公开(公告)号：US10770260B2

公开(公告)日：2020-09-08

申请号：US16260988

申请日：2019-01-29

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko Otani ,  Yohei Minekawa ,  Takashi Nobuhara ,  Nobuhiko Kanzaki ,  Takehiro Hirai ,  Miyuki Fukuda ,  Yuya Isomae ,  Kaori Yaeshima ,  Yuji Takagi

IPC: G02B21/18 ,  H01J37/22 ,  G06T7/13 ,  G06T7/60 ,  G02B21/00 ,  G02B21/36 ,  G06T7/00 ,  H01J37/28 ,  G06T7/73

Abstract: A defect observation device detects a defect with high accuracy regardless of a defect size. One imaging configuration for observing an observation target on a sample is selected from an optical microscope, an optical microscope, and an electron microscope, and an imaging condition of the selected imaging configuration is controlled.