a gate for gating the input signal to the D/A converter, and a control circuit for controlling the gate, so that during real time processing the speech receiving signal highway is interrupted by opening and closing the gate without controling the higway switch.

Abstract translation: 一种用于时分切换系统的点击音消除系统，其通过插入高速公路的高速公路开关来执行语音信道的切换。 当挂钩信息检测器和拨号信息检测器检测到挂钩信息和拨号信息时，分别通过阻塞功能在一段固定的时间段内将PCM语音发送信号发送到高速公路，使得公路被控制到 切换语音通道，从而消除通过拨号产生的点击音。 通过公路交换机在语音发送高速公路和语音接收公路上改变的交换机的用户电路的特征在于，提供用于将语音发送信号数字化到发送的数字化语音发送信号的A / D转换器 用于将从语音接收公路应用的数字化语音接收信号转换成模拟信号的D / A转换器，用于将输入信号选通到D / A转换器的门，以及用于控制的控制电路 门，使得在实时处理期间，通过打开和关闭门而中断语音接收信号高速公路，而不控制高速开关。

公开(公告)号：US20070292598A1

公开(公告)日：2007-12-20

申请号：US11667945

申请日：2006-04-04

Applicant: Kunihiro Tada ,  Hiroyuki Miyashita ,  Isao Gunji

Inventor： Kunihiro Tada ,  Hiroyuki Miyashita ,  Isao Gunji

IPC: C23C16/46 ,  H01L21/02 ,  H01L21/285

CPC classification number: C23C16/46 ,  C23C16/52 ,  H01L21/67248 ,  H01L22/10

Abstract: Disclosed is a substrate processing method wherein the infrared absorptance or infrared transmittance of a substrate to be processed is measured in advance, and the substrate is processed according to the measured value while independently controlling temperatures at least in a first region located in the central part of the substrate and in a second region around the first region using temperature control means which are respectively provided for the first region and the second region and can be controlled independently from each other.

Abstract translation: 公开了一种基板处理方法，其中预先测量待处理的基板的红外吸收率或红外线透射率，并且根据测量值对基板进行处理，同时至少在位于中心部分的第一区域中独立地控制温度 基板和在第一区域周围的第二区域中，使用分别设置用于第一区域和第二区域并且可以彼此独立地控制的温度控制装置。