公开(公告)号：US10712005B2

公开(公告)日：2020-07-14

申请号：US15650400

申请日：2017-07-14

申请人： GOODRICH CORPORATION

发明人： Ying She ,  Naveen G. Menon ,  Zissis A. Dardas ,  Thomas P. Filburn

IPC分类号： F23R3/00 ,  C04B35/80 ,  C04B35/83 ,  C04B35/565 ,  C23C16/44 ,  C23C16/04 ,  C23C16/32 ,  C04B111/00

摘要： A method of manufacturing a ceramic matrix composite component may include introducing a gaseous precursor into an inlet portion of a chamber that houses a porous preform and introducing a gaseous mitigation agent into an outlet portion of the chamber that is downstream of the inlet portion of the chamber. The gaseous precursor may include methyltrichlorosilane (MTS) and the gaseous mitigation agent may include hydrogen gas. The introduction of the gaseous precursor may result in densification of the porous preform(s) and the introduction of the gaseous mitigation agent may shift the reaction equilibrium to disfavor the formation of harmful and/or pyrophoric byproduct deposits, which can accumulate in an exhaust conduit 340 of the system.

公开(公告)号：US11286209B2

公开(公告)日：2022-03-29

申请号：US16893745

申请日：2020-06-05

申请人： GOODRICH CORPORATION

发明人： Ying She ,  Naveen G. Menon ,  Zissis A. Dardas ,  Thomas P. Filburn

IPC分类号： C04B35/80 ,  F23R3/00 ,  C04B35/83 ,  C04B35/565 ,  C04B35/628 ,  C04B111/00 ,  C23C16/44 ,  C23C16/04 ,  C23C16/32

摘要： A method of manufacturing a ceramic matrix composite component may include introducing a gaseous precursor into an inlet portion of a chamber that houses a porous preform and introducing a gaseous mitigation agent into an outlet portion of the chamber that is downstream of the inlet portion of the chamber. The gaseous precursor may include methyltrichlorosilane (MTS) and the gaseous mitigation agent may include hydrogen gas. The introduction of the gaseous precursor may result in densification of the porous preform(s) and the introduction of the gaseous mitigation agent may shift the reaction equilibrium to disfavor the formation of harmful and/or pyrophoric byproduct deposits, which can accumulate in an exhaust conduit 340 of the system.

公开(公告)号：US10480065B2

公开(公告)日：2019-11-19

申请号：US15709338

申请日：2017-09-19

申请人： GOODRICH CORPORATION

发明人： Ying She ,  Naveen G. Menon ,  Zissis A. Dardas ,  Thomas P. Filburn ,  Xiaodan Cai

IPC分类号： C23F1/00 ,  H01L21/306 ,  C23C16/04 ,  C23C16/32 ,  C23C16/44 ,  C04B35/80 ,  C04B35/628 ,  C23C16/455

摘要： A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.

公开(公告)号：US10975467B2

公开(公告)日：2021-04-13

申请号：US16598843

申请日：2019-10-10

申请人： GOODRICH CORPORATION

发明人： Ying She ,  Naveen G. Menon ,  Zissis A. Dardas ,  Thomas P. Filburn ,  Xiaodan Cai

IPC分类号： C23C16/04 ,  C23C16/32 ,  C23C16/44 ,  C04B35/80 ,  C04B35/628 ,  C23C16/455

摘要： A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.

公开(公告)号：US20200040447A1

公开(公告)日：2020-02-06

申请号：US16598843

申请日：2019-10-10

申请人： GOODRICH CORPORATION

发明人： Ying She ,  Naveen G. Menon ,  Zissis A. Dardas ,  Thomas P. Filburn ,  Xiaodan Cai

IPC分类号： C23C16/04 ,  C23C16/32 ,  C23C16/44 ,  C04B35/80 ,  C04B35/628 ,  C23C16/455

摘要： A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.

公开(公告)号：US20190085446A1

公开(公告)日：2019-03-21

申请号：US15709338

申请日：2017-09-19

申请人： GOODRICH CORPORATION

发明人： Ying She ,  Naveen G. Menon ,  Zissis A. Dardas ,  Thomas P. Filburn ,  Xiaodan Cai

IPC分类号： C23C16/04 ,  C23C16/32 ,  C23C16/44 ,  C04B35/80 ,  C04B35/628

CPC分类号： C23C16/045 ,  C04B35/62863 ,  C04B35/62884 ,  C04B35/806 ,  C04B2235/3826 ,  C04B2235/444 ,  C04B2235/483 ,  C04B2235/5244 ,  C04B2235/5248 ,  C04B2235/614 ,  C23C16/325 ,  C23C16/4405 ,  C23C16/4412 ,  C23C16/45502 ,  C23C16/45565 ,  C23C16/45574

摘要： A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.