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公开(公告)号：US08294889B2
公开(公告)日：2012-10-23
申请号：US12776003
申请日：2010-05-07
IPC分类号： G01N21/01
CPC分类号： G01N21/956 , B82Y20/00 , G01N2021/4707 , G01N2021/95615
摘要： A method for inspecting a nano-imprint template, includes irradiating light onto a template for nano-imprinting from a back surface side of the template, the template having a front surface where a pattern is formed, detecting near-field light which is generated near the front surface of the template by the irradiation of the light, and performing an inspection of the template on the basis of the detected near-field light.
摘要翻译： 一种用于检查纳米压印模板的方法，包括将光从模板的背面侧照射到用于纳米压印的模板上，模板具有形成图案的正面，检测近场产生的近场光 通过照射光的模板的前表面，并且基于检测到的近场光执行模板的检查。
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公开(公告)号：US08419950B2
公开(公告)日：2013-04-16
申请号：US12884617
申请日：2010-09-17
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F1/50 , G03F1/54 , G03F7/2014
摘要： According to one embodiment, a pattern forming method is disclosed. The method includes contacting a template with light curable resin on a substrate. The template comprises a concave-convex pattern including concave portions and convex portions, and a metal layer provided on a convex portion of the concave-convex pattern. The concave-convex pattern is to be contacted with the light curable resin. The pattern forming method further includes irradiating the light curable resin with light of a predetermined wavelength under a condition ε1=−2ε2. Where ε1 is a complex relative permittivity of the metal layer corresponding to the predetermined wavelength, ε2 is a complex relative permittivity of the light curable resin corresponding to the predetermined wavelength.
摘要翻译： 根据一个实施例，公开了一种图案形成方法。 该方法包括使模板与基材上的光固化树脂接触。 模板包括凹凸图案，其包括凹部和凸部，以及设置在凹凸图案的凸部上的金属层。 凹凸图案与光固化树脂接触。 图案形成方法还包括在条件1 = -2＆amp; 2的条件下用光可固化树脂照射预定波长的光。 其中，1是对应于预定波长的金属层的复相对介电常数，2是对应于预定波长的光固化树脂的复相对介电常数。
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公开(公告)号：US20100308513A1
公开(公告)日：2010-12-09
申请号：US12796343
申请日：2010-06-08
IPC分类号： B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： According to one embodiment, a template for imprint lithography includes a transparent substrate having a pattern with a recess portion and a protruding portion, and a light-shielding portion formed on a bottom surface of the recess portion and on a top surface of the protruding portion. A side wall of the protruding portion is inclined.
摘要翻译： 根据一个实施例，用于压印光刻的模板包括具有凹陷部分和突出部分的图案的透明基板，以及形成在凹部的底表面上并且在突出部分的顶表面上的遮光部分 。 突出部的侧壁倾斜。
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公开(公告)号：US08669522B2
公开(公告)日：2014-03-11
申请号：US13416282
申请日：2012-03-09
IPC分类号： H01J37/28
CPC分类号： G03F1/84 , G01N23/225 , G01N2021/95676
摘要： According to one embodiment, a mask inspection apparatus includes a decompression chamber, a holder, a light irradiation unit, a detection unit, an electrode, and a control unit. The holder is provided in the decompression chamber and holds a mask. The light irradiation unit irradiates a major surface of the mask held by the holder with a light. The detection unit is provided in the decompression chamber to detect electrons generated when the major surface of the mask is irradiated with the light. The electrode is provided between the holder and the detection unit and guides the electrons in a direction from the holder toward the detection unit. The control unit compares a detection result of the electrons detected by the detection unit with a reference value.
摘要翻译： 根据一个实施例，掩模检查装置包括减压室，保持器，光照射单元，检测单元，电极和控制单元。 保持器设置在减压室中并保持面罩。 光照射单元用光照射由保持器保持的面罩的主表面。 检测单元设置在减压室中以检测当用光照射掩模的主表面时产生的电子。 电极设置在保持器和检测单元之间并且引导电子沿着保持器朝向检测单元的方向。 控制单元将由检测单元检测的电子的检测结果与参考值进行比较。
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公开(公告)号：US5932359A
公开(公告)日：1999-08-03
申请号：US687520
申请日：1996-11-04
CPC分类号： C25D5/48 , C23C28/3225 , C23C28/345 , C25D3/565 , Y10T428/12535 , Y10T428/12611 , Y10T428/12792 , Y10T428/12799 , Y10T428/12951
摘要： A surface-treated steel sheet for fuel tanks comprising a Zn--X alloy plating layer + a chromate film, in which the Zn--X alloy plating layer has an X content for the plating metal as a whole of Ni: 9-18 wt %, Co: 0.02-3 wt %, Mn: 25-45 wt %, or Cr: 8-20 wt %, the amount of deposition of the plating layer is 5-40 g/m.sup.2 and the amount of the chromate film is 10-200 mg/m.sup.2 on a metallic Cr basis, the Zn--X alloy plating layer corresponding to at least the inner surface of a tank has: (1) cracks in the surface layer, with the density of the cracks being 1000-150000 in terms of the number of plated regions surrounded by cracks in a visual field of 1 mm.times.1 mm, and the maximum width of the cracks is not more than 0.5 .mu.m, or (2) an X/(X+Zn) atomic percentage (X.sub.2) determined by surface analysis based on ESCA with X.sub.1 .noteq.X.sub.2 (wherein X.sub.1 =average value of the X content of the plating metal as a whole), and with X.sub.2 being Ni: 5-25 at %, Co: 0.009-10 at %, Mn: 15-65 at % or Cr: 5-25 at %.
