公开(公告)号：US10314152B2

公开(公告)日：2019-06-04

申请号：US15347241

申请日：2016-11-09

Applicant: GIGAPHOTON INC.

Inventor： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC: H05G2/00 ,  G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  G21K5/00 ,  B23K10/00 ,  G03B27/32 ,  B23K26/36 ,  B23K26/12

Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

公开(公告)号：US09510433B2

公开(公告)日：2016-11-29

申请号：US14481620

申请日：2014-09-09

Applicant: GIGAPHOTON INC.

Inventor： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC: G03B27/32 ,  B23K26/10 ,  B23K26/12 ,  B23K26/36 ,  H05G2/00 ,  G21K5/02 ,  G21K5/00 ,  B23K10/00 ,  G03F7/20 ,  G21K1/06

CPC classification number: H05G2/008 ,  B23K10/00 ,  B23K26/12 ,  B23K26/36 ,  G03B27/32 ,  G03F7/70025 ,  G03F7/70033 ,  G21K1/067 ,  G21K5/00 ,  G21K5/02 ,  G21K2201/064 ,  H05G2/005

Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US11477877B2

公开(公告)日：2022-10-18

申请号：US16665335

申请日：2019-10-28

Applicant: Gigaphoton Inc.

Inventor： Hitoshi Nagano ,  Yasunori Wada ,  Tatsuya Yanagida ,  Osamu Wakabayashi

IPC: H05G2/00 ,  H01S3/107 ,  G03F7/20 ,  H01S3/23 ,  H01S3/00 ,  H01S3/10 ,  G21K1/06 ,  H01L21/027 ,  H01S3/13 ,  H01S3/16 ,  H01S5/40 ,  H01S3/115

Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.

公开(公告)号：US10764986B2

公开(公告)日：2020-09-01

申请号：US15347716

申请日：2016-11-09

Applicant: GIGAPHOTON INC.

Inventor： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC: H05G2/00 ,  G03F7/20 ,  G21K1/06 ,  B23K26/352 ,  G21K5/02 ,  G21K5/00 ,  B23K10/00 ,  G03B27/32 ,  B23K26/36 ,  B23K26/12

Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction, unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

公开(公告)号：US10512148B2

公开(公告)日：2019-12-17

申请号：US15447013

申请日：2017-03-01

Applicant: GIGAPHOTON INC.

Inventor： Hitoshi Nagano ,  Yasunori Wada ,  Tatsuya Yanagida ,  Osamu Wakabayashi

IPC: H05G2/00 ,  H01S3/107 ,  H01S3/23 ,  H01S3/00 ,  H01S3/13 ,  H01S3/16 ,  G21K1/06 ,  H01L21/027

Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.