公开(公告)号：US20130072002A1

公开(公告)日：2013-03-21

申请号：US13674753

申请日：2012-11-12

申请人： HITACHI KOKUSAI ELECTRIC INC.

发明人： Kazuyuki TOYODA ,  Yasuhiro INOKUCHI ,  Motonari TAKEBAYASHI ,  Tadashi KONTANI ,  Nobuo ISHIMARU

IPC分类号： H01L21/205

CPC分类号： H01L21/02274 ,  C23C16/452 ,  C23C16/45525 ,  C23C16/45542 ,  C23C16/45546 ,  C23C16/45578 ,  C23C16/4583 ,  C23C16/4584 ,  C23C16/54 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32513 ,  H01J37/32541 ,  H01J37/32834 ,  H01J2237/332 ,  H01L21/02183 ,  H01L21/02205 ,  H01L21/02211 ,  H01L21/205 ,  H01L21/31604 ,  H01L21/67109 ,  H01L21/77

摘要： A plasma processing apparatus comprises a processing chamber in which a plurality of substrates are stacked and accommodated; a pair of electrodes extending in the stacking direction of the plurality of substrates, which are disposed at one side of the plurality of substrates in said processing chamber, and to which high frequency electricity is applied; and a gas supply member which supplies processing gas into a space between the pair of electrodes.

公开(公告)号：US20160002789A1

公开(公告)日：2016-01-07

申请号：US14856312

申请日：2015-09-16

申请人： HITACHI KOKUSAI ELECTRIC INC.

发明人： Tadashi KONTANI ,  Hideto TATENO ,  Atsushi UMEKAWA

IPC分类号： C23C16/52 ,  C23C16/455 ,  H01L21/02 ,  C23C16/44

CPC分类号： C23C16/52 ,  C23C14/246 ,  C23C16/4412 ,  C23C16/448 ,  C23C16/455 ,  H01L21/02271

摘要： A substrate processing apparatus includes a processing chamber housing a substrate, a vaporizer which vaporizes processing liquid and supply processing gas into the processing chamber, a reserve tank storing the processing liquid, a line switching unit connected to the reserve tank, a tank supply pipe connected to the line switching unit and supplies the processing liquid to the reserve tank, an exhausting unit connected to the line switching unit and exhausts the processing liquid in the reserve tank, and a controlling unit which controls the line switching unit to exhaust the processing liquid for exhausting the processing liquid from the reserve tank to the exhausting unit and exhaust the processing liquid in the pipe for supplying the processing liquid from the tank supply pipe to the exhausting unit before and/or after supplying the processing liquid from the processing liquid supplying pipe to the reserve tank.

摘要翻译： 基板处理装置包括容纳基板的处理室，将处理液体蒸发并将处理气体供给到处理室中的蒸发器，储存处理液的储存箱，与储备罐连接的管路切换单元， 并且将处理液供给到储备箱，排出单元，连接到管线切换单元，并排出备用箱中的处理液;控制单元，其控制线路切换单元以将处理液排出， 将处理液从备用箱排出到排气单元，并且在从处理液供给管供给处理液之前和/或之后将处理液从罐供给管供给到排出单元的管中排出处理液 储备罐。