摘要翻译： PCT No.PCT / JP95 / 02516 Sec。 371日期：1996年11月4日 102（e）日期1996年11月4日PCT提交1995年12月8日PCT公布。 公开号WO96 / 17979 日期1996年6月13日，一种用于燃料箱的表面处理钢板，包括Zn-X合金镀层+铬酸盐膜，其中Zn-X合金镀层的电镀金属的X含量为Ni： 9-18重量％，Co：0.02-3重量％，Mn：25-45重量％或Cr：8-20重量％，镀层的沉积量为5-40克/平方米， 铬酸盐膜在金属Cr基上为10-200mg / m 2，至少对应于罐内表面的Zn-X合金镀层具有：（1）表层裂纹，裂纹密度 以1mm×1mm的视野围绕的电镀区域的数量为1000-150000，裂纹的最大宽度不大于0.5μm，或者（2）X /（X + Zn ）原子百分比（X2）通过基于ESCA的X1 NOTEQUAL X2（其中X1 =整个电镀金属的X含量的平均值），X2为Ni：5-25at％，Co： 0.009-10at％，Mn：15-65at％或Cr：5-2 5 at％。
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公开(公告)号：US20130080991A1
公开(公告)日：2013-03-28
申请号：US13428276
申请日：2012-03-23
IPC分类号： G06F11/22
CPC分类号： G03F7/70383
摘要： According to one embodiment, a pattern forming apparatus includes a control unit. The control unit is configured to execute a test patterning to same patterns using probes under same conditions, obtain a position error and a size error by comparing a position and a size of the same patterns with a target value, select a normal probe in which the position error and the size error is in an allowable range among the probes, execute a correction process which adjusts sub patterning areas which are patterned by the normal probe among a main patterning area of a substrate, and execute a patterning of the sub patterning areas using the normal probe.
摘要翻译： 根据一个实施例，图案形成装置包括控制单元。 控制单元被配置为在相同条件下使用探针对相同图案进行测试图案化，通过将相同图案的位置和尺寸与目标值进行比较来获得位置误差和尺寸误差，选择其中 位置误差和尺寸误差在探针之间的允许范围内，执行校正处理，该校正处理调整在基板的主图案化区域中通过普通探针图案化的子图案形成区域，并且使用 正常探针。
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7.发明申请NEAR-FIELD EXPOSURE MASK, RESIST PATTERN FORMING METHOD, DEVICE MANUFACTURING METHOD, NEAR-FIELD EXPOSURE METHOD, PATTERN FORMING METHOD, NEAR-FIELD OPTICAL LITHOGRAPHY MEMBER, AND NEAR-FIELD NANOIMPRINT METHOD 有权近场曝光掩模，电阻图案形成方法，器件制造方法，近场曝光方法，图案形成方法，近场光学成像方法和近场纳米方法公开(公告)号：US20120228804A1
公开(公告)日：2012-09-13
申请号：US13413163
申请日：2012-03-06
申请人： Naomi Shida , Kenji Todori , Shigehiko Mori , Ko Yamada , Masakazu Yamagiwa , Reiko Yoshimura , Yasuyuki Hotta , Tsukasa Tada , Hiroyuki Kashiwagi , Ikuo Yoneda
发明人： Naomi Shida , Kenji Todori , Shigehiko Mori , Ko Yamada , Masakazu Yamagiwa , Reiko Yoshimura , Yasuyuki Hotta , Tsukasa Tada , Hiroyuki Kashiwagi , Ikuo Yoneda
CPC分类号： B29C59/16 , B29D11/0074 , B29L2011/00 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F1/50 , G03F7/0002 , G03F7/70325
摘要： A near-field exposure mask according to an embodiment includes: a silicon substrate; and a near-field light generating unit that is formed on the silicon substrate, the near-field light generating unit being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials.
