公开(公告)号：US20220390851A1

公开(公告)日：2022-12-08

申请号：US17818174

申请日：2022-08-08

Applicant: Gigaphoton Inc.

Inventor： Koichi FUJII ,  Osamu WAKABAYASHI ,  Toshihiro OGA

IPC: G03F7/20

Abstract: An exposure method includes reading data representing a relationship between a first parameter relating to an energy ratio between energy of first pulsed laser light having a first wavelength and energy of second pulsed laser light having a second wavelength longer than the first wavelength and a second parameter relating to a sidewall angle of a resist film that is the angle of a sidewall produced when the resist film is exposed to the first pulsed laser light and the second pulsed laser light, and determining a target value of the first parameter based on the data and a target value of the second parameter; and exposing the resist film to the first pulsed laser light and the second pulsed laser light by controlling a narrowed-line gas laser apparatus to output the first pulsed laser light and the second pulsed laser light based on the target value of the first parameter.

公开(公告)号：US20240001486A1

公开(公告)日：2024-01-04

申请号：US18467361

申请日：2023-09-14

Applicant: Gigaphoton Inc.

Inventor： Takamitsu KOMAKI ,  Toshihiro OGA

IPC: B23K26/06 ,  B23K26/70 ,  G02B27/10

CPC classification number: B23K26/0648 ,  B23K26/707 ,  B23K26/0626 ,  G02B27/1093 ,  B23K26/0643 ,  B23K26/0652 ,  B23K2101/40

Abstract: A control method for a spectrum waveform of a laser beam output from a laser apparatus to an exposure apparatus includes acquiring a longitudinal chromatic aberration of the exposure apparatus, setting a target value of an evaluation value of the spectrum waveform by using a relation between the longitudinal chromatic aberration and the evaluation value, and controlling the spectrum waveform by using the target value.

公开(公告)号：US20240003743A1

公开(公告)日：2024-01-04

申请号：US18467121

申请日：2023-09-14

Applicant: Gigaphoton Inc.

Inventor： Takamitsu KOMAKI ,  Toshihiro OGA

IPC: G01J3/45

CPC classification number: G01J3/45

Abstract: A laser device connectable to an exposure apparatus includes a spectrometer configured to generate a measurement waveform from an interference pattern of laser light output from the laser device; and a processor configured to calculate a first spectral waveform indicating a relationship between a wavelength and a light intensity using the measurement waveform, calculate a representative waveform included in a wavelength range of the first spectral waveform, and calculate an evaluation value of the first spectral waveform using a first integration value obtained by integrating, over the wavelength range, a product of a function of a wavelength deviation from the representative wavelength and the light intensity.

公开(公告)号：US20230187286A1

公开(公告)日：2023-06-15

申请号：US18165288

申请日：2023-02-06

Applicant: Gigaphoton Inc.

Inventor： Toshihiro OGA ,  Koichi FUJII ,  Osamu WAKABAYASHI

IPC: H01L21/66 ,  H01L21/268

CPC classification number: H01L22/12 ,  H01L21/268

Abstract: An electronic device manufacturing method according to an aspect of the present disclosure includes determining magnification in a scanning width direction based on a pattern formed in a scanning field of a wafer; measuring a wafer height at points in the scanning field and determining an average value of the wafer height in the scanning width direction; determining a wavelength range of a pulse laser beam in which an allowable CD value is obtained in a case of a focus position based on the average value of the wafer height; determining a first wavelength of the pulse laser beam at which the determined magnification is obtained and determining a target wavelength based on the wavelength range and the first wavelength; outputting a pulse laser beam controlled to have the target wavelength for each pulse; and performing exposure of the scanning field of the wafer to the pulse laser beam.