Extreme ultraviolet light generation apparatus

    公开(公告)号:US09894743B2

    公开(公告)日:2018-02-13

    申请号:US14984458

    申请日:2015-12-30

    CPC classification number: H05G2/008 G03F7/70033 H05G2/003

    Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.

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