摘要翻译： 根据实施例的近场曝光掩模包括：硅衬底; 以及形成在所述硅基板上的近场光产生单元，所述近场光产生单元是包含选自Au，Al，Ag，Cu，Cr，Sb，W中的至少一种元素的层 ，Ni，In，Ge，Sn，Pb，Zn，Pd和C，或由其中一些材料制成的层形成的膜叠层。
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8.发明授权Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method 有权近场曝光掩模，抗蚀剂图案形成方法，器件制造方法，近场曝光方法，图案形成方法，近场光刻部件和近场纳米压印法公开(公告)号：US09029047B2
公开(公告)日：2015-05-12
申请号：US13413163
申请日：2012-03-06
申请人： Naomi Shida , Kenji Todori , Shigehiko Mori , Ko Yamada , Masakazu Yamagiwa , Reiko Yoshimura , Yasuyuki Hotta , Tsukasa Tada , Hiroyuki Kashiwagi , Ikuo Yoneda
发明人： Naomi Shida , Kenji Todori , Shigehiko Mori , Ko Yamada , Masakazu Yamagiwa , Reiko Yoshimura , Yasuyuki Hotta , Tsukasa Tada , Hiroyuki Kashiwagi , Ikuo Yoneda
CPC分类号： B29C59/16 , B29D11/0074 , B29L2011/00 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F1/50 , G03F7/0002 , G03F7/70325
摘要： A near-field exposure mask according to an embodiment includes: a silicon substrate; and a near-field light generating unit that is formed on the silicon substrate, the near-field light generating unit being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials.
摘要翻译： 根据实施例的近场曝光掩模包括：硅衬底; 以及形成在所述硅基板上的近场光产生单元，所述近场光产生单元是包含选自Au，Al，Ag，Cu，Cr，Sb，W中的至少一种元素的层 ，Ni，In，Ge，Sn，Pb，Zn，Pd和C，或由其中一些材料制成的层形成的膜叠层。
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公开(公告)号：US20120241645A1
公开(公告)日：2012-09-27
申请号：US13416282
申请日：2012-03-09
IPC分类号： G01N21/88
CPC分类号： G03F1/84 , G01N23/225 , G01N2021/95676
摘要： According to one embodiment, a mask inspection apparatus includes a decompression chamber, a holder, a light irradiation unit, a detection unit, an electrode, and a control unit. The holder is provided in the decompression chamber and holds a mask. The light irradiation unit irradiates a major surface of the mask held by the holder with a light. The detection unit is provided in the decompression chamber to detect electrons generated when the major surface of the mask is irradiated with the light. The electrode is provided between the holder and the detection unit and guides the electrons in a direction from the holder toward the detection unit. The control unit compares a detection result of the electrons detected by the detection unit with a reference value.
摘要翻译： 根据一个实施例，掩模检查装置包括减压室，保持器，光照射单元，检测单元，电极和控制单元。 保持器设置在减压室中并保持面罩。 光照射单元用光照射由保持器保持的面罩的主表面。 检测单元设置在减压室中以检测当用光照射掩模的主表面时产生的电子。 电极设置在保持器和检测单元之间并且引导电子沿着保持器朝向检测单元的方向。 控制单元将由检测单元检测的电子的检测结果与参考值进行比较。
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10.发明授权
公开(公告)号：US6143422A
公开(公告)日：2000-11-07
申请号：US18950
申请日：1998-02-05
CPC分类号： C23C28/3225 , C23C22/24 , C23C22/30 , C23C28/00 , C23C28/345 , C25D11/38 , C25D3/565 , Y10S428/935 , Y10T428/12493 , Y10T428/12569 , Y10T428/12611 , Y10T428/12799 , Y10T428/249923
摘要： A material which can be improved in its resistance to corrosion caused by alcohol-containing fuels after formation without detriment to weldability and without any substantial cost increase is developed.ConstitutionA chromate film is applied to a Zn--X alloy electroplating layer, in which X is one or more of Ni: 3-18 wt %, Co: 0.02-3 wt %, Mn: 25-45 wt %, or Cr: 8-20 wt %. The Zn--Ni alloy plating layer underlying the chromate film has cracks with a density of 1000-150000 in terms of the number of plated regions surrounded by cracks in a 1 mm.times.1 mm visual field, with cracks having a maximum width of 0.5 .mu.m or less comprising 90% or more of the total number of the cracks, and with cracks having a depth of 80% or more of the thickness of the plating layer comprising 80% or more of the total number of the cracks.
摘要翻译： 开发了可以改善其在形成后由含醇燃料引起的耐腐蚀性的材料，而不损害可焊性并且没有任何显着的成本增加。 构成将铬酸盐膜施加到Zn-X合金电镀层，其中X为Ni：3-18重量％，Co：0.02-3重量％，Mn：25-45重量％或Cr： 8-20重量％。 在铬酸盐膜下面的Zn-Ni合金镀层具有以1mm×1mm视野内的裂纹包围的电镀区域的数量为1000-150000的裂纹，其最大宽度为0.5μm的裂纹或 小于裂纹总数的90％以上，且镀层的厚度为80％以上的深度为裂纹总数的80％以上的裂纹。
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