Invention Grant
US09454079B2 Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern
有权
光化射线或辐射敏感树脂组合物，光化射线或辐射敏感膜和形成图案的方法
- Patent Title: Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern
- Patent Title (中): 光化射线或辐射敏感树脂组合物，光化射线或辐射敏感膜和形成图案的方法
-
Application No.: US14271606Application Date: 2014-05-07
-
Publication No.: US09454079B2Publication Date: 2016-09-27
- Inventor: Akinori Shibuya , Yoko Tokugawa , Tomoki Matsuda , Junichi Ito , Shohei Kataoka , Toshiaki Fukuhara , Naohiro Tango , Kaoru Iwato , Masahiro Yoshidome , Shinichi Sugiyama
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-243948 20111107; JP2011-286896 20111227; JP2012-123757 20120530; JP2012-232271 20121019
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07C303/32 ; C07C309/04 ; C07C309/06 ; C07C309/12 ; C07D295/16 ; C07D327/06 ; C07D339/08 ; G03F7/038 ; G03F7/039 ; G03F7/11 ; G03F7/20 ; G03F7/32
Abstract:
According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including (A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and (B) a resin.
Public/Granted literature
Information query
IPC分类:
