公开(公告)号：US11554563B2

公开(公告)日：2023-01-17

申请号：US16640530

申请日：2018-07-17

Applicant: Heptagon Micro Optics Pte. Ltd.

Inventor： QiChuan Yu ,  Han Nee Ng ,  Tobias Senn ,  John A. Vidallon ,  Ramon Opeda ,  Attilio Ferrari ,  Harmut Rudmann ,  Martin Schubert

IPC: B29D11/00 ,  B29C33/38 ,  B29C39/26

Abstract: The method regards manufacturing devices by replication, wherein each of the devices comprises a device surface. The method comprises producing the devices from a replication material by replication using a replication tool (1), wherein the replication tool (1) comprises a tool material comprising replication sites (4) comprising a replication surface (5) each. Each of the replication surfaces (5) corresponds to a negative of the device surface of a respective one of the devices. The tool material comprises, in addition to the replication sites, one or more mitigating features (7) for reducing asymmetric form errors of the device surfaces. Replication tools (1) and methods for manufacturing these are also described.