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公开(公告)号:US09508539B2
公开(公告)日:2016-11-29
申请号:US14895119
申请日:2014-06-17
Applicant: HORIBA JOBIN YVON SAS
Inventor: Patrick Chapon , Sebastien Legendre
CPC classification number: H01J49/12 , H01J37/32018 , H01J37/32862 , H01J49/0031 , H01J49/40
Abstract: A glow discharge mass spectrometry device and method, the device including a glow discharge lamp (1), gas flow-injection elements, the glow discharge lamp being suitable for forming an ablation plasma in the presence of a plasma gas, and a mass spectrometer. The device further includes heating elements (30, 31) suitable for heating a gas flow (38) upstream of a cell (2), the gas flow-injection elements being suitable for injecting into the glow discharge cell a gas flow (38) heated to a temperature T for a duration D, and pumping elements (7, 27) being designed to pump a flow of gaseous species (17, 37) out of the cell for the duration D, so as to decontaminate the surface of the sample (4) and/or the inner walls of the glow discharge cell (2) before an ablation plasma (5) is ignited.
Abstract translation: 一种辉光放电质谱装置和方法,所述装置包括辉光放电灯(1),气体流注入元件,所述辉光放电灯适合于在等离子体气体存在下形成消融等离子体,以及质谱仪。 该装置还包括适于加热电池(2)上游的气流(38)的加热元件(30,31),气流注入元件适用于向辉光放电室注入加热的气流(38) 温度T持续持续时间D,并且泵送元件(7,27)被设计成将气态物质(17,37)的流从泵送出持续时间D,以便去除样品表面( 4)和/或辉光放电单元(2)的内壁在消融等离子体(5)被点燃之前。
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2.
公开(公告)号:US10073038B2
公开(公告)日:2018-09-11
申请号:US15305367
申请日:2015-04-28
Applicant: HORIBA JOBIN YVON SAS
Inventor: Simon Richard , Jean-Paul Gaston , Olivier Acher , Patrick Chapon
CPC classification number: G01N21/67 , G01B11/22 , G01J3/443 , G01N21/68 , G01N2201/06113 , G01N2201/0612 , H01J37/32018 , H01J37/32963 , H01J37/32972 , H01J2237/334
Abstract: A glow discharge spectrometry system includes a glow discharge lamp suitable for receiving a solid sample (10) and forming a glow discharge etching plasma (19). The system (100) for measuring in situ the depth of the erosion crater generated by etching of the sample (10) includes an optical separator (3), optical elements (4) suitable for directing a first incident beam (21) toward a first zone (11) of the sample, the first zone being exposed to the etching plasma, and a second incident beam (22) toward a second zone (12) of the same side of the sample, the second zone being protected from the etching plasma, respectively, and an optical recombining device (3) suitable for forming an interferometric beam (30) so as to determine the depth (d) of the erosion crater.
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3.
公开(公告)号:US10361075B2
公开(公告)日:2019-07-23
申请号:US15301218
申请日:2015-03-27
Applicant: HORIBA JOBIN YVON SAS
Inventor: Patrick Chapon , Agnes Tempez , Sebastien Legendre
Abstract: A system and a process for measuring, by glow discharge spectrometry, the elemental and/or molecular chemical composition of an organic solid sample (10). The sample (10) is positioned so as to seal a glow discharge plasma reactor (2), a gaseous mixture including at least one inert gas and gaseous oxygen is injected into the reactor (2), the concentration of gaseous oxygen being between 0.1% and 15% by weight of the gaseous mixture, an electric discharge of radiofrequency type is applied to the electrodes of the plasma reactor (2) in order to generate a glow discharge plasma, and the solid sample (10) is exposed to the plasma so as to etch an erosion crater in the solid sample (10); at least one signal representative of an ionized species of negative charge is selected and measured using a mass spectrometer (4).
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