公开(公告)号：US09454079B2

公开(公告)日：2016-09-27

申请号：US14271606

申请日：2014-05-07

Applicant: FUJIFILM CORPORATION

Inventor： Akinori Shibuya ,  Yoko Tokugawa ,  Tomoki Matsuda ,  Junichi Ito ,  Shohei Kataoka ,  Toshiaki Fukuhara ,  Naohiro Tango ,  Kaoru Iwato ,  Masahiro Yoshidome ,  Shinichi Sugiyama

IPC: G03F7/004 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/12 ,  C07D295/16 ,  C07D327/06 ,  C07D339/08 ,  G03F7/038 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/038 ,  C07C303/32 ,  C07C309/04 ,  C07C309/12 ,  C07D295/16 ,  C07D327/06 ,  C07D339/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including (A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and (B) a resin.

公开(公告)号：US09405197B2

公开(公告)日：2016-08-02

申请号：US14625782

申请日：2015-02-19

Applicant: FUJIFILM Corporation

Inventor： Akinori Shibuya ,  Shohei Kataoka ,  Tomoki Matsuda ,  Toshiaki Fukuhara ,  Akiyoshi Goto

IPC: G03F7/004 ,  G03F7/30 ,  H01L21/027 ,  C07C381/12 ,  C08F220/18 ,  C08F220/26 ,  C08F220/24 ,  C08F220/38 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20 ,  G03F7/32 ,  G03F7/038

CPC classification number: G03F7/30 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/26 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  H01L21/0274

Abstract: There is provided a pattern forming method containing: forming a film by using a radiation-sensitive or actinic ray-sensitive resin composition containing: (A) a onium salt compound containing a nitrogen atom in a cationic moiety; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin capable of increasing the polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, exposing the film; and developing the exposed film by using a developer containing an organic solvent to form a negative pattern.

Abstract translation: 提供了一种图案形成方法，其包括：通过使用辐射敏感或光化射线敏感性树脂组合物形成膜，其包含：（A）阳离子部分中含有氮原子的鎓盐化合物; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）能够通过酸的作用增加极性以降低在含有有机溶剂的显影剂中的溶解性的树脂，使该膜曝光; 并通过使用含有有机溶剂的显影剂显影曝光的薄膜以形成负图案。

公开(公告)号：US09250519B2

公开(公告)日：2016-02-02

申请号：US14580686

申请日：2014-12-23

Applicant: FUJIFILM Corporation

Inventor： Shohei Kataoka ,  Akinori Shibuya ,  Akiyoshi Goto ,  Tomoki Matsuda ,  Toshiaki Fukuhara

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/34 ,  G03F7/038 ,  G03F7/004 ,  G03F7/11 ,  G03F7/32 ,  G03F7/30

CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325

Abstract: The pattern forming method of the present invention includes: (i) forming a film including an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) represented by General Formula (I) shown below; a resin (P) capable of decreasing solubility with respect to a developer including organic solvent by the action of an acid; and a compound (B) capable of generating an acid by irradiation of actinic rays or radiation; (ii) irradiating the film with actinic rays or radiation; (iii) developing the film irradiated with the actinic rays or radiation using a developer including an organic solvent.[Chem. 1] RN-A−X+  (I)

Abstract translation: 本发明的图案形成方法包括：（i）形成含有由下述通式（I）表示的化合物（A）的光化射线敏感性或辐射敏感性树脂组合物的膜; 能够通过酸的作用降低对包含有机溶剂的显影剂的溶解度的树脂（P）; 和能够通过光化射线或辐射的照射产生酸的化合物（B）; （ii）用光化射线或辐射照射薄膜; （iii）使用包含有机溶剂的显影剂显影用光化射线或辐射照射的薄膜。 [Chem。 1] RN-A-X +（I）