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1.
公开(公告)号:US20240003743A1
公开(公告)日:2024-01-04
申请号:US18467121
申请日:2023-09-14
Applicant: Gigaphoton Inc.
Inventor: Takamitsu KOMAKI , Toshihiro OGA
IPC: G01J3/45
CPC classification number: G01J3/45
Abstract: A laser device connectable to an exposure apparatus includes a spectrometer configured to generate a measurement waveform from an interference pattern of laser light output from the laser device; and a processor configured to calculate a first spectral waveform indicating a relationship between a wavelength and a light intensity using the measurement waveform, calculate a representative waveform included in a wavelength range of the first spectral waveform, and calculate an evaluation value of the first spectral waveform using a first integration value obtained by integrating, over the wavelength range, a product of a function of a wavelength deviation from the representative wavelength and the light intensity.
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2.
公开(公告)号:US20240001486A1
公开(公告)日:2024-01-04
申请号:US18467361
申请日:2023-09-14
Applicant: Gigaphoton Inc.
Inventor: Takamitsu KOMAKI , Toshihiro OGA
CPC classification number: B23K26/0648 , B23K26/707 , B23K26/0626 , G02B27/1093 , B23K26/0643 , B23K26/0652 , B23K2101/40
Abstract: A control method for a spectrum waveform of a laser beam output from a laser apparatus to an exposure apparatus includes acquiring a longitudinal chromatic aberration of the exposure apparatus, setting a target value of an evaluation value of the spectrum waveform by using a relation between the longitudinal chromatic aberration and the evaluation value, and controlling the spectrum waveform by using the target value.